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Surface treatment of semiconductor substrates

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/00
  • B08B-005/00
출원번호 US-0208112 (1998-12-09)
발명자 / 주소
  • Kittle Paul A.
대리인 / 주소
    Howson & Howson
인용정보 피인용 횟수 : 52  인용 특허 : 5

초록

Surface cleaning, chemical treatment and drying of semiconductor substrates is carried out using foam as a medium instead of a condensed phase liquid medium. In cleaning and chemical treatment, by introducing a foam into an overflow vessel the foam is caused to pass over the substrate in moving cont

대표청구항

[ I claim:] [1.] A process for drying a substrate comprising the steps of:supporting the substrate within a foam treatment vessel causing the supported substrate to be submerged in a solution of carbon dioxide in deionized water under pressure within said foam treatment vessel;thereafter gradually r

이 특허에 인용된 특허 (5)

  1. Simmons Bobby G. (Tulsa OK), Apparatus for making foamed cleaning solutions and method of operation.
  2. Simmons Bobby G. (7524 S. Evanston Tulsa OK 74136), Method for recycling foamed solvents.
  3. Verbiest Jan Hendrik Maria,BEX ; Wevers Jean,BEX, Method of cleaning textile fabrics.
  4. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), Process for surface and fluid cleaning.
  5. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.

이 특허를 인용한 특허 (52)

  1. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Apparatus and system for cleaning a substrate.
  2. de Larios,John M.; Owczarz,Aleksander; Schoepp,Alan; Redeker,Fritz, Apparatuses and methods for cleaning a substrate.
  3. Field, Bruce F.; Krueger, Joseph K.; Joynt, Daniel L.; Pouliot, Joseph L.; McHugh, Daniel J., Chemical dispenser for a hard floor surface cleaner.
  4. Field, Bruce F.; Joynt, Daniel L.; Krueger, Joseph K.; Krueger, Earl; Christensen, Bryan L., Cleaner cartridge.
  5. Field,Bruce F.; Joynt,Daniel L.; Johnson,Jeffrey A.; Krueger,Joseph K.; Christensen,Bryan L., Cleaner cartridge.
  6. Basham, Michael T.; Larson, Warren L.; Peterson, Terence A.; Peterson, legal representative, Barbara J.; Wellens, Richard W.; Fleigle, Mark J., Cleaning head for use in a floor cleaning machine.
  7. Field,Bruce F.; Krueger,Joseph K.; Pouliot,Joseph L., Cleaning liquid dispensing in a mobile hard surface cleaner.
  8. Field, Bruce F.; Krueger, Joseph K.; Christensen, Bryan; Pierce, Richard M.; Seifert, James J., Cleaning liquid dispensing system for a hard floor surface cleaner.
  9. Field, Bruce F.; Killingstad, Hans C., Cleaning system utilizing purified water.
  10. Loring, Peter Alexander, Floor cleaner scrub head having a movable disc scrub member.
  11. Basham,Michael T.; Larson,Warren L.; Peterson, legal representative,Barbara J.; Wellens,Richard W.; Fleigle,Mark J.; Durenberger,Don; Hayden,Brent; Lehman,Ron; Peterson,Terence A., Floor sweeping and scrubbing machine.
  12. Field, Bruce F.; Krueger, Joseph K.; Christensen, Bryan L., Foamed cleaning liquid dispensing system.
  13. Field, Bruce F., Hard and soft floor cleaning tool and machine.
  14. Field, Bruce F.; Christensen, Bryan L.; Blehert, Michael L., Hard floor surface cleaner utilizing an aerated cleaning liquid.
  15. Shero, Eric J.; Pomarede, Christophe, Incorporation of nitrogen into high k dielectric film.
  16. Shero, Eric J; Pomarede, Christophe, Incorporation of nitrogen into high k dielectric film.
  17. Shero,Eric J.; Pomarede,Christophe, Incorporation of nitrogen into high k dielectric film.
  18. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a semiconductor substrate.
  19. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a semiconductor substrate.
  20. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a substrate using non-Newtonian fluids.
  21. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a substrate using non-newtonian fluids.
  22. Bergman Eric J. ; Sharp Ian ; Meuchel Craig P. ; Woods H. Frederick, Method and apparatus for high-pressure wafer processing and drying.
  23. Bergman, Eric J.; Sharp, Ian; Meuchel, Craig P.; Woods, H. Frederick, Method and apparatus for high-pressure wafer processing and drying.
  24. Eric J. Bergman ; Ian Sharp ; Craig P. Meuchel ; H. Frederick Woods, Method and apparatus for high-pressure wafer processing and drying.
  25. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fritz C., Method and apparatus for particle removal.
  26. Zhu, Ji; Mendiratta, Arjun; Mui, David, Method and apparatus for removing contaminants from substrate.
  27. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Method and apparatus for removing contamination from substrate.
  28. de Larios,John M.; Ravkin,Mike; Parks,John; Korolik,Mikhail; Redeker,Fred C., Method and apparatus for transporting a substrate using non-Newtonian fluid.
  29. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and material for cleaning a substrate.
  30. Korolik, Mikhail; Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz, Method and system for using a two-phases substrate cleaning compound.
  31. Yoshida,Hideo; Sato,Nobuyoshi; Sako,Takeshi; Sone,Masato; Abe,Kentaro; Sakon,Kiyohito, Method for activating surface of base material and apparatus thereof.
  32. Korolik, Mikhail; Ravkin, Michael; de Larios, John; Redeker, Fritz C.; Boyd, John M., Method for removing material from semiconductor wafer and apparatus for performing the same.
  33. Korolik, Mikhail; Ravkin, Michael; deLarios, John; Redeker, Fritz C.; Boyd, John M., Method for removing material from semiconductor wafer and apparatus for performing the same.
  34. Cheng, Yi-Lung; Yoo, Ming-Hwa; Wu, Sze-An; Wang, Ying-Lung, Method to neutralize charge imbalance following a wafer cleaning process.
  35. Patel,Bakul P.; Cernat,Mihaela; Small,Robert J., Methods for chemically treating a substrate using foam technology.
  36. Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz; de Larios, John M.; Freer, Erik M.; Korolik, Mikhail, Methods for contained chemical surface treatment.
  37. Field,Bruce F., Mobile floor cleaner data communication.
  38. Milligan, Robert B.; Li, Dong; Marcus, Steven, Plasma-enhanced atomic layer deposition of conductive material over dielectric layers.
  39. Milligan, Robert B.; Li, Doug; Marcus, Steven, Plasma-enhanced atomic layers deposition of conductive material over dielectric layers.
  40. John Michael Cotte ; Dario L. Goldfarb ; Kenneth John McCullough ; Wayne Martin Moreau ; Keith R. Pope ; John P. Simons ; Charles J. Taft, Process of drying semiconductor wafers using liquid or supercritical carbon dioxide.
  41. Chen, Tsung-Huang; Li, Wei-Cheng; Lai, Chi-Tung; Hung, Yung-Ti, Slurry feed system and method of providing slurry to chemical mechanical planarization station.
  42. Freer, Erik M.; deLarios, John M.; Ravkin, Michael; Korolik, Mikhail; Redeker, Fritz C., Substrate cleaning technique employing multi-phase solution.
  43. Freer, Erik M.; de Larios, John M.; Ravkin, Michael; Korolik, Mikhail; Mikhaylichenko, Katrina; Redeker, Fritz C., Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions.
  44. Tanaka, Takayoshi, Substrate processing apparatus and substrate processing method.
  45. Chandra, Mohan; Mount, David J.; Costantini, Michael A.; Moritz, Heiko D.; Jafri, Ijaz; Boyd, Jim; Heathwaite, Rick M., Supercritical fluid cleaning process for precision surfaces.
  46. Pomarede, Christophe F.; Roberts, Jeff; Shero, Eric J., Surface preparation prior to deposition.
  47. Pomarede, Christophe F.; Roberts, Jeff; Shero, Eric J., Surface preparation prior to deposition.
  48. Pomarede,Christophe F.; Roberts,Jeff; Shero,Eric J., Surface preparation prior to deposition.
  49. Pomarede,Christophe F.; Roberts,Jeff; Shero,Eric J., Surface preparation prior to deposition.
  50. Kittle Paul A., Surface treatment of semiconductor substrates.
  51. Kittle, Paul A., Surface treatment of semiconductor substrates.
  52. Paul A. Kittle, Surface treatment of semiconductor substrates.
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