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Gallium nitride-based III-V group compound semiconductor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/78
출원번호 US-0209826 (1998-12-11)
우선권정보 JP-0008727 (1994-01-28)
발명자 / 주소
  • Nakamura Shuji,JPX
  • Yamada Takao,JPX
  • Senoh Masayuki,JPX
  • Yamada Motokazu,JPX
  • Bando Kanji,JPX
출원인 / 주소
  • Nichia Chemical Industries Ltd., JPX
대리인 / 주소
    Nixon & Vanderhye
인용정보 피인용 횟수 : 45  인용 특허 : 5

초록

A gallium nitride-based III-V Group compound semiconductor device has a gallium nitride-based III-V Group compound semiconductor layer provided over a substrate, and an ohmic electrode provided in contact with the semiconductor layer. The ohmic electrode is formed of a metallic material, and has bee

대표청구항

[ What is claimed is:] [1.] A gallium nitride-based III-V Group compound semiconductor device, comprising;a substrate having first and second major surfaces;a first semiconductor layer provided on the side of said first major surface of said substrate and comprising an n-type gallium nitride-based I

이 특허에 인용된 특허 (5)

  1. Okazaki Nobuo (38-805 ; 1-ban ; Joshin 1-chome Inazawa JPX) Manabe Katsuhide (38-805 ; 1-ban ; Joshin 1-chome Inazawa JPX) Akasaki Isamu (38-805 ; 1-ban ; Joshin 1-chome Nishi-ku ; Nagoya-shi ; Aichi, Gallium nitride group compound semiconductor laser diode.
  2. Mimura Hidenori (Kawasaki JPX) Futagi Toshiro (Kawasaki JPX) Matsumoto Takahiro (Sagamihara JPX), Light emitting element with employment of porous silicon and optical device utilizing light emitting element.
  3. Kotaki Masahiro (Inazawa JPX) Akasaki Isamu (Nagoya JPX) Amano Hiroshi (Hamamatsu JPX), Light-emitting semiconductor device using gallium nitride group compound.
  4. Charmakadze Revaz A. (prospekt Vazha Pshavela ; 6 kvartal ; korpus 24 ; kv. 23 Tbilisi SUX) Chikovani Rafael I. (prospekt Vazha Pshavela ; 51 ; korpus 8 ; kv. 1 Tbilisi SUX), Semiconductor light-emitting device.
  5. Lawrence David J. (Rochester NY) Abbas Daniel C. (Webster NY) Phelps Daniel J. (Rochester NY) Smith Frank T. J. (Fairport NY), Transparent electrode light emitting diode and method of manufacture.

이 특허를 인용한 특허 (45)

  1. Fan, Zhaoyang; Li, Jing; Lin, Jingyu; Jiang, Hongxing, AC/DC light emitting diodes with integrated protection mechanism.
  2. Oh,Steve Tchang Hun; Choi,Hong K.; Tsaur,Bor Yeu; Fan,John C. C., Bonding pad for gallium nitride-based light-emitting device.
  3. Oh,Tchang Hun; Choi,Hong K.; Fan,John C. C.; Narayan,Jagdish, Bonding pad for gallium nitride-based light-emitting devices.
  4. Narayan, Jagdish, Domain epitaxy for thin film growth.
  5. Narayan, Jagdish; Ye, Jinlin; Hon, Schang-Jing; Fox, Ken; Chen, Jyh Chia; Choi, Hong K.; Fan, John C. C., Efficient light emitting diodes and lasers.
  6. Oh, Tchang-Hun; Choi, Hong K.; Tsaur, Bor-Yeu; Fan, John C. C.; Liao, Shirong; Narayan, Jagdish, Electrode for p-type gallium nitride-based semiconductors.
  7. Nakayama, Tatsuo; Miyamoto, Hironobu; Ando, Yuji; Inoue, Takashi; Okamoto, Yasuhiro; Kuzuhara, Masaaki, Electrode, method for producing same and semiconductor device using same.
  8. Nakayama,Tatsuo; Miyamoto,Hironobu; Ando,Yuji; Inoue,Takashi; Okamoto,Yasuhiro; Kuzuhara,Masaaki, Electrode, method for producing same and semiconductor device using same.
  9. Wang, Tao, GaN structures having low dislocation density and methods of manufacture.
  10. Uemura,Toshiya; Hirano,Atsuo; Horiuchi,Shigemi, Group III nitride compound semiconductor device.
  11. Fan,Zhaoyang; Jiang,Hongxing; Lin,Jingyu, Heterogeneous integrated high voltage DC/AC light emitter.
  12. Briere, Mike; Beach, Robert, III-nitride semiconductor device fabrication.
  13. Kuo, Daniel; Hsu, Samuel, Light emitting diode.
  14. Sheu, Jinn-Kong; Kuo, Daniel; Hsu, Samuel, Light emitting diode.
  15. Fan, Zhaoyang, Light emitting diode lamp.
  16. Fan, Zhaoyang; Jiang, Hongxing; Lin, Jingyu, Light emitting diode lamp capable of high AC/DC voltage operation.
  17. Jiang,Hongxing; Lin,Jingyu, Light emitting diodes for high AC voltage operation and general lighting.
  18. Jiang,Hongxing; Lin,Jingyu; Jin,Sixuan, Light emitting diodes for high AC voltage operation and general lighting.
  19. Fan, John C. C.; Choi, Hong K.; Oh, Tchang-Hun; Chen, Jyh Chia; Narayan, Jagdish, Light-emitting diode device geometry.
  20. Lee, Ching-ting, Method for manufacturing a compound semiconductor device.
  21. Beaumont Bernard,FRX ; Gibart Pierre,FRX ; Guillaume Jean-Claude,FRX ; Nataf Gilles,FRX ; Vaille Michel,FRX ; Haffouz Soufien,FRX, Method for producing a gallium nitride epitaxial layer.
  22. Rice, Peter; Hon, Schang-Jing; Wang, Alexander; O'Connor, Kevin, Method for reducing the resistivity of p-type II-VI and III-V semiconductors.
  23. Nishii, Katsunori; Inoue, Kaoru; Matsuno, Toshinobu; Ikeda, Yoshito; Masato, Hiroyuki, Method of fabricating a semiconductor device.
  24. Lee, Jong Lam; Jeong, Inkwon; Yoo, Myung Cheol, Method of fabricating vertical structure LEDs.
  25. Lee, Jong-Lam; Jeong, In-kwon; Yoo, Myung Cheol, Method of fabricating vertical structure LEDs.
  26. Ozawa,Masafumi; Yoshida,Hiroshi; Kobayashi,Takashi, Method of mounting light emitting element.
  27. Ozawa,Masafumi; Yoshida,Hiroshi; Kobayashi,Takashi, Method of mounting light emitting element.
  28. Sung Ying Che,TWX ; Liu Weng Ming,TWX, Method of producing gallium nitride-based III-V Group compound semiconductor device.
  29. Fan, Zhaoyang; Jiang, Hongxing; Lin, Jingyu, Micro-LED based high voltage AC/DC indicator lamp.
  30. Hongxing Jiang ; Jingyu Lin ; Sixuan Jin ; Jing Li, Micro-size LED and detector arrays for minidisplay, hyper-bright light emitting diodes, lighting, and UV detector and imaging sensor applications.
  31. Nakamura Mitsuhiro,JPX ; Ogura Mitsumasa,JPX ; Murakami Masanori,JPX, Ohmic electrode, method and multi-layered structure for making same.
  32. Beaumont, Bernard; Gibart, Pierre; Guillaume, Jean-Claude; Nataf, Gilles; Vaille, Michel; Haffouz, Soufien, Process for producing an epitaxial layer of gallium nitride.
  33. Nishi,Katsunori; Inoue,Kaoru; Matsuno,Toshinobu; Ikeda,Yoshito; Masato,Hiroyuki, Semiconductor device having an active region formed from group III nitride.
  34. Ohta, Hiroaki; Kohda, Shinichi, Semiconductor laser and method for manufacturing semiconductor laser.
  35. Tadatomo, Kazuyuki; Okagawa, Hiroaki; Ohuchi, Youichiro; Koto, Masahiro; Hiramatsu, Kazumasa; Hamamura, Yutaka; Shimizu, Sumito, Semiconductor light receiving element.
  36. Yoo, Myung Cheol, Thin film light emitting diode.
  37. Yoo, Myung Cheol, Thin film light emitting diode.
  38. Yoo, Myung Cheol, Thin film light emitting diode.
  39. Yoo, Myung Cheol, Thin film light emitting diode.
  40. Yoo, Myung Cheol, Thin film light emitting diode.
  41. Lee, Jong Lam; Jeong, In-kwon; Yoo, Myung Cheol, Vertical structure LEDs.
  42. Lee, Jong Lam; Jeong, In-kwon; Yoo, Myung Cheol, Vertical structure LEDs.
  43. Lee, Jong Lam; Jeong, In-kwon; Yoo, Myung Cheol, Vertical structure LEDs.
  44. Lee, Jong Lam; Jeong, In-kwon; Yoo, Myung Cheol, Vertical structure LEDs.
  45. Lee, Jong Lam; Jeong, In-kwon; Yoo, Myung Cheol, Vertical structure LEDs.
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