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Micromachine manufacture using gas beam crystallization

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/302
출원번호 US-0917267 (1997-08-25)
우선권정보 JP-0015505 (1994-02-09)
발명자 / 주소
  • Shindo Masahiro,JPX
  • Kosaka Daisuke,JPX
  • Hikawa Tetsuo,JPX
  • Takata Akira,JPX
  • Ukai Yukihiro,JPX
  • Sawada Takashi,JPX
  • Asakawa Toshifumi,JPX
출원인 / 주소
  • Crystal Device Corporation, JPX
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보 피인용 횟수 : 7  인용 특허 : 22

초록

In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom

대표청구항

[ What is claimed is:] [1.] A method of manufacturing a micromachine comprising a member being at least partially separated from a base material, said method comprising:(a) a step of forming a sacrificial layer on said base material;(b) a step of forming a layer of a material, to form said member on

이 특허에 인용된 특허 (22)

  1. Shinkawata Hiroki,JPX, DRAM semiconductor device with composite bit line.
  2. Bassous Ernest (Bronx NY) Meyerson Bernard S. (Yorktown Heights NY) Uram Kevin J. (Livermore CA), Epitaxial silicon membranes.
  3. Kamath G. Sanjiv (Malibu CA) Anderson Carl L. (Pacific Palisades CA), GaAs-GaAlAs solar cells.
  4. Perreault Aime J. (South Burlington VT), Insulation system for wire and cable.
  5. Lewis Carol L. R. (Palo Alto CA), Junctions for monolithic cascade solar cells and methods.
  6. Yoshida Susumu (Itami JPX), Light-electricity conversion semiconductor device.
  7. Logsdon James H. (Kokomo IN) Staller Steven E. (Kokomo IN) De Roo David W. (Carmel IN) Neudeck Gerold W. (West Lafayette IN), Method for forming thin silicon membrane or beam.
  8. Milnes Arthur G. (Pittsburgh PA), Method for making thin film cadmium telluride and related semiconductors for solar cells.
  9. Czubatyj Wolodymyr (Warren MI) Ovshinsky Stanford R. (Bloomfield Hills MI) Wicker Guy C. (Southfield MI) Beglau David (Dearborn MI) Himmler Ronald (Sterling Heights MI) Jablonski David (Drayton Plain, Method of forming a layer of doped crystalline semiconductor alloy material.
  10. Asakawa Toshifumi,JPX ; Shindo Masahiro,JPX ; Yoshimizu Toshikazu,JPX ; Ueyama Sumiyoshi,JPX, Method of forming single-crystalline thin film by beam irradiator.
  11. Barth Phillip W. (Palo Alto CA), Method of making a semiconductor transducer having multiple level diaphragm structure.
  12. Yamada Kazuji (Hitachi JPX) Kobayashi Yutaka (Hitachi JPX) Kawakami Kanji (Mito JPX) Shimada Satoshi (Hitachi JPX) Tanabe Masanori (Hitachi JPX) Kobori Shigeyuki (Hitachi JPX), Method of making silicon diaphragm pressure sensor.
  13. Fraas Lewis M. (Albany CA), Multilayer photovoltaic solar cell with semiconductor layer at shorting junction interface.
  14. Celler George K. (Lawrenceville NJ) Kimerling Lionel C. (Westfield NJ) Leamy Harry J. (New Providence NJ) Poate John M. (Summit NJ) Rozgonyi George A. (Chatham NJ), Patterned epitaxial regrowth using overlapping pulsed irradiation.
  15. Takaoka Matsuo (Koganei JPX) Sasaki Nobuo (Kawasaki JPX) Kawamura Seiichiro (Tokyo JPX) Hataishi Osamu (Yokohama JPX), Process for fabricating a semiconductor on insulator semiconductor device.
  16. Meda Laura (Milan ITX), Process for fabrication, by means of epitaxial recrystallization, of insulated-gate field-effect transistors with juncti.
  17. Suzuki Kenichiro (Tokyo JPX), Process for producing a micromotion mechanical structure.
  18. Diem Bernard (Echirolles FRX) Delaye Marie-Therese (Grenoble FRX), Process for producing a pressure transducer using silicon-on-insulator technology.
  19. Zavracky Paul M. (Norwood MA) Morrison ; Jr. Richard H. (Taunton MA), SOI diaphragm sensor.
  20. Tashiro Tsutomu (Tokyo JPX), Semiconductor device.
  21. Iwasa Shoichi,JPX, Semiconductor device including a capacitor responsible for a power supply voltage to semiconductor device and capable o.
  22. Li Akira,JPX ; Hayashi Yutaka,JPX ; Nakamura Akihiro,JPX, Semiconductor memory device and method of reading a data therefrom.

이 특허를 인용한 특허 (7)

  1. Dimeo, Jr., Frank; Chen, Philip S. H.; Neuner, Jeffrey W.; Welch, James; Stawasz, Michele; Baum, Thomas H.; King, Mackenzie E.; Chen, Ing-Shin; Roeder, Jeffrey F., Apparatus and process for sensing fluoro species in semiconductor processing systems.
  2. Dimeo, Jr.,Frank; Chen,Philip S. H.; Neuner,Jeffrey W.; Welch,James; Stawacz,Michele; Baum,Thomas H.; King,Mackenzie E.; Chen,Ing Shin; Roeder,Jeffrey F., Apparatus and process for sensing fluoro species in semiconductor processing systems.
  3. Yamazaki, Shunpei, Electronic device with liquid crystal display.
  4. Yamazaki, Shunpei, Electronic device with liquid crystal display.
  5. Ueda,Takashi, Manufacturing method for semiconductor substrate and manufacturing method for semiconductor device.
  6. Albrecht, Peter D., Systems and methods for connecting an ingot to a wire saw.
  7. Ocansey,Paul M.; Foerstner,Juergen A., Tungsten coated silicon fingers.
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