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Method for making thin film semiconductor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/20
출원번호 US-0818239 (1997-03-14)
우선권정보 JP-0234480 (1996-09-04)
발명자 / 주소
  • Tayanaka Hiroshi,JPX
출원인 / 주소
  • Sony Corporation, JPX
대리인 / 주소
    Hill & Simpson
인용정보 피인용 횟수 : 82  인용 특허 : 4

초록

The present invention provides new and improved methods for making crystalline semiconductor thin films which may be bonded to different kinds of substrates. The thin films may be flexible. In accordance with preferred methods, a multi-layer porous structure including two or more porous layers havin

대표청구항

[ What is claimed is:] [1.] A method for making a thin film semi-conductor comprising the steps of:providing a semi-conductor substrate having a surface;anodizing the semi-conductor substrate to provide a first porous layer adjacent the surface having a first porosity;anodizing the semi-conductor su

이 특허에 인용된 특허 (4)

  1. Sato Nobuhiko,JPX ; Yonehara Takao,JPX ; Sakaguchi Kiyofumi,JPX, Method for producing semiconductor substrate.
  2. Matsushita Takeshi,JPX ; Tayanaka Hiroshi,JPX, Method for separating a device-forming layer from a base body.
  3. Bozler Carl O. (Sudbury MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert W. (Weymouth MA), Method of producing sheets of crystalline material.
  4. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX, Process for production of semiconductor substrate.

이 특허를 인용한 특허 (82)

  1. Kazuaki Ohmi JP; Kiyofumi Sakaguchi JP; Kazutaka Yanagita JP, Composite member its separation method and preparation method of semiconductor substrate by utilization thereof.
  2. Ohmi, Kazuaki; Sakaguchi, Kiyofumi; Yanagita, Kazutaka, Composite member, its separation method, and preparation method of semiconductor substrate by utilization thereof.
  3. Joshi, Monali B.; Goorsky, Mark S., Composite semiconductor substrates for thin-film device layer transfer.
  4. Henley, Francois J.; Cheung, Nathan W., Controlled process and resulting device.
  5. Henley, Francois J.; Cheung, Nathan W., Controlled process and resulting device.
  6. Hiliali, Mohamed M.; Herner, S. Brad, Creation and translation of low-relief texture for a photovoltaic cell.
  7. Li, Zhiyong; Tanner, David; Prabhu, Gopalakrishna; Hilali, Mohamed H., Creation of low-relief texture for a photovoltaic cell.
  8. Murasko, Matthew; Kinlen, Patrick J.; Kurtz, Kenneth; Carroll, Kevin; Kiely, Michael B., Electroluminescent sign.
  9. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX, Fabrication process for a semiconductor substrate.
  10. Kiyofumi Sakaguchi JP; Takao Yonehara JP, Fabrication process of semiconductor substrate.
  11. Lochtefeld, Anthony; Leitz, Chris, Flexible monocrystalline thin silicon cell.
  12. Taylor, Thomas J., Flexible solar panel with a multilayer film.
  13. Gadkaree,Kishor Purushottam, Glass-based semiconductor on insulator structures and methods of making same.
  14. Murasko, Matthew M.; Kinlen, Patrick J., Illuminated display system and process.
  15. Murasko, Matthew; Kinlen, Patrick J., Illuminated display system and process.
  16. Murasko,Matthew; Kinlen,Patrick J., Integrated illumination system.
  17. Henley, Francois J., Layer transfer of films utilizing controlled propagation.
  18. Henley, Francois J., Layer transfer of films utilizing controlled shear region.
  19. de Souza, Joel P.; Fogel, Keith E.; Reznicek, Alexander; Schepis, Dominic J., Low defect III-V semiconductor template on porous silicon.
  20. Cornfeld, Arthur; Stan, Mark A., Metamorphic layers in multijunction solar cells.
  21. Masaaki Iwane JP; Takao Yonehara JP; Kazuaki Ohmi JP; Shoji Nishida JP; Kiyofumi Sakaguchi JP; Kazutaka Yanagita JP, Method and apparatus for producing photoelectric conversion device.
  22. Yanagita, Kazutaka; Sakaguchi, Kiyofumi, Method and apparatus for separating sample.
  23. Yanagita,Kazutaka; Sakaguchi,Kiyofumi, Method and apparatus for separating sample.
  24. Henley, Francois J., Method and structure for fabricating solar cells using a thick layer transfer process.
  25. Ghyselen,Bruno; Letertre,Fabrice; Mazure,Carlos, Method for manufacturing a free-standing substrate made of monocrystalline semiconductor material.
  26. Schulze, Hans-Joachim; Rodriguez, Francisco Javier Santos; Mauder, Anton; Baumgartl, Johannes; Ahrens, Carsten, Method for manufacturing a semiconductor device.
  27. Schulze, Hans-Joachim; Santos Rodriguez, Francisco Javier; Mauder, Anton; Baumgartl, Johannes; Ahrens, Carsten, Method for manufacturing a semiconductor device by thermal treatment with hydrogen.
  28. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Ohno, Yumiko; Tanaka, Koichiro, Method for manufacturing semiconductor apparatus, and semiconductor apparatus and electric appliance.
  29. Yamazaki, Shunpei; Ohnuma, Hideto, Method for manufacturing semiconductor device.
  30. Takayama, Toru; Arai, Yasuyuki, Method for peeling off semiconductor element and method for manufacturing semiconductor device.
  31. Takayama,Toru; Arai,Yasuyuki, Method for peeling off semiconductor element and method for manufacturing semiconductor device.
  32. Lammel, Gerhard; Benzel, Hubert; Illing, Matthias; Laermer, Franz; Kronmueller, Silvia; Farber, Paul; Armbruster, Simon; Reichenbach, Ralf; Schelling, Christoph; Feyh, Ando, Method for producing a silicon substrate having modified surface properties and a silicon substrate of said type.
  33. Brendel, Rolf, Method for producing layered structures on a substrate, substrate and semiconductor components produced according to said method.
  34. Artmann, Hans; Frey, Wilhelm; Moellendorf, Manfred, Method for production of a thin film and a thin-film solar cell, in particular, on a carrier substrate.
  35. Murasko,Matthew; Kinlen,Patrick J.; Kurtz,Kenneth; Carroll,Kevin; Kiely,Michael B., Method of forming an illuminated design on a substrate.
  36. Gottfried, Mark, Method of making an aligned electrode on a semiconductor structure.
  37. Giesbers, Jacobus Bernardus; Beenhakkers, Monique Johanna; Rijpert, Cornelis Johannus Hermanus Antonius; Gelinck, Gerwin Hermanus; Touwslager, Fredericus Johannes, Method of manufacturing a flexible electronic device and flexible device.
  38. Yonehara, Takao; Sakaguchi, Kiyofumi, Method of manufacturing a thin-film semiconductor device used for a display region and peripheral circuit region.
  39. Park,Jin woo; Chung,Ho Kyoon; Song,Seung yong, Method of manufacturing substrate, method of manufacturing organic electroluminescent display device using the method, and organic electroluminescent display device.
  40. Park,Jin woo; Chung,Ho Kyoon; Song,Seung yong, Method of manufacturing substrate, method of manufacturing organic electroluminescent display device using the method, and organic electroluminescent display device.
  41. Poortmans, Jef; Flamand, Giovanni; Bilyalov, Renat, Method of producing a semiconductor layer on a substrate.
  42. Takao Yonehara JP; Kunio Watanabe JP; Tetsuya Shimada JP; Kazuaki Ohmi JP; Kiyofumi Sakaguchi JP, Method of producing semiconductor member.
  43. Nakahata, Seiji, Method of recovering and reproducing substrates and method of producing semiconductor wafers.
  44. Ohmi, Kazuaki; Nakagawa, Katsumi; Sato, Nobuhiko; Sakaguchi, Kiyofumi; Yanagita, Kazutaka; Yonehara, Takao, Method of separating composite member and process for producing thin film.
  45. Sakaguchi, Kiyofumi; Yonehara, Takao, Method of separation of semiconductor device.
  46. Takayama, Toru; Goto, Yuugo; Maruyama, Junya; Ohno, Yumiko, Method of transferring a laminate and method of manufacturing a semiconductor device.
  47. Sivaram, Srinivasan; Agarwal, Aditya; Herner, S. Brad; Petti, Christopher J., Method to form a photovoltaic cell comprising a thin lamina.
  48. Sivaram, Srinivasan; Agarwal, Aditya; Herner, S. Brad; Petti, Christopher J., Method to form a photovoltaic cell comprising a thin lamina.
  49. Sivaram, Srinivasan; Agarwal, Aditya; Herner, S. Brad; Petti, Christopher J., Method to form a photovoltaic cell comprising a thin lamina.
  50. Tolchinsky, Peter; Yablok, Irwin; Hu, Chuan; Emery, Richard D., Methods and apparatuses for manufacturing ultra thin device layers for integrated circuit devices.
  51. Tolchinsky,Peter; Yablok,Irwin; Hu,Chuan; Emery,Richard D., Methods and apparatuses for manufacturing ultra thin device layers for integrated circuit devices.
  52. Ghyselen, Bruno; Letertre, Fabrice, Methods for fabricating final substrates.
  53. Ghyselen,Bruno; Letertre,Fabrice, Methods for fabricating final substrates.
  54. Yamazaki, Shunpei; Shimomura, Akihisa, Photoelectric conversion device and method for manufacturing the same.
  55. Hilali, Mohamed M.; Petti, Christopher J., Photovoltaic cell comprising a thin lamina having low base resistivity and method of making.
  56. Chapelon, Laurent-Luc; Cuzzocrea, Julien, Process for fabricating integrated-circuit chips.
  57. Chapelon, Laurent-Luc; Cuzzocrea, Julien, Process for fabricating integrated-circuit chips.
  58. Nishida, Shoji; Yonehara, Takao; Sakaguchi, Kiyofumi; Ukiyo, Noritaka; Iwasaki, Yukiko, Process for producing semiconductor member, and process for producing solar cell.
  59. Imada,Aya; Den,Tohru; Saito,Tatsuya, Process for producing structure, process for producing magnetic recording medium, and process for producing molded product.
  60. Sakaguchi,Kiyofumi; Yonehara,Takao, Process for production of semiconductor substrate.
  61. Nobuhiko Sato JP, Process of producing semiconductor article.
  62. Yonehara, Takao; Ito, Masataka, Process of reclamation of SOI substrate and reproduced substrate.
  63. Henley, Francois J.; Brailove, Adam, Race track configuration and method for wafering silicon solar substrates.
  64. Okuno, Naoki; Tokunaga, Hajime, SOI substrate and manufacturing method thereof.
  65. Hitoshi Iwata JP; Makoto Murate JP, Semiconductor device and method of anodization for the semiconductor device.
  66. Ghyselen, Bruno; Letertre, Fabrice, Semiconductor substrates having useful and transfer layers.
  67. Ghyselen, Bruno; Letertre, Fabrice, Semiconductor substrates having useful and transfer layers.
  68. Ghyselen, Bruno; Letertre, Fabrice, Semiconductor substrates having useful and transfer layers.
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  70. Ghyselen,Bruno; Letertre,Fabrice, Semiconductor substrates having useful and transfer layers.
  71. Malik, Igor J.; Kang, Sien G., Smoothing method for cleaved films made using a release layer.
  72. Sien G. Kang ; Igor J. Malik, Smoothing method for cleaved films made using a release layer.
  73. Igor J. Malik ; Sien G. Kang, Smoothing method for cleaved films made using thermal treatment.
  74. Sakaguchi, Kiyofumi; Sato, Nobuhiko, Substrate and production method thereof.
  75. Henley, Francois; Lamm, Al; Chow, Yi-Lei, Substrate cleaving under controlled stress conditions.
  76. Henley, Francois; Lamm, Al; Chow, Yi-Lei, Substrate cleaving under controlled stress conditions.
  77. Henley, Francois; Lamm, Al; Chow, Yi-Lei, Substrate cleaving under controlled stress conditions.
  78. Kang,Sien G.; Malik,Igor J., Surface finishing of SOI substrates using an EPI process.
  79. Brailove, Adam; Liu, Zuqin; Henley, Francois J.; Lamm, Albert J., Techniques for forming thin films by implantation with reduced channeling.
  80. Sakaguchi, Kiyofumi; Yonehara, Takao, Thin-film semiconductor device and method of manufacturing the same.
  81. Yonehara,Takao; Sakaguchi,Kiyofumi, Thin-film semiconductor device and method of manufacturing the same.
  82. Kang, Sien G.; Malik, Igor J., Treatment method of film quality for the manufacture of substrates.
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