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Methods for removal of water from gases using superheated zeolites

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
  • B01D-053/28
출원번호 US-0166987 (1998-10-06)
발명자 / 주소
  • Fraenkel Dan
  • Funke Hans H.
  • Cooper Gerald
출원인 / 주소
  • Matheson Tri-Gas, Inc.
대리인 / 주소
    Pennie & Edmonds LLP
인용정보 피인용 횟수 : 28  인용 특허 : 17

초록

A method for removing trace moisture from a gas is disclosed. The method involves heating a zeolite having a high silica-to-alumina ratio to about 400.degree. C. to remove physically absorbed water from the zeolite, followed by heating the zeolite to a temperature in excess of 650.degree. C., to for

대표청구항

[ What is claimed is:] [1.] A method for removing water from a gas, comprising contacting said gas with a zeolite which has a silica-to-alumina ratio of above about 10, wherein the zeolite has been heated prior to contacting it with said gas to a temperature above about 650.degree. C.

이 특허에 인용된 특허 (17)

  1. Ojo Adeola F. (Chatham NJ) Fitch Frank R. (Bedminister NJ) Bulow Martin (Basking Ridge NJ), Adsorptive separation of nitrogen from other gases.
  2. Brownscombe Thomas F. (Houston TX) Forschner Thomas C. (Richmond TX) Slaugh Lynn H. (Houston TX), Basic zinc-containing zeolite compositions.
  3. Sherman John D. (Chappaqua NY) Nagji Moez M. (Yonkers NY) Ross Ronald J. (Upper Nyack NY) Ausikaitis Joseph P. (Wilton CT) Garg Desh R. (Hopewell Junction NY), Drying process using chabazite-type adsorbents.
  4. Shealy James R. (Ithaca NY) Eastman Lester F. (Ithaca NY), Method and apparatus for improved gettering for reactant gases.
  5. Dong Chun Christine ; Hsiung Thomas Hsiao-Ling ; Golden Timothy Christopher, Method for removal of moisture from gaseous HCl.
  6. Alvarez ; Jr. Daniel ; Spiegelman Jeffrey J., Method for water removal from corrosive gas streams.
  7. Lansbarkis James R. (El Dorado CA) Gingrich Jon S. (Sacramento CA) Lindberg Catherine L. (Folsom CA), Methods for analysis of volatile organic compounds in water and air.
  8. Coe, Charles G.; Kuznicki, Steven M., Nitrogen adsorption process.
  9. Toyomoto Kazuo (Yokohama JPX) Terada Eigo (Kamakura JPX) Kobayashi Hiroshi (Yokohama JPX) Kageura Yoshiaki (Sagamihara JPX), Permeable polymer membrane for dessication of gas.
  10. Tom Glenn M. (New Milford CT) Brown Duncan W. (Wilton CT), Process and composition for drying of gaseous hydrogen halides.
  11. Harada Masashi (Shinnanyo JPX) Miyazaki Hiroshi (Shinnanyo JPX) Itabashi Keiji (Shinnanyo JPX), Process for preparation of synthetic mordenite molded body.
  12. Sheu Lien-Lung (Scotch Plains NJ) Blow Martin (Basking Ridge NJ), Process for the purification of nitric oxide.
  13. Sheu Lien-Lung (Scotch Plains NJ) Ramachandran Ramakrishnan (Allendale NJ) Galica Theodore R. (Glen Gardner NJ), Process for the purification of nitric oxide.
  14. Tamhankar Satish S. (Scotch Plains NJ) Ramachandran Ramakrishnan (Allendale NJ) Blow Martin (Basking Ridge NJ) Galica Theodore R. (Glen Gardner NJ), Removal of perfluorocarbons from gas streams.
  15. Rabo Jule Anthony (Armonk NY) Francis James Nelson (Peekskill NY) Angell Charles Leslie (Pleasantville NY), Selective adsorption of carbon monoxide from gas streams.
  16. Klotz Marvin R. (Batavia IL), Synthesis of crystalline aluminosilicate molecular sieves.
  17. Garney Bryan W. (Reading GB2), Zeolites.

이 특허를 인용한 특허 (28)

  1. Jha, Praveen; Vininski, Joseph V., Acetylene process gas purification methods and systems.
  2. Dong, Chun Christine; Rao, Madhukar Bhaskara; Wu, Dingjun, Adsorbent for moisture removal from fluorine-containing fluids.
  3. Jacksier, Tracey; Saint-Cyr, Karine, Apparatus for removing moisture from fluids comprising acid gases; methods of using same, and compositions.
  4. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  5. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  6. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  7. Yaluris, George; Ziebarth, Michael Scott; Zhao, Xinjin, Compositions and processes for reducing NOemissions during fluid catalytic cracking.
  8. Yaluris,George; Ziebarth,Michael Scott; Zhao,Xinjin, Compositions and processes for reducing NOemissions during fluid catalytic cracking.
  9. Yaluris, George; Ziebarth, Michael Scott; Zhao, Xinjin, Ferrierite composition for reducing NOx emissions during fluid catalytic cracking.
  10. Vininski,Joseph V.; Torres, Jr.,Robert; Houlding,Virginia H.; Spicer,Harold, Fluid purification system with low temperature purifier.
  11. Wyse, Carrie L.; Torres, Jr., Robert; Vininski, Joseph V., Fluid storage and purification method and system.
  12. Wyse, Carrie L.; Torres, Jr., Robert; Watanabe, Tadaharu; Vininski, Joseph V., Fluid storage and purification method and system.
  13. Wyse, Carrie L.; Torres, Jr., Robert; Watanabe, Tadaharu; Vininski, Joseph V., Fluid storage and purification method and system.
  14. Johnson, Marvin M.; Randolph, Bruce B., Hydrocarbon purificatin system regeneration.
  15. Jacksier, Tracey; Benesch, Robert, Increased stability low concentration gases, products comprising same, and methods of making same.
  16. Zhou,Derong; Borzio,John P.; Jursich,Gregory M.; Kebbekus,Earle R., Method and apparatus for corrosive gas purification.
  17. Hans H. Funke ; Dan Fraenkel ; Virginia H. Houlding, Method and apparatus for removing trace impurities from a gas using superactivated carbon material.
  18. Hirose, Hideki; Hachikawa, Mikio; Teramoto, Kouji, Method and apparatus for treating exhaust gases.
  19. Torres, Jr., Robert; Watanabe, Tadaharu; Vininski, Joseph V., Methods and materials for the reduction and control of moisture and oxygen in OLED devices.
  20. Chiang, Robert Ling; Whitley, Roger Dean; Wu, Dingiun; Dong, Chun Christine; Rao, Madhukar Bhaskara, Process for removing water from ammonia.
  21. Wu,Dingjun; Golden,Timothy Christopher; Dong,Chun Christine; Battavio,Paula Jean, Purification of hydride gases.
  22. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  23. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  24. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  25. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  26. Watanabe, Tadaharu; Raynor, Mark; Lau, Ade; Mangyo, Hirotaka, Removal of impurities from hydrogen-containing materials.
  27. Watanabe, Tadaharu; Raynor, Mark; Lau, Ade; Mangyo, Hirotaka, Removal of impurities from hydrogen-containing materials.
  28. Perez, Jorge E.; Meyer, Richard T., Specialty gas analysis system.
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