Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C11D-007/32
C11D-007/50
출원번호
US-0654007
(1996-05-28)
발명자
/ 주소
Lee Wai Mun
Pittman
Jr. Charles U.
Small Robert J.
출원인 / 주소
EKC Technology, Inc.
인용정보
피인용 횟수 :
27인용 특허 :
67
초록▼
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included s
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.
대표청구항▼
[ It is claimed:] [1.] An etching residue remover, comprising(a) from about 5 to about 50% by weight of at least one nucleophilic amine compound having oxidation and reduction potentials selected from the group consisting ofcompounds of formula I and salts thereof, [ STR 8 ] wherein R.sub.1, R.sub.2
[ It is claimed:] [1.] An etching residue remover, comprising(a) from about 5 to about 50% by weight of at least one nucleophilic amine compound having oxidation and reduction potentials selected from the group consisting ofcompounds of formula I and salts thereof, [ STR 8 ] wherein R.sub.1, R.sub.2, and R.sub.3 are independently hydrogen; a hydroxyl group; a substituted C.sub.1 -C.sub.6 straight, branched or cyclo alkyl, alkenyl, or alkynyl group, a substituted acyl group, straight or branched alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group, or salts or derivatives thereof, wherein at least one of R.sub.1, R.sub.2, and R.sub.3 is selected from the group consisting of a hydroxyl group; substituted C.sub.1 -C.sub.6 straight, branched, and cyclo alkyl, alkenyl, and alkynyl groups, substituted acyl groups, straight and branched alkoxy groups, amidyl groups, carboxyl groups, alkoxyalkyl groups, alkylamino groups, alkylsulfonyl groups, sulfonic acid groups, and salts and derivatives thereof; andcompounds of formula II and salts thereof, [ STR 9 ] wherein R.sub.7, R.sub.8, R.sub.9, and R.sub.10 are independently hydrogen; a hydroxyl group; a substituted C.sub.1 -C.sub.6 straight, branched or cyclo alkyl, alkenyl, or alkynyl group; a substituted acyl group, straight or branched alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group, wherein at least one of R.sub.7, R.sub.8, R.sub.9, and R.sub.10 is selected from the group consisting of a hydroxyl group; substituted C.sub.1 -C.sub.6 straight, branched, and cyclo alkyl, alkenyl, and alkynyl group; substituted acyl groups, straight and branched alkoxy groups, amidyl groups, carboxyl groups, alkoxyalkyl groups, alkylamino groups, alkylsulfonyl groups, sulfonic acid groups, and salts and derivatives thereof;(b) from about 10 to about 80% by weight of at least one alkanolamine which is miscible with the at least one nucleophilic amine compound, and has the formula R.sub.22 R.sub.23 --N--CH.sub.2 CH.sub.2 --O--CH.sub.2 CH.sub.2 OH, wherein R.sub.22, and R.sub.23 can be H, CH.sub.3, CH.sub.3 CH.sub.2, or CH.sub.2 CH.sub.2 OH;(c) an effective amount of up to about 30% by weight of at least one compound selected from the group consisting of a compound of formula III, [ STR 10 ] wherein n=1-4, m=2-5 and R is independently hydrogen, a substituted C.sub.1 -C.sub.6 straight, branched or cyclic alkyl, alkenyl, or alkynyl group, a substituted acyl group, straight or branched chain alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group,a compound of formula IV, [ STR 11 ] where R.sub.17 is OH or COOH, an ethylene diamine tetracarboxylic acid of formula V, [ STR 12 ] where R.sub.18, R.sub.19, R.sub.20 and R.sub.21 can be either H or NH.sub.4, and an ammonium salt thereof, andan alkyl ammonium hydroxide of formula VI,EQU R.sub.11 R.sub.12 R.sub.13 R.sub.14 NOH rein R.sub.11, R.sub.12, R.sub.13 and R.sub.14 are each, independently, a short chain alkyl group having from 1 to 5 carbon atoms;wherein said compound is effective to assist in cleaning by retaining etching residue in the cleaning solution and thereby avoiding resettling of the residue onto a substrate and serves as a stabilizing agent to provide long term effectiveness to the composition; and(d) a balance of water, wherein the at least one nucleophilic amine compound, the at least one alkanolamine and the at least one compound are present in sufficient amounts to remove etching residue from a substrate.
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