초록 ▼

A gallium nitride group compound semiconductor light-emitting device comprises a substrate and a layered structure provided on the substrate. The layered structure includes: an active layer; an upper cladding layer and a lower cladding layer which is located closer to the substrate than the upper cl

A gallium nitride group compound semiconductor light-emitting device comprises a substrate and a layered structure provided on the substrate. The layered structure includes: an active layer; an upper cladding layer and a lower cladding layer which is located closer to the substrate than the upper cladding layer, the active layer interposed between the cladding layers; an internal current constricting layer having an opening for constricting a current within a selected region of the active layer, the internal current constricting layer being provided on the upper cladding layer; a surface protecting layer for covering the internal current constricting layer and an exposed surface of the upper cladding layer in the opening of the internal current constricting layer; and a regrowth layer provided on the surface protecting layer. The surface protecting layer serves as a protecting layer for the upper cladding layer and the internal current constricting layer in a step of forming the regrowth layer.

대표청구항 ▼

[ What is claimed is:] [1.] A gallium nitride group compound semiconductor light-emitting device comprising a substrate and a layered structure provided on the substrate,the layered structure including:an active layer;an upper cladding layer and a lower cladding layer which is located closer to the

[ What is claimed is:] [1.] A gallium nitride group compound semiconductor light-emitting device comprising a substrate and a layered structure provided on the substrate,the layered structure including:an active layer;an upper cladding layer and a lower cladding layer which is located closer to the substrate than the upper cladding layer, the active layer interposed between the cladding layers;an internal current constricting layer having an opening for constricting a current within a selected region of the active layer, the internal current constricting layer being provided on the upper cladding layer;a surface protecting layer for covering the internal current constricting layer and an exposed surface of the upper cladding layer in the opening of the internal current constricting layer, anda regrowth layer provided on the surface protecting layer, rein the surface protecting layer serves as a protecting layer for the upper cladding layer and the internal current constricting layer in a step of forming the regrowth layer; andwherein a high impurity concentration region is provided near the exposed surface of the upper cladding layer in the opening; andwherein a re-evaporation layer having an opening in a region corresponding to the opening of the internal current constricting layer is provided between the upper cladding layer and the internal current constricting layer.