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Method for wide range gas flow system with real time flow measurement and correction 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G05D-007/06
출원번호 US-0318880 (1999-05-26)
발명자 / 주소
  • Brown Timothy R.
출원인 / 주소
  • Cyber Instrument Technologies LLC
대리인 / 주소
    Dan Hubert & Assoc.
인용정보 피인용 횟수 : 80  인용 특허 : 18

초록

A gas delivery system accurately measures and optionally regulates mass flow rate in real time. A fluid conduit connects an inlet valve, calibration volume, flow restrictor, and outlet valve in series. Pressure and temperature sensors are coupled to the calibration volume. One or more pressure senso

대표청구항

[ What is claimed is:] [1.] A method of measuring mass flow in a gas delivery system, comprising operations of:charging a calibration volume with a process gas;starting a flow of the process gas from the calibration volume into a flow path; during gas flow,repeatedly utilizing one or more sensors do

이 특허에 인용된 특허 (18)

  1. Gimson Christopher J. (Westhoughton GBX), Apparatus for calibrating a fluid mass flowmeter.
  2. Berrettini Bruce Joseph (Allentown PA), Apparatus for proving and calibrating cryogenic flow meters.
  3. Forbes Gregory Russell, Apparatus to check calibration of mass flow controllers.
  4. Ramamurthi Krishnamoorthy (Dallas TX), Apparatus, systems, and methods for diagnosing anomalous mass flow controller operation.
  5. Lisle Raymond V. (Indialantic FL) Wilson Terry L. (Cocoa FL), Automatic flowmeter calibration system.
  6. Ortiz Marcos German ; Boucher Timothy J., Device and method for measuring multi-phase fluid flow and density of fluid in a conduit having a gradual bend.
  7. Hecht Hans,DEX ; Rilling Heinz,DEX ; Lehenberger Stefan,DEX ; Konzelmann Uwe,DEX, Device for measuring the mass of a flowing medium.
  8. Wilmer Michael E., Dynamic gas flow controller.
  9. Sudo Yoshihisa (Shiki JPX) Ito Minoru (Inagi JPX), Flow quantity test system for mass flow controller.
  10. Jepson Peter (Whitley Bay GB2) Tofield Graham M. (Northwich GB2), Fluid meter.
  11. Vander Heyden William H. (Mequon WI), Gas density meter and method.
  12. Sivaramakrishnan Visweswaren ; Wang Yen-Kun ; Chang Fong ; Pham Thanh ; Plante Jeff, In-situ liquid flow rate estimation and verification by sonic flow method.
  13. Shimomura Mitsuzo (Miyanohigashi JPX) Yamaguchi Masao (Miyanohigashi JPX), Mass flow controller with supplemental condition sensors.
  14. Adney Billy R. (Orange TX) Alworth Charles W. (Ponca City OK) Durkee John B. (Ponca City OK) Jeffries Bryce T. (Ponca City OK), Mass flowmeter apparatus.
  15. Francisco ; Jr. Edward E. (Paradise Valley AZ) Cohrs Gary D. (Tempe AZ) Smith Samuel H. (Phoenix AZ), Method and apparatus for calibrating a flowmeter using a master meter and a prover.
  16. Wang Tak K. (Havertown PA) Wikfors Edwin E. (Landenberg PA), Method and apparatus for improved flow and pressure measurement and control.
  17. Kennedy Lyn R. (Dallas TX), Method and apparatus for measuring and controlling volumetric flow rate of gases in a line.
  18. Sierk Dennis A. (Huntsville AL) DuRoss Ronald R. (Huntsville AL) Geist Stephen G. (Union Grove AL) Hayes Gregory L. (Fayetteville TN), Process gas distribution system and method.

이 특허를 인용한 특허 (80)

  1. Carpenter, Kent; Dietz, James, Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels.
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  3. den Hartog Besselink, Edwin; Garssen, Adriaan; Dirkmaat, Marco, Cassette holder assembly for a substrate cassette and holding member for use in such assembly.
  4. Mohammed, Balarabe Nuhu; Barros, Philip; Martin, Raul A.; Crockett, Mark A.; Sklar, Eric S., Combination manual/pneumatic shut-off valve.
  5. Bringedal, Bjørn Øyvind; Birkemoe, Egil; Morud, Svein Arne; Melbø, Hallgeir, Detection of water breakthrough.
  6. Coakley, Kim L.; Bessinger, Russell L.; Blake, Rex J., Digitally controlled direct drive valve and system and method for manufacturing the same.
  7. Eick,Chris D.; Shelby,Dugan; Harkey,John R., Enhanced accuracy fuel metering system and method.
  8. Mudd, Daniel T.; Mudd, Patti J., Flow control system, method, and apparatus.
  9. Schumacher, Mark S.; Broden, David A.; Wiklund, David E., Flow instrument with multisensors.
  10. Takijiri, Kotaro; Tanaka, Yuki; Ieki, Atsushi, Flow rate control apparatus, storage medium storing program for flow rate control apparatus and flow rate control method.
  11. Goto, Takao; Tanaka, Makoto, Flow rate control using mass flow rate control device.
  12. White, William W.; White, William H.; Davis, Christopher B.; Smith, Nelson D., Fluid flow controller and method of operation.
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  18. Gold, Ezra Robert; Fovell, Richard Charles; Cruse, James Patrick; Lee, Jared Ahmad; Geoffrion, Bruno; Buchberger, Douglas Arthur; Salinas, Martin J., Method and apparatus for controlling gas flow to a processing chamber.
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  25. Ding, Junhua; Benedict, Scott; Pisera, Jaroslaw, Method and apparatus for multiple-channel pulse gas delivery system.
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  30. Lin, Yu-An; Lin, Long-Wen; Lai, Wen-Cheng; Lin, Chang-Ping, Method and apparatus for regulating exhaust pressure in evacuation system of semiconductor process chamber.
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  33. Tison,Stuart A.; Sukumaran,Sandeep; Barker,James, Method and system for flow measurement and validation of a mass flow controller.
  34. Tison,Stuart A.; Sukumaran,Sandeep; Barker,James, Method and system for flow measurement and validation of a mass flow controller.
  35. Vukovic, Mirko, Method and system for measuring a flow rate in a solid precursor delivery system.
  36. Annapragada, Rao V.; Turmel, Odette; Takeshita, Kenji; Zheng, Lily; Choi, Thomas S.; Pirkle, David R., Method for providing uniform removal of organic material.
  37. Lee, Choong Man; Yoo, Yong Min; Kim, Young Jae; Chun, Seung Ju; Kim, Sun Ja, Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method.
  38. Downie, Neil Alexander, Method of, and apparatus for, regulating the mass flow rate of a gas.
  39. Lull, John Michael; Wang, Chiun; Saggio, Jr., Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
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  42. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  43. Raisanen, Petri; Givens, Michael Eugene, Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures.
  44. Larson, Dean J.; Hefty, Robert C.; Tietz, James V.; Kennedy, William S.; Lenz, Eric H.; Denty, Jr., William M.; Magni, Enrico, Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber.
  45. Lowery, Patrick A., Non-clogging flow restriction for pressure based flow control devices.
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