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Electrochemical removal of material in electron-emitting device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25F-003/00
출원번호 US-0884701 (1997-06-30)
발명자 / 주소
  • Porter John D.
  • Chakarova Gabriela S.
출원인 / 주소
  • Candescent Technologies Corporation
대리인 / 주소
    Skjerven, Morrill, MacPherson, Franklin, & Friel LLPMeetin
인용정보 피인용 횟수 : 3  인용 특허 : 27

초록

An electrochemical procedure is employed to selectively remove certain material from a structure without significantly electrochemically attacking other material of the same chemical type as the removed material. The material to be removed constitutes part or all of an electrically non-insulating re

대표청구항

[ We claim:] [1.] A method comprising the steps of:providing an initial structure in which (a) a first electrically non-insulating region comprises first material and (b) a second electrically non-insulating region largely electrically decoupled from the first region comprises the first material; an

이 특허에 인용된 특허 (27)

  1. Bernhardt Anthony F. (Berkeley CA) Contolini Robert J. (Pleasanton CA), Electrochemical planarization.
  2. Spindt Christopher J. ; Chakarova Gabriela S. ; Nikolova Maria S. ; Searson Peter C. ; Haven Duane A. ; Knall Nils Johan ; Macaulay John M. ; Barton Roger W., Electrochemical removal of material, particularly excess emitter material in electron-emitting device.
  3. Datta Madhav (Yorktown Heights NY) Romankiw Lubomyr T. (Briarcliff Manor NY), Electrochemical tool for uniform metal removal during electropolishing.
  4. Swartz George A. (North Brunswick NJ), Electrolytic etch for eliminating shorts and shunts in large area amorphous silicon solar cells.
  5. Tomii Kaoru (Isehara JPX) Kaneko Akira (Tokyo JPX) Kanno Toru (Kawasaki JPX), Electron-emitting device and process for making the same.
  6. Spindt Christopher J. (Menlo Park CA) Macaulay John M. (Palo Alto CA), Electron-emitting devices having variously constituted electron-emissive elements, including cones or pedestals.
  7. Macaulay John M. (Palo Alto CA) Searson Peter C. (Baltimore MD) Duboc ; Jr. Robert M. (Menlo Park CA) Spindt Christopher J. (Menlo Park CA), Fabrication of filamentary field-emission device, including self-aligned gate.
  8. Tomii Kaoru (Isehara JPX) Kaneko Akira (Tokyo JPX) Kanno Toru (Kawasaki JPX), Field emission cathodes and method of manufacture thereof.
  9. Porter John D. ; Chakarova Gabriela S. ; Knall N. Johan ; Spindt Christopher J., Field emitter fabrication using open circuit electrochemical lift off.
  10. Fahlen Theodore S. (San Jose CA) Duboc ; Jr. Robert M. (Menlo Park CA) Lovoi Paul A. (Saratoga CA), Internal support structure for flat panel device.
  11. Playdon Terence S. (Transvaal ZAX), Metal etching process and composition.
  12. Imai Yuji (Chiba JPX), Metal layer patterning method.
  13. Stengl Reinhard (Stadtbergen DEX) Meul Hans-Willi (Bruckmuehl DEX) Hoenlein Wolfgang (Unterhaching DEX), Method for manufacturing an electrically conductive tip composed of a doped semiconductor material.
  14. Lee Kangok (Suwon KRX), Method for manufacturing field emission display.
  15. DeMercurio Thomas A. (Beacon NY) Wong Kwong H. (Wappinger Falls NY) Yu Roy (Wappinger Falls NY), Method for producing planar field emission structure.
  16. Hom-ma Yoshio (Hachioji JPX) Nozawa Hisao (Hinodemachi JPX) Sato Akira (Hachioji JPX) Harada Seiki (Hachioji JPX), Method of forming an interconnection.
  17. Okino Hironobu (Kawasaki JPX) Fujiwara Akio (Chigasaki JPX) Akiba Yutaka (Fujisawa JPX) Kasukabe Susumu (Yokohama JPX) Fujita Tsuyoshi (Yokohama JPX) Mitani Masao (Yokohama JPX) Hirota Kazuo (Chigasa, Method of manufacturing probing head for testing equipment of semi-conductor large scale integrated circuits.
  18. Fukase Shigeo (Uenohara JA) Kawabe Ushio (Hamura JA), Method of manufacturing thin-film field-emission electron source.
  19. Goronkin Herbert (Scottsdale AZ) Kane Robert C. (Woodstock IL), Non-planar field emission device having an emitter formed with a substantially normal vapor deposition process.
  20. Borel Michel (Le Touvet FRX) Boronat Jean-Francois (Grenoble FRX) Meyer Robert (St Ismier FRX) Rambaud Philippe (Grenoble FRX), Process for the production of a display means by cathodoluminescence excited by field emission.
  21. Meyer Robert (St Nazaire-les Eymes FRX) Borel Michel (St. Vincent de Mercuze FRX) Bruni Marie-Dominique (La Tronche FRX), Process for the production of a microtip electron source.
  22. Lovoi Paul A. (Saratoga CA), Self supporting flat video display.
  23. MacDonald Noel C. (Ithaca) Spallas James P. (Ithaca NY), Silicon tip field emission cathode arrays and fabrication thereof.
  24. Curtin Christopher J. (Cupertino CA) Nowicki Ronald S. (Sunnyvale CA) Fahlen Theodore S. (San Jose CA) Duboc ; Jr. Robert M. (Menlo Park CA) Lovoi Paul A. (Saratoga CA), Structure of light-emitting device with raised black matrix for use in optical devices such as flat-panel cathode-ray tu.
  25. Yuito Isamu (Hachioji JA) Sato Kikuji (Kokubunji JA) Hirano Mikio (Ohme JA), Thin-film field-emission electron source and a method for manufacturing the same.
  26. Hunter Ian W. (6 Oakdale La. Lincoln MA 01773) Lafontaine Serge R. (11 Mill St. Extention Lincoln MA 01773) Madden John D. (3290 Cypress St. Vancouver B.C. CAX V6J 3N6 ), Three dimensional microfabrication by localized electrodeposition and etching.
  27. Spindt Christopher J. (Menlo Park CA) Macaulay John M. (Palo Alto CA) Duboc ; Jr. Robert M. (Menlo Park CA) Searson Peter C. (Baltimore MD), Use of charged-particle tracks in fabricating gated electron-emitting devices.

이 특허를 인용한 특허 (3)

  1. Toyoda,Naoyuki; Kawase,Tomomi, Color filter, manufacturing method thereof, electrooptical device and electronic equipment.
  2. Mori,Yoshiaki; Miyakawa,Takuya; Sato,Mitsuru; Asuke,Shintaro; Takagi,Kenichi, Mask forming and removing method, and semiconductor device, an electric circuit, a display module, a color filter and an emissive device manufactured by the same method.
  3. John D. Porter ; Michael P. Skinner ; Stephanie Simmons, Polycarbonate-containing liquid chemical formulation and methods for making and using polycarbonate film.
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