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Method and apparatus for sequencing wafers in a multiple chamber, semiconductor wafer processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-007/00
출원번호 US-0033822 (1998-03-03)
발명자 / 주소
  • Nguyen Thu
  • Lavi Michal
출원인 / 주소
  • Applied Materials Inc.
대리인 / 주소
    Thomason Moser Patterson
인용정보 피인용 횟수 : 97  인용 특허 : 4

초록

A method and apparatus for controlling a multiple chamber semiconductor wafer processing system. The processing system includes a plurality of process chambers about the periphery of the transfer chamber. A centrally located wafer transfer mechanism effects moving wafers between the process chambers

대표청구항

[ What is claimed is:] [1.] A semiconductor wafer processing system comprising:a plurality of process chambers;a transfer chamber, centrally located among said plurality of process chambers, containing a transfer mechanism that transports wafers between the process chambers;a sequence task controlle

이 특허에 인용된 특허 (4)

  1. Kiriseko Tadashi (Kanagawa JPX) Tani Hiromichi (Kawasaki JPX) Soma Noriko (Yokohama JPX) Shigemi Nobuhisa (Kawasaki JPX) Toyoda Takayuki (Yokkaichi JPX), Continuous semiconductor substrate processing system.
  2. Hawthorne Jeffrey Scott ; Dillon David Michael ; Chaney Gregory R. ; Lopez Benjamin L., Gridlock detection and alleviation for pneumatic carrier systems.
  3. Jevtic Dusan, Method and apparatus for priority based scheduling of wafer processing within a multiple chamber semiconductor wafer pr.
  4. Kotani Norihiko (Itami JPX), Method for producing semiconductor devices.

이 특허를 인용한 특허 (97)

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