초록 ▼

Various methods of fabricating a reticle are provided. In one aspect, a pattern of opaque structures is formed on a plate capable of transmitting electromagnetic radiation. Adjacently positioned angled surfaces of the opaque structures are identified. Preselected portions of the opaque structures th

Various methods of fabricating a reticle are provided. In one aspect, a pattern of opaque structures is formed on a plate capable of transmitting electromagnetic radiation. Adjacently positioned angled surfaces of the opaque structures are identified. Preselected portions of the opaque structures that encompass the adjacently positioned angled surfaces are then removed by ion-beam milling or other methods. Reticle patterns may be customized by modifying the structures of adjacent polygon structures that could otherwise give rise to diffraction-induced patterning errors on resist layers.

대표청구항 ▼

[ What is claimed is:] [1.] A method of fabricating a reticle, comprising the steps of:forming a pattern of opaque structures on a plate capable of transmitting electromagnetic radiation;identifying an interior corner of one of the opaque structures, an exterior corner of another of the opaque struc

[ What is claimed is:] [1.] A method of fabricating a reticle, comprising the steps of:forming a pattern of opaque structures on a plate capable of transmitting electromagnetic radiation;identifying an interior corner of one of the opaque structures, an exterior corner of another of the opaque structures that is adjacent to the interior corner, and a gap between the interior corner and the exterior corner; andremoving portions of the interior and exterior corners to enlarge the gap and thereby reduce diffraction induced image rounding errors proximate the interior and exterior corners.