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Dielectric catalyst structures 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01J-023/58
  • F01N-003/10
  • B32B-013/04
  • H01L-023/48
출원번호 US-0900404 (1997-07-25)
발명자 / 주소
  • Naeem Munir-ud-Din
출원인 / 주소
  • International Business Machines Corporation
대리인 / 주소
    Neff
인용정보 피인용 횟수 : 7  인용 특허 : 46

초록

A reactor for corona destruction of volatile organic compounds (VOCs), a multi-surface catalyst for the reactor and a method of making the catalyst for the reactor. The reactor has a catalyst of a high dielectric material with an enhanced surface area. A catalyst layer stack is formed by depositing

대표청구항

[ I claim:] [1.] A catalyst structure comprising:a substrate;a first layer of dielectric material having a high dielectric constant disposed on a first surface of said substrate;a first electrically conducting layer disposed over said first dielectric material layer; anda second layer of dielectric

이 특허에 인용된 특허 (46)

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  19. Lowther ; Frank Eugene, Electrodesorption system for regenerating a dielectric adsorbent bed.
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  23. Wen Zhongmin,JPX, High temperature superconducting Josephson device and method for manufacturing the same.
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  25. Wu Shye-Lin,TWX, MOSFET with a high permitivity gate dielectric.
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  33. Yamamoto Toshiaki (Chapel Hill NC), Methods and apparatus for controlling toxic compounds using catalysis-assisted non-thermal plasma.
  34. Nashimoto Keiichi,JPX, Oriented ferroelectric thin film element.
  35. Leyrer Juergen (Alzenau DEX) Lox Egbert (Hanau DEX) Engler Bernd (Hanau DEX) Domesle Rainer (Alzenau DEX), Oxidative diesel control catalyst.
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이 특허를 인용한 특허 (7)

  1. Sato, Hideto; Saito, Yoshinori, Catalyst for reforming hydrocarbon gas, method of manufacturing the same, and method of manufacturing synthesized gas.
  2. Coupland, Duncan Roy, Catalyst manufacturing method.
  3. Coupland, Duncan Roy, Catalyst manufacturing method.
  4. Coupland, Duncan Roy, Catalyst manufacturing method.
  5. Fujdala, Kyle L.; Truex, Timothy J.; Jia, Jifei, Engine exhaust catalysts containing palladium-gold.
  6. Mark David Hemingway, Non-thermal plasma exhaust NOx reactor.
  7. Mihara Satoru,JPX, Sputtering film forming method, sputtering film forming equipment, and semiconductor device manufacturing method.
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