초록 ▼

The present invention is directed at a method and device for manufacturing a preform. The method involves arranging a starting body within a channel as defined by a vessel. Then, the channel is supplied with a reactive gas containing a coating material precursor. A resonator then generates a plasma

The present invention is directed at a method and device for manufacturing a preform. The method involves arranging a starting body within a channel as defined by a vessel. Then, the channel is supplied with a reactive gas containing a coating material precursor. A resonator then generates a plasma zone within the channel. The starting body is aligned in the channel such that the plasma zone concentrically surrounds the starting body. The axial movement of the resonator relative to the starting body is controlled such that a desired layer of coating material precursor reactively deposits on the starting body to form the preform. The method suppresses deposition on the inside of the vessel via suppressing means, which may involve inducing nodes in the E-field at the vessel walls, or using an suppressing gas on the inner surface of the vessel, or a combination of the two. The present invention is also directed at a device to facilitate the aforementioned method.

대표청구항 ▼

[ What is claimed is:] [1.] A method for manufacturing a preform comprising the steps of:a. arranging a dielectric starting body within a tubular vessel, said vessel defines a channel, wherein said tubular vessel has two concentric walls restricting an annular volume;b. supplying said channel with a

[ What is claimed is:] [1.] A method for manufacturing a preform comprising the steps of:a. arranging a dielectric starting body within a tubular vessel, said vessel defines a channel, wherein said tubular vessel has two concentric walls restricting an annular volume;b. supplying said channel with a reactive gas containing a coating material precursor;c. generating a plasma zone in said channel via a resonator;d. aligning said starting body in said vessel such that said plasma zone concentrically envelopes said starting body;e. controlling axial movement of said resonator relative to, said starting body such that a desired layer of coating material reactively deposits on said starting body to form said preform;f. employing a step for suppressing deposition on inside surfaces of said vessel, which further comprises:f.sub.1. permeating a suppressing gas through an inner wall surface of said tubular vessel; andf.sub.2. configuring said resonator in such a way as to generate only an E.sub.020 field configuration whose E-field is equal to zero on said vessel's inside walls and whose E-field reaches its maximum value on said starting body's periphery.