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Corrosion-resistant member, wafer-supporting member, and method of manufacturing the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C04B-041/00
출원번호 US-0102582 (1998-06-23)
우선권정보 JP0325171 (1997-11-12)
발명자 / 주소
  • Ohashi Tsuneaki,JPX
  • Araki Kiyoshi,JPX
  • Shimura Sadanori,JPX
  • Katsuda Yuji,JPX
출원인 / 주소
  • NGK Insulators, Ltd., JPX
대리인 / 주소
    Parkhurst & Wendel, LLP
인용정보 피인용 횟수 : 45  인용 특허 : 6

초록 ▼

This invention relates to a corrosion-resistant member having a resistance to plasma of a halogen based corrosive gas, which comprises a main body and a corrosion-resistant layer formed on a surface of the main body and containing a fluoride of at least one element selected from the group consisting

대표청구항 ▼

[ What is claimed is:] [1.] A wafer-supporting member exposed to a plasma of a halogen based corrosive gas, said member comprising (1) a main body made of a material selected from the group consisting of a silicon nitride, a silicon carbide, alumina, boron carbide, silicon oxide, and an aluminum nit

이 특허에 인용된 특허 (6)

  1. Kasori Mituo (Kawasaki JPX) Shinozaki Kazuo (Tokyo JPX) Anzai Kazuo (Tokyo JPX) Takano Takeshi (Samukawa JPX), Aluminum nitride sintered body.
    상세보기
  2. Kasori Mituo (Kawasaki JPX) Shinozaki Kazuo (Tokyo JPX) Anzai Kazuo (Tokyo JPX) Tsuge Akihiko (Yokohama JPX), Aluminum nitride sintered body and process for producing the same.
    상세보기
  3. Miyahara Kenichiro (Kokubu JPX), Aluminum nitride sintered body and production thereof.
    상세보기
  4. Ueno Fumio (Yokohama JPX) Kasori Mitsuo (Kawasaki JPX) Horiguchi Akihiro (Fujisawa JPX) Oh-Ishi Katsuyoshi (Kawasaki JPX), Aluminum nitride sintered body, method for manufacturing the same, and ceramic circuit board.
    상세보기
  5. Taniguchi Hitofumi (Chigasaki JPX) Kuramoto Nobuyuki (Sagamihara JPX), Sinterable aluminum nitride composition, sintered body from this composition and process for producing the sintered body.
    상세보기
  6. Sawamura Kentaro (Tokyo JPX) Kosaka Yoshio (Tokyo JPX) Yamaguchi Masayasu (Tokyo JPX), Sintered aluminum nitride body and method for making.
    상세보기

이 특허를 인용한 특허 (45)

  1. Saigusa, Hidehito; Takase, Taira; Mitsuhashi, Kouji; Nakayama, Hiroyuki, Apparatus for an improved deposition shield in a plasma processing system.
    상세보기
  2. Lingampalli, Ramkishan Rao, Article for use in a semiconductor processing chamber and method of fabricating same.
    상세보기
  3. Escher,Gary; Allen,Mark A., Barrier layer for a processing element and a method of forming the same.
    상세보기
  4. Aihara, Yasufumi; Matsuda, Hiroto; Nobori, Kazuhiro; Kato, Tsutomu, Ceramic member and manufacturing method for the same.
    상세보기
  5. Masahiro Nakahara JP; Yumiko Itoh JP, Ceramic member resistant to halogen-plasma corrosion.
    상세보기
  6. Chang, Hsin-Pei; Chen, Wen-Rong; Chiang, Huann-Wu; Chen, Cheng-Shi; Li, Cong, Coated glass article and method for manufacturing same.
    상세보기
  7. Iacovangelo, Charles Dominic; Lou, Victor Lienkong, Coating structure and method.
    상세보기
  8. Won Bang ; Chen-An Chen ; Shankar Venkataraman ; Ajay Bhatnagar, Corrosion resistant coating.
    상세보기
  9. Takai Yasushi,JPX, Corrosion-resistant composite oxide material.
    상세보기
  10. Araki, Kiyoshi, Corrosion-resistant member and method of producing the same.
    상세보기
  11. Maeda,Takao; Shima, legal representative,Yuko; Shima, deceased,Satoshi, Electrostatic chuck.
    상세보기
  12. Kaushal, Tony S.; Wang, You; Kumar, Ananda H., Erosion-resistant components for plasma process chambers.
    상세보기
  13. Lee, Chengtsin; Sun, Jennifer Y., Fluoride glazes from fluorine ion treatment.
    상세보기
  14. Watanabe, Morimichi, Heat-resistant structural body, halogen-based corrosive gas-resistant material and halogen-based corrosive gas-resistant structural body.
    상세보기
  15. Takao Kitagawa JP; Masayuki Ishizuka JP; Kazunori Endou JP; Masayuki Hashimoto JP; Tsuyoshi Nagata JP, Heating apparatus.
    상세보기
  16. Sebastien Raoux, Implanatation process for improving ceramic resistance to corrosion.
    상세보기
  17. Mitsuhashi, Kouji; Nakayama, Hiroyuki; Nagayama, Nobuyuki; Moriya, Tsuyoshi; Nagaike, Hiroshi, Internal member of a plasma processing vessel.
    상세보기
  18. Mitsuhashi, Kouji; Nakayama, Hiroyuki; Nagayama, Nobuyuki; Moriya, Tsuyoshi; Nagaike, Hiroshi, Internal member of a plasma processing vessel.
    상세보기
  19. Mitsuhashi, Kouji; Nakayama, Hiroyuki; Nagayama, Nobuyuki; Moriya, Tsuyoshi; Nagaike, Hiroshi, Internal member of a plasma processing vessel.
    상세보기
  20. Lee, Chengtsin; Sun, Jennifer Y., Low temperature fluoride glasses and glazes.
    상세보기
  21. Nishimoto, Shinya; Mitsuhashi, Kouji; Nakayama, Hiroyuki, Method and apparatus for an improved baffle plate in a plasma processing system.
    상세보기
  22. Nishimoto,Shinya; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved baffle plate in a plasma processing system.
    상세보기
  23. Saigusa, Hidehito; Takase, Taira; Mitsuhashi, Kouji; Nakayama, Hiroyuki, Method and apparatus for an improved baffle plate in a plasma processing system.
    상세보기
  24. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved baffle plate in a plasma processing system.
    상세보기
  25. Saigusa, Hidehito; Takase, Taira; Mitsuhashi, Kouji; Nakayama, Hiroyuki, Method and apparatus for an improved bellows shield in a plasma processing system.
    상세보기
  26. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved bellows shield in a plasma processing system.
    상세보기
  27. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved deposition shield in a plasma processing system.
    상세보기
  28. Nishimoto, Shinya; Mitsuhashi, Kouji; Saigusa, Hidehito; Takase, Taira; Nakayama, Hiroyuki, Method and apparatus for an improved optical window deposition shield in a plasma processing system.
    상세보기
  29. Nishimoto,Shinya; Mitsuhashi,Kouji; Saigusa,Hidehito; Takase,Taira; Nakayama,Hiroyuki, Method and apparatus for an improved optical window deposition shield in a plasma processing system.
    상세보기
  30. Saigusa, Hidehito; Takase, Taira; Mitsuhashi, Kouji; Nakayama, Hiroyuki, Method and apparatus for an improved upper electrode plate in a plasma processing system.
    상세보기
  31. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved upper electrode plate in a plasma processing system.
    상세보기
  32. Nishimoto, Shinya; Mitsuhashi, Kouji; Nakayama, Hiroyuki, Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system.
    상세보기
  33. Nishimoto,Shinya; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system.
    상세보기
  34. Fink, Steven T., Method and apparatus for improved baffle plate.
    상세보기
  35. Escher, Gary; Allen, Mark A.; Kudo, Yasuhisa, Method for adjoining adjacent coatings on a processing element.
    상세보기
  36. Wu, Xiaowei; Fenwick, David; Sun, Jennifer Y.; Zhan, Guodong, Multi-layer plasma resistant coating by atomic layer deposition.
    상세보기
  37. Fink, Steven T., Plasma processing system and baffle assembly for use in plasma processing system.
    상세보기
  38. Otsuki, Hayashi, Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film.
    상세보기
  39. Otsuki, Hayashi, Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film.
    상세보기
  40. Sun, Jennifer Y.; Duan, Ren-Guan; Collins, Kenneth S., Protective coatings resistant to reactive plasma processing.
    상세보기
  41. Sun, Jennifer Y; Duan, Ren-Guan; Collins, Kenneth S, Semiconductor processing apparatus with protective coating including amorphous phase.
    상세보기
  42. Rossman, Kent, Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput.
    상세보기
  43. Rossman, Kent, Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput.
    상세보기
  44. Ranish, Joseph M., Sol gel coated support ring.
    상세보기
  45. Aihara,Yasufumi; Matsuda,Hiroto, Yttria sintered body, electrostatic chuck, and manufacturing method of yttria sintered body.
    상세보기

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