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Synthetic silica glass used with uv-rays and method producing the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-003/06
  • C03B-009/10
  • C03B-019/14
  • G02B-001/00
출원번호 US-0214894 (1999-01-14)
우선권정보 JP0224450 (1997-08-07)
국제출원번호 PCT/EP98/02965 (1998-05-20)
§371/§102 date 19990114 (19990114)
국제공개번호 WO-9852879 (1998-11-26)
발명자 / 주소
  • Ohashi Norio,JPX
  • Kuriyama Michiyo,JPX
  • Yamagata Shigeru,JPX
  • Sunada Shigemasa,JPX
출원인 / 주소
  • Shin-Etsu Quartz Products Co., Ltd., JPX
대리인 / 주소
    Milde, Hoffberg & Macklin, LLP
인용정보 피인용 횟수 : 24  인용 특허 : 7

초록

An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe.sub.2 excimer lamps, and to provide a meth

대표청구항

[ What is claimed is:] [1.] A synthetic silica glass optical material for use with ultraviolet rays in the wavelength region from 165 to 195 nm, made from ultra-high purity synthetic silica glass, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation in OH-group concentra

이 특허에 인용된 특허 (7)

  1. Yosiaki Ise (Yamagata JPX) Kazuo Asajima (Fukui-ken JPX) Shinichi Okosi (Yamagata JPX) Hiroyuki Kimura (Fukui JPX), Manufacturing method and equipment for large, high-purity flat or curved quartz glass plate.
  2. Maxon John E. (Canton NY), Method and containment vessel for producing fused silica glass and the fused silica blank produced.
  3. Nishimura Hiroyuki (Fukushima JPX) Fujinoki Akira (Fukushima JPX) Matsuya Toshikatsu (Fukushima JPX) Inaki Kyoichi (Fukushima JPX) Kato Toshiyuki (Fukushima JPX) Shimada Atsushi (Fukushima JPX), Optical member of synthetic quartz glass for excimer lasers and method for producing same.
  4. Hiraiwa Hiroyuki (Yokohama JPX) Nakagawa Kazuhiro (Hachioji JPX) Jinbo Hiroki (Kawasaki JPX) Takano Jun (Sagamihara JPX) Fujiwara Seishi (Sagamihara JPX), Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member productio.
  5. Komine Norio (Sagamihara JPX) Jinbo Hiroki (Kawasaki JPX) Fujiwara Seishi (Sagamihara JPX) Hiraiwa Hiroyuki (Yokohama JPX), Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member productio.
  6. Komine Norio (Sagamihara JPX) Jinbo Hiroki (Kawasaki JPX) Fujiwara Seishi (Sagamihara JPX) Hiraiwa Hiroyuki (Yokohama JPX), Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member productio.
  7. Fujinoki Akira,JPX ; Sugama Akihiko,JPX ; Kataoka Masaatsu,JPX ; Englisch Wolfgang,DEX, Synthetic silica glass formed article for optical use.

이 특허를 인용한 특허 (24)

  1. Wilson, Lauren; Chimmalgi, Anant; Panzer, Matthew; Bezel, Ilya, Broadband light source including transparent portion with high hydroxide content.
  2. Mizuguchi,Masafumi; Komine,Norio, Exposure apparatus and optical component for the same.
  3. Winnen, Michael Peter; Springer, Todd R., Free-formed quartz glass ingots and method for making same.
  4. Harper, Brian Lee; Hrdina, Kenneth Edward; LaSala, John Edward, Fused silica glass and method for making the same.
  5. Bleaking,Daniel Joseph; Bookbinder,Dana C.; Fiacco,Richard M.; Hrdina,Kenneth E.; Tandon,Pushkar; Maxon,John E.; Wilbert,Kimberly Ann, High refractive index homogeneity fused silica glass and method of making same.
  6. Bookbinder,Dana Craig; Fiacco,Richard Michael; Hrdina,Kenneth Edward; Moore,Lisa Anne; Schiefelbein,Susan Lee, High transmission synthetic silica glass and method of making same.
  7. Pandelisev, Kiril A., Hot substrate deposition of fused silica.
  8. Martin,Rolf; Von Der Goenna,Gordon, Method for charging quartz glass objects with hydrogen.
  9. Menzel,Andreas; Elsmann,Frank; Schoenherr,Norman, Method for producing optical components.
  10. Taft,Terry L.; Wise,Gary W., Method of molding a silica article.
  11. Ogawa, Tomonori; Ikuta, Yoshiaki; Kikugawa, Shinya, Optical member made of synthetic quartz glass, and process for its production.
  12. Kikugawa,Shinya; Hino,Keigo; Mishiro,Hitoshi, Photomask substrate made of synthetic quartz glass and photomask.
  13. Yajima, Shouji; Hiraiwa, Hiroyuki; Ishida, Yasuji, Product method of synthetic silica glass and thermal treatment apparatus.
  14. Iwahashi,Yasutomi; Koike,Akio, Silica glass containing TiOand process for its production.
  15. Hiroki Jinbo JP; Norio Komine JP; Seishi Fujiwara JP; Akiko Yoshida JP, Silica glass having superior durability against excimer laser beams and method for manufacturing the same.
  16. Otsuka, Hisatoshi; Shirota, Kazuo; Fujinoki, Akira, Synthetic quartz glass member for excimer laser and method of making.
  17. Fujinoki,Akira; Nishimura,Hiroyuki; Yoshida,Kunio, Synthetic quartz glass optical material for YAG laser with higher harmonic.
  18. Yoshida, Akiko; Komine, Norio; Jinbo, Hiroki, Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus.
  19. Bookbinder, Dana Craig; Fiacco, Richard Michael; Hrdina, Kenneth Edward; Moore, Lisa Anne; Schiefelbein, Susan Lee, Synthetic silica glass optical material having high resistance to laser induced damage.
  20. Allan, Douglas Clippinger; Bookbinder, Dana Craig; Neukirch, Ulrich W H; Smith, Charlene Marie, Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same.
  21. Burdette, Steven Roy; Chu, Polly Wanda; Fagan, James Gerard; Hobbs, Thomas William; Likitvanichkul, Sumalee; Sempolinski, Daniel Raymond; Taft, Terry Lee; Walters, Michael John, Thermal reflow of glass and fused silica body.
  22. Borrelli, Nicholas F.; Hares, George B.; Smith, Charlene M., UV photosensitive melted glasses.
  23. Borrelli, Nicholas F.; Hares, George B.; Smith, Charlene M., UV photosensitive melted glasses.
  24. Shinichi Kondo JP; Takayuki Nakamura JP; Kazuhiko Fukuda JP; Naoyoshi Kamisugi JP; Nobu Kuzuu JP; Yoshinao Ihara JP; Hidetoshi Wakamatsu JP, Ultraviolet ray-transparent optical glass material and method of producing same.
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