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Fluid flow controlling 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G05D-007/06
출원번호 US-0168697 (1998-10-08)
발명자 / 주소
  • Balazy Richard D.
  • Cowan Cathy L.
  • Eisenmann Mark R.
  • Frink Kenneth E.
  • Kulha Edward
출원인 / 주소
  • Mott Metallurgical Corporation
대리인 / 주소
    Hale and Dorr LLP
인용정보 피인용 횟수 : 51  인용 특허 : 18

초록

A method and system for controlling the rate of fluid flow. A flow restrictor having known pressure drop and flow rate characteristics provided in a passage through which the fluid, preferably a gas, flows. An upstream pressure sensor determines the pressure of fluid in the flow passage upstream of

대표청구항

[ What is claimed is:] [1.] A fluid flow controller comprising:a gas flow passage having an inlet and an outlet;a flow restrictor comprising a three-dimensional porous structure defining a through flow matrix including a plurality of pores and having known pressure drop-flow rate characteristics in

이 특허에 인용된 특허 (18)

  1. Sanfilippo James J. ; Sanfilippo John E., Apparatus and method of controlling gas flow.
  2. Kautz Thomas O. (Mequon WI), Combination pressure pulsation damper and check valve depressor.
  3. Thordarson Petur (Seattle WA), Constant flow valve for low flow rates.
  4. Philbin Brian (150 E. Wagon Wheel Dr. Phoenix AZ 85020), Control apparatus and method for controlling fluid flows and pressures.
  5. Weevers Henri H. (Gouda NLX), Control valve.
  6. Yamada Yasuo (Kitakyushu JPX) Nakayama Mamoru (Kitakyushu JPX) Sagara Kazuo (Kitakyushu JPX), Deaerator for particulates.
  7. Klein Walter (Brunn am Gebirge ATX) Rhemann Herbert (Vienna ATX), Device for the step-wise pressure release on the expansion of, in particular hot, gases.
  8. Stiles Ernest D. (St. Clair Shores MI), EGR control valve having ceramic elements.
  9. Zeller Robert S. (Boston MA), High-efficiency metal membrane element, filter, and process for making.
  10. Lee ; II Leighton (Guilford CT), Method and device for providing fluid resistance within a flow passageway.
  11. Friedman Bernard (Allentown PA), Method and system for filtering cooking oil.
  12. Brown Giselle M. (Yateley GB2) MacFarlane Anthony S. (Lightwater GB2), Method for coalescence.
  13. Siebald Hansjurgen F. (Weinheim DEX), Pressure reducer.
  14. Pall David B. (Roslyn Estates NY) Miller John D. (Ithaca NY), Segmented filter disc with slotted support and drainage plate.
  15. Chmura ; William J., Sintered ball valve.
  16. Davis Christopher B. (Suffield CT), Ultra-high efficiency porous metal filter.
  17. Powers Kelly B. (Salt Lake City UT), Valve body ceramic liners.
  18. Hekkert Ydo M. (Oudewater NLX) Verduyn Hendrik A. (Krimpen a/d Ijssel NLX), Valve provided with sound-reducing means.

이 특허를 인용한 특허 (51)

  1. Ahn,Kang Ho, Apparatus for controlling flow rate of gases used in semiconductor device by differential pressure.
  2. Watkins Owen, Bulk fuel delivery system for operating a fluid driven power source at a constant speed.
  3. Gould, Chuck; Lanctot, Jane; Cucci, Jerry; Peterson, Tom; Wink, Dan; Chinnock, Bob, Chemically inert flow control with non-contaminating body.
  4. Doktycz, Mitchel J.; Bryan, William Louis; Kress, Reid, Dual manifold system and method for fluid transfer.
  5. Newman, Paul; Ulan, Dale, Electromagnetic valve for regulation of a fuel flow.
  6. Mudd, Daniel T.; Mudd, Patti J., Flow control system, method, and apparatus.
  7. Schumacher, Mark S.; Broden, David A.; Wiklund, David E., Flow instrument with multisensors.
  8. Mudd, Daniel T.; Mudd, Patti J., Flow node to deliver process gas using a remote pressure measurement device.
  9. Mudd, Daniel T; White, William W; Miller, Virginia; Davis, Christopher; Miyoshi, Kimura; Yasuda, Tadahiro, Flow restrictor.
  10. Mudd,Daniel T.; White,William W.; Miller,Virginia; Davis,Christopher; Miyoshi,Kimura; Yasuda,Tadahiro, Flow restrictor.
  11. White, William W.; White, William H.; Davis, Christopher B.; Smith, Nelson D., Fluid flow controller and method of operation.
  12. Balazy, Richard D.; Cowan, Cathy L.; Eisenmann, Mark R.; Frink, Kenneth E.; Kulha, Edward, Fluid flow controlling.
  13. Daniel T. Mudd, Fluid mass flow control valve and method of operation.
  14. Watkins,Owen, Fuel delivery system and method providing regulated electrical output.
  15. Gajdeczko,Boguslaw F.; Bogursky,Kenneth M.; Galburt,Daniel N.; Sander,Willy M.; Violette,Kevin J., High-resolution gas gauge proximity sensor.
  16. Gajdeczko,Boguslaw F.; Bogursky,Kenneth M.; Galburt,Daniel N.; Sander,Willy M.; Violette,Kevin J., High-resolution gas gauge proximity sensor.
  17. Vogel,Herman, Immersion lithography proximity sensor having a nozzle shroud with flow curtain.
  18. Laverdiere, Marc; McLoughlin, Robert F.; Gonnella, George; Gashgaee, Iraj; Marrs, Jennifer, Liquid flow controller and precision dispense apparatus and system.
  19. Laverdiere, Marc; McLoughlin, Robert F.; Gonnella, George; Gashgaee, Iraj; Marrs, Jennifer, Liquid flow controller and precision dispense apparatus and system.
  20. Laverdiere, Marc; McLoughlin, Robert F.; Gonnella, George; Gashgaee, Iraj; Marrs, Jennifer, Liquid flow controller and precision dispense apparatus and system.
  21. Violette,Kevin J., Liquid flow proximity sensor for use in immersion lithography.
  22. Violette,Kevin J., Liquid flow proximity sensor for use in immersion lithography.
  23. Dexter, S. Shane; Estes, Larry D.; Johnston, Gabriel A.; Tidwell, Durrell G.; Hauser, Bret; Devita, Lauren, Lubrication and exhaust system for a powered surgical instrument.
  24. Dexter, S. Shane; Estes, Larry D.; Johnston, Gabriel A.; Tidwell, Durrell G.; Hauser, Bret; Devita, Lauren, Lubrication and exhaust system for a powered surgical instrument.
  25. Dexter, S. Shane; Estes, Larry Dale; Johnston, Gabriel; Tidwell, Durrell; Hauser, Bret R.; DeVita, Lauren, Lubrication and exhaust system for a powered surgical instrument.
  26. Lowery, Patrick A.; Thordarson, Petur; Laragione, Robert, Mass flow meter systems and methods.
  27. Lowery, Patrick A.; Thordarson, Petur; Laragione, Robert, Mass flow meter systems and methods.
  28. Lowery, Patrick A.; Thordarson, Petur; Laragione, Robert, Mass flow meter systems and methods.
  29. Melcer,Chris; Lane,John, Method and apparatus for pressure and mix ratio control.
  30. Lowery, Patrick A., Non-clogging flow restriction for pressure based flow control devices.
  31. Nemie, Jr., Edward J., Porous metal flow master.
  32. Snowdon, Brian, Powder isolating valve.
  33. Mudd, Daniel T.; Mudd, Patti J, Pressure based mass flow controller.
  34. Kochersperger, Peter C.; Lyons, Joseph H.; Walsh, James; Mali, Rajan, Pressure sensor.
  35. Lyons,Joseph H.; Kochersperger,Peter C.; Walsh,James; Mali,Rajan, Pressure sensor.
  36. Skorpik, James R.; Gosselin, Stephen R.; Harris, Joe C., Process control monitoring systems, industrial plants, and process control monitoring methods.
  37. Vogel,Herman, Proximity sensor nozzle shroud with flow curtain.
  38. Kochersperger, Peter, Proximity sensor with self compensation for mechanism instability.
  39. Somani, Bhushan, Real time diagnostics for flow controller systems and methods.
  40. McMillan, Robert M.; Hankinson, Edwin Lee, Reconfigurable modular fluid flow control system for liquids or gases.
  41. Mudd, Daniel T., Small internal volume fluid mass flow control apparatus.
  42. Sonoda,Kouji; Murai,Masakazu; Hikichi,Kouetsu; Sasaki,Hideki; Saito,Yoshio; Katano,Koji; Fukuma,Kazunori; Ozaki,Hiroyasu; Miyano,Kouji; Sahoda,Katsumi, Solenoid valve for fuel cell.
  43. Brodeur, Craig L..; Laverdiere, Marc; McLoughlin, Robert F.; Niermeyer, J. Karl; Shyu, Jieh-Hwa, System and method for flow monitoring and control.
  44. Brodeur, Craig L.; Laverdiere, Marc; McLoughlin, Robert F.; Niermeyer, J. Karl; Shyu, Jieh Hwa, System and method for flow monitoring and control.
  45. Brodeur, Craig L.; Laverdiere, Marc; McLoughlin, Robert F.; Niermeyer, J. Karl; Shyu, Jieh-Hwa, System and method for flow monitoring and control.
  46. Brodeur, Craig L.; Laverdiere, Marc; McLoughlin, Robert F.; Niermeyer, J. Karl; Shyu, Jieh-Hwa, System and method for flow monitoring and control.
  47. Linthorst, Eric J., Tunable ramp rate circuit for a mass flow controller.
  48. Maginnis,Thomas Owen; Vu,Kim Ngoc, Ultrasonic flow sensor having reflecting interface.
  49. Urdaneta,Nelson; Tint,Aaron S; Duan,Hao; Redemann,Eric J; Wacinski,Christopher Andrew, Ultrasonic liquid flow controller.
  50. Ludwig, Bernhard; von Blumenthal, Tilmann; Lorenzen, Ralf, Valve arrangement for controlling the flow rate of a gas.
  51. Thordarson, Petur; Lowery, Patrick A., Variable pressure regulated flow controllers.
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