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Apparatus and method for controlled decomposition oxidation of gaseous pollutants 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F01N-003/10
  • B01D-053/34
  • B01D-053/74
출원번호 US-0005856 (1998-01-12)
발명자 / 주소
  • Moore Robert R.
  • Getty James D.
  • Safiullin Ravil
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Hultquist
인용정보 피인용 횟수 : 19  인용 특허 : 20

초록

An apparatus is provided for treating pollutants in a gaseous stream. The apparatus employs curved tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by annular heating elements and ha

대표청구항

[ What is claimed is:] [1.] An apparatus for treatment of gaseous pollutants in a gas stream, said apparatus comprising:a thermal reactor comprising a central chamber defined by annular heating elements, an entry end and an exit end of said chamber, a side inlet communicating with an exterior air sp

이 특허에 인용된 특허 (20)

  1. Busson Christian (Charbonniere FRX) Delhomme Henri (Sainte Foy Les Lyon FRX) Gollion Laure (Paris FRX) Cassagne Jean Pierre (Fontenay Sous Bois FRX), Apparatus for carrying out chemical reactions requiring addition of heat at least during start up.
  2. Kleinert Michael (Dresden DDX) Mller Rainer (Dresden DDX) Stelzer Horst (Dresden DDX), Apparatus for guiding gas for LP CVD processes in a tube reactor.
  3. Itoh Fumio (Sakai JPX) Sasaki Tutomu (Takarazuka JPX) Kanoh Ikuhisa (Osaka JPX) Fukumoto Takaaki (Kishiwada JPX), Apparatus for removing at least one acidic component from a gas.
  4. Mller Rainer (Dresden DEX) Resch Dietmar (Dresden DEX) Fabian Lutz (Dresden DEX), Apparatus for the gas-phase processing of disk-shaped workpieces.
  5. Shindome Mamoru (c/o Asahi Engineering Co. ; Ltd. of 4100 ; Asahimachi-6-chome Nobeoka-shi JPX) Yanagita Takanori (Nobeoka JPX) Nakamura Takanori (Nobeoka JPX) Otsuji Hiroyuki (Nobeoka JPX), Apparatus for treating waste material while preventing smelt-water explosions.
  6. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Apparatus, process, and composition for in-situ generation of polyhydridic compounds of group IV-VI elements.
  7. Tom Glenn M. (New Milford CT), Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor.
  8. Clyde Robert A. (P.O. Box 983 Asheville NC 28802), Catalytic heat exchanger.
  9. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT) Luxon Bruce A. (Stamford CT), Composition, apparatus, and process, for sorption of gaseous compounds of group II-VII elements.
  10. Smith James W. (Toronto CAX) Lee Nim Y. (Toronto CAX), Dual impeller method and apparatus for effecting chemical conversion.
  11. Ibaraki Yoshihiro,JPX ; Ina Hidekazu,JPX ; Kawanaka Hideji,JPX, Exhaust gas treatment unit and method.
  12. Anderson Lawrence B. (Encinitas CA), Flashback protection apparatus and method for suppressing deflagration in combustion-susceptible gas flows.
  13. Pereira Carmo J. (Silver Spring MD) Schwartz Rodney J. (Green Bay WI), Flow modification devices for reducing emissions from thermal voc oxidizers.
  14. Morlec Jean (Saint-Nazaire FRX) Bourcier Jacques (4 ; rue de l\Etoile du Matin 44600 Saint-Nazaire FRX), Heat transfer and thermal cleaning rotary device applied to gaseous effluents.
  15. Carr William J. (San Jose CA) Krummen Raymond S. (Los Gatos CA), Hydrodynamic fume scrubber.
  16. Boll Wolf (Weinstadt DEX) Steinkmper Reinhard (Winnenden DEX) Kempka Karl-Heinz (Esslingen DEX) Zeilinger Karl (Winnenden DEX), Internal combustion engine exhaust system.
  17. Tom Glenn M. (New Milford CT), Method for concentration and recovery of halocarbons from effluent gas streams.
  18. Schlinger Warren G. (Pasadena CA), Partial oxidation burner.
  19. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds.
  20. Wang Chi S. (5923 Fairmont Dr. Woodridge IL 60517), Ultra-pyrolysis reactor for hazardous waste destruction.

이 특허를 인용한 특허 (19)

  1. Seeley, Andrew James; Smith, James Robert, Abatement of semiconductor processing gases.
  2. Ferron, Shawn; Kelly, John; Vermeulen, Robbert, Apparatus and method for controlled combustion of gaseous pollutants.
  3. Moore, Robert R.; Getty, James D.; Safiullin, Ravil, Apparatus and method for controlled decomposition oxidation of gaseous pollutants.
  4. Robert R. Moore ; James D. Getty ; Ravil Safiullin, Apparatus and method for controlled decomposition oxidation of gaseous pollutants.
  5. Shiban, Samir S., Apparatus for dynamic oxidation of process gas.
  6. Chen, Tsong-Maw, Apparatus for treating waste gas from semiconductor manufacturing process.
  7. Shiban,Samir S., Combined chemical agent and dynamic oxidation treatment of hazardous gas.
  8. Shiban, Samir S., Dynamic oxidation of process gas.
  9. Kawamura, Kohtaro; Nakamura, Rikiya; Okuda, Kazutaka; Ishikawa, Keiichi; Tsuji, Takeshi, Exhaust gas treating device.
  10. Shiban, Samir S., Hazardous gas abatement system using electrical heater and water scrubber.
  11. Shiban, Samir S., Hazardous gas abatement system using electrical heater and water scrubber.
  12. Kaushal, Tony S.; Shamouilian, Shamouil; Borgaonkar, Harshad; Wong, Kwok Manus; Chafin, Michael G.; Bhatnagar, Ashish, Heated catalytic treatment of an effluent gas from a substrate fabrication process.
  13. Rebecca Faller ; Mark Holst, In-situ air oxidation treatment of MOCVD process effluent.
  14. Flippo, Belynda G.; Vermuellen, Robbert; Clark, Daniel O., Method for carbon monoxide reduction during thermal/wet abatement of organic compounds.
  15. Flippo, Belynda G.; Vermuellen, Robbert; Clark, Daniel O., Method for carbon monoxide reduction during thermal/wet abatement of organic compounds.
  16. Moore,Robert R.; Getty,James D.; Safiullin,Ravil, Method for decomposition oxidation of gaseous pollutants.
  17. Clark, Daniel O.; Raoux, Sebastien; Vermeulen, Robert M.; Crawford, Shaun W., Methods and apparatus for sensing characteristics of the contents of a process abatement reactor.
  18. Flippo, Belynda G.; Karrup, Keith; Vermeulen, Robbert; Clark, Daniel O., Oxygen enhanced CDA modification to a CDO integrated scrubber.
  19. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Todd, Leonard B.; Vermeulen, Robbert, Reactor design to reduce particle deposition during process abatement.
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