초록

A cluster tool method using plasma immersion ion implantation chamber. In some embodiments, the cluster tool method also includes a controlled cleaving process chamber, as well as others.

대표청구항 ▼

[ What is claimed is:] [1.] A cluster tool process for forming a silicon-on-insulator substrate, said process comprising steps of:providing a donor substrate;placing said donor substrate in a first chamber and introducing particles through a surface of said donor substrate to a predetermined selecte

[ What is claimed is:] [1.] A cluster tool process for forming a silicon-on-insulator substrate, said process comprising steps of:providing a donor substrate;placing said donor substrate in a first chamber and introducing particles through a surface of said donor substrate to a predetermined selected depth underneath said surface, said particles being at a concentration at said selected depth to define a portion of donor substrate material to be removed above said selected depth;placing said donor substrate in a second chamber and joining said donor substrate to a target substrate, said surface of said donor substrate facing a face of said target substrate to form a multi-layered substrate; andplacing said multi-layered substrate in a third chamber, and providing energy to a selected region of said substrate to initiate a controlled cleaving action at said selected depth in said substrate, wherein said cleaving action propagates a cleave front to free said portion of donor substrate material from said substrate.