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Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/00
  • G01R-031/00
  • G01R-031/26
출원번호 US-0280989 (1999-03-30)
발명자 / 주소
  • McAndrew James
  • Wang Hwa-Chi
  • Jurcik
  • Jr. Benjamin J.
출원인 / 주소
  • American Air Liquide Inc.
대리인 / 주소
    Burns, Doane, Swecker & Mathis, L.L.P.
인용정보 피인용 횟수 : 28  인용 특허 : 21

초록

Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorptio

대표청구항

[ What is claimed is:] [1.] A chamber effluent monitoring system, comprising:a chamber having an exhaust line connected thereto, the exhaust line including a sample region, wherein substantially all of a chamber effluent also passes through the sample region;an absorption spectroscopy measurement sy

이 특허에 인용된 특허 (21)

  1. Wieboldt Richard C. (Verona WI) Adams Gregory E. (Madison WI), Cold trapping apparatus for infrared transmission analysis including a method and substrate therefor.
  2. Wong Jacob Y. (4589 Camino Molinero Santa Barbara CA 93110), Concentration detector.
  3. Heinz Tony F. (Chappaqua NY) Selwyn Gary S. (Hopewell Junction NY) Singh Syothi (Hopewell Junction NY) Spinetti ; Jr. John A. (Endicott NY), Detection of interfaces with atomic resolution during material processing by optical second harmonic generation.
  4. Wong Jacob Y. (Santa Barbara CA), Enhanced pathlength gas sample chamber.
  5. Doyle Walter M. (Laguna Beach CA), Gas sample analysis provided by light pipe radiation structure.
  6. Silver Joel A. (Sante Fe NM) Stanton Alan C. (Sante Fe NM), Laser absorption detection enhancing apparatus and method.
  7. Puumalainen Pertti (Kuopio FIX) Kuusela Reijo (Kuopio FIX), Method and apparatus for measuring of humidity.
  8. Tell Robert (Gteborg SEX) Andersson Torbjrn (Gteborg SEX) Lundqvist Stefan (Askim SEX) Ahlberg Henrik (Gteborg SEX), Method and apparatus for spectroscopic measurement of the concentration of a gas.
  9. Aoki Kazutsugu (Kanagawa JPX), Method for controlling plasma surface-treatments with a plurality of photodetectors and optical filters.
  10. Lee Peter S. (Troy MI) Majkowski Richard F. (Southfield MI) Schreck Richard M. (Bloomfield Hills MI), Method for determining fuel and engine oil comsumption using tunable diode laser spectroscopy.
  11. Tapp Frederick (Hillsborough NC) Berger Henry (Durham NC), Method of performing an instantaneous moisture concentration measurement and for determining the drydown characteristics.
  12. Bien Fritz (Concord MA) Gersh Michael (Bedford MA) Goldstein Neil (Belmont MA) Lee Jamine (Burlington MA), Multi-pass optical cell species concentration measurement system.
  13. Harvey Robert J. (Capistrano Beach CA), Multiple-path gas-absorption cell.
  14. Lee Jamine (Burlington MA) Goldstein Neil (Belmont MA) Richtsmeier Steven (Tewksbury MA) Bien Fritz (Concord MA) Gersh Michael (Bedford MA), Off-line-locked laser diode species monitor system.
  15. Talasek Robert T. (Plano TX) Hogan Jeremiah D. (Dallas TX), On-line monitor for moisture contamination in HCL gas and copper contamination in NH4OH solutions.
  16. Wallin Svante (Bjrred SEX), Optical analysing equipment for determining parameters of gaseous substances flowing through a duct.
  17. Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Brandt Werner V. (Redondo Beach CA), Optical sensing apparatus for CO2jet spray devices.
  18. Hagans Karla (Livermore CA) Berzins Leon (Livermore CA) Galkowski Joseph (Livermore CA) Seng Rita (Tracy CA), Self-tuning method for monitoring the density of a gas vapor component using a tunable laser.
  19. Kawada Hiroki (Ishioka JPX) Takahashi Kazue (Kudamatsu JPX) Edamura Manabu (Ibaraki-ken JPX) Kanai Saburo (Hikari JPX) Tamura Naoyuki (Kudamatsu JPX), Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber.
  20. Traina John E. (303 N. Rose Dr. Glenshaw PA 15116), Transmissometer having solid state light source.
  21. Thurtell George (38 University Ave. West Guelph ; Ontario CAX N1G 1N4) Kidd Gary (11 Batterswood Ct. Kitchener ; Ontario CAX N2A 3S3) Edwards Grant (378 Willard Ave. Toronto ; Ontario CAX M6S 3R5), Tunable diode laser gas analyzer.

이 특허를 인용한 특허 (28)

  1. Nawracala, Bernd, Apparatus and method for absorbance detection.
  2. Tuqiang Ni ; Wenli Collison, Apparatus for detecting the endpoint of a photoresist stripping process.
  3. Horton,Keith; Porter,John; Mouginis Mark,Peter; Oppenheimer,Clive; Garbeil,Harold, Apparatus for measuring radiation and method of use.
  4. Jacksier, Tracey; Saint-Cyr, Karine, Apparatus for removing moisture from fluids comprising acid gases; methods of using same, and compositions.
  5. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  6. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  7. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  8. Hiroyuki Hasegawa JP; Tomonori Yamaoka JP; Hiroshi Masusaki JP; Takayuki Satou JP; Katsumasa Suzuki JP; Hiroki Tokunaga JP, CVD apparatus equipped with moisture monitoring.
  9. James McAndrew ; Hwa-Chi Wang ; Benjamin J. Jurcik, Jr., Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use.
  10. McAndrew, James; Wang, Hwa-Chi; Jurcik, Jr., Benjamin J., Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use.
  11. Minami, Masakazu, Decomposition detecting unit, concentration measuring unit, and concentration control apparatus.
  12. Rulkens, Ron; Florin, Didier, Endpoint detection for high density plasma (HDP) processes.
  13. Goto, Katsutoshi; Yamakage, Masahiro; Deguchi, Yoshihiro; Yamaura, Taketoshi, Exhaust gas analyzer.
  14. Chen,Shin Juh, Fire alarm algorithm using smoke and gas sensors.
  15. Killich, Frank, Gas analyser.
  16. Jacksier, Tracey; Benesch, Robert, Increased stability low concentration gases, products comprising same, and methods of making same.
  17. Ward, Pamela Peardon Denise; Stevenson, Joel O'Don; Smith, Jr., Michael Lane, Method and assembly for detecting a leak in a plasma system.
  18. Docquier, Nicolas, Method for monitoring by absorption spectroscopy during the forming of flat glass and monitoring device.
  19. Ni,Tuqiang; Collison,Wenli, Methods for detecting the endpoint of a photoresist stripping process.
  20. Ji, Bing; Ridgeway, Robert Gordon; Karwacki, Jr., Eugene Joseph; Withers, Jr., Howard Paul; Rogers, Steven Arthur; Maroulis, Peter James; Langan, John Giles, On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoring.
  21. Melanie Bartolomey FR; Jean-Marc Girard FR; Patrick Mauvais FR; James McAndrew, Process and device for measuring the amount of impurities in a gas sample to be analyzed.
  22. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  23. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  24. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  25. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  26. Hasegawa,Hiroyuki; Yamaoka,Tomonori; Ishihara,Yoshio; Masusaki,Hiroshi, Semiconductor manufacturing method and semiconductor manufacturing apparatus.
  27. Jean-Marc Girard FR; Benjamin J. Jurcik FR; Jean Friedt FR; James J. F. McAndrew, Semiconductor processing system and method for controlling moisture level therein.
  28. Kudo, Tomoyuki; Ozawa, Jun; Nakamura, Hiroshi; Kazama, Kazunori; Moriya, Tsuyoshi; Nakayama, Hiroyuki; Nagaike, Hiroshi, Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program.
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