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Method and apparatus for high precision variable rate material removal and modification 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A61B-018/18
출원번호 US-0054834 (1998-04-03)
발명자 / 주소
  • Neev Joseph
출원인 / 주소
  • Y-Beam Technologies, Inc.
대리인 / 주소
    Christie, Parker & Hale, LLP
인용정보 피인용 횟수 : 185  인용 특허 : 6

초록

A method and apparatus is disclosed for fast precise material processing and modification which minimizes collateral damage. Utilizing optimized, pulsed electromagnetic energy parameters leads to an interaction regime which minimizes residual energy deposition. Advantageously, removal of cumulative

대표청구항

[ What is claimed is:] [1.] A method for ablating material with directed energy, the method comprising:a) determining at least one characteristic of the material to be ablated, determining at least one characteristic of the material to be ablated comprising:i) ablating the material with a pulse of t

이 특허에 인용된 특허 (6)

  1. Muller David F. (Boston MA), Corneal reprofiling using an annular beam of ablative radiation.
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  6. Neev Joseph ; Da Silva Luiz B. ; Matthews Dennis L. ; Glinsky Michael E. ; Stuart Brent C. ; Perry Michael D. ; Feit Michael D. ; Rubenchik Alexander M., Ultrashort pulse high repetition rate laser system for biological tissue processing.

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