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Method and system for on-line monitoring plasma chamber condition by comparing intensity of certain wavelength

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-019/00
출원번호 US-0031654 (1998-02-27)
발명자 / 주소
  • Hwang Yuan-Ko,TWX
  • Cho Ching-Wen,TWX
출원인 / 주소
  • Taiwan Semiconductor Manufacturing Company, TWX
대리인 / 주소
    Saile
인용정보 피인용 횟수 : 39  인용 특허 : 10

초록 ▼

A method for operating a plasma processing system comprises the following steps. Produce a plasma in a plasma processing chamber operating upon a selected workpiece. Perform in situ detection of electromagnetic radiation of a certain wavelength generated in the plasma in the plasma processing chambe

대표청구항 ▼

[ Having thus described the invention, what is claimed as new and desirable to be secured by Letters Patent is as follows:] [1.] A method for operating a plasma processing system comprising:production of a plasma in a plasma processing chamber operating upon a selected workpiece,in situ detecting el

이 특허에 인용된 특허 (10)

  1. Savage Richard N. (Livermore CA), Apparatus and method for automatically identifying chemical species within a plasma reactor environment.
    상세보기
  2. Flinchbaugh Bruce E. (Dallas TX) Dolins Steven B. (Dallas TX) Srivastava Aditya (Richardson TX) Reese Jon (Waxahachie TX), Apparatus and method for production process diagnosis using dynamic time warping.
    상세보기
  3. Gifford George G. (Bethel CT) Osborn Brock E. (Hyde Park NY), Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication.
    상세보기
  4. Gifford George G. (Poughkeepsie NY) Osborn Brock E. (Hyde Park NY), Method and system for analyzing plasma data.
    상세보기
  5. Niinomi Masahiro (Yokohama JPX) Yanagihara Kenji (Atsugi JPX), Method for controlling plasma chemical reactions.
    상세보기
  6. Mozumder Purnendu Kanti (Plano TX) Barna Gabe G. (Richardson TX), Method for controlling semiconductor wafer processing.
    상세보기
  7. Imatake Mitsuko,JPX ; Sasaki Ichiro,JPX ; Otsubo Toru,JPX ; Tamura Hitoshi,JPX ; Kamimura Takashi,JPX, Plasma processing apparatus and processing method.
    상세보기
  8. Dolins Steven B. (Dallas TX) Srivastava Aditya (Richardson TX) Flinchbaugh Bruce E. (Dallas TX) Gunturi Sarma S. (Richardson TX) Lassiter Thomas W. (Garland TX) Love Robert L. (McKinney TX), Process and apparatus for detecting aberrations in production process operations.
    상세보기
  9. Dimitrelis Dimitrios (Palo Alto CA) Gabriel Calvin T. (Cupertino CA) Dunton Samuel V. (San Jose CA), System and method for plasma etching endpoint detection.
    상세보기
  10. Jahns Gary L., System for indirectly monitoring and controlling a process with particular application to plasma processes.
    상세보기

이 특허를 인용한 특허 (39)

  1. Valcore, Jr., John C.; Lyndaker, Bradford J., Adjustment of power and frequency based on three or more states.
    상세보기
  2. Valcore, Jr., John C.; Povolny, Henry S., Arrangement for plasma processing system control based on RF voltage.
    상세보기
  3. Howald, Arthur M.; Valcore, Jr., John C., Cable power loss determination for virtual metrology.
    상세보기
  4. Albarede, Luc, Chamber matching for power control mode.
    상세보기
  5. Huang, Chung-Ho; Jea, Hae-Pyng; Hsu, Tung; Seto, Jackie, Component-tracking system and methods therefor.
    상세보기
  6. Fong, Andrew S.; Valcore, Jr., John C., Computation of statistics for statistical data decimation.
    상세보기
  7. Sogan,Gloria; Bounouar,Julien; Desbiolles,Jean Pierre; Gaurand,Isabelle, Detecting gaseous species by light-emission spectrometry with spectrum processing.
    상세보기
  8. Sogan,Gloria; Bounouar,Julien; Desbiolles,Jean Pierre; Gaurand,Isabelle, Detecting minority gaseous species by light-emission spectroscopy.
    상세보기
  9. Valcore, Jr., John C.; Lyndaker, Bradford J.; Sato, Arthur, Determining a malfunctioning device in a plasma system.
    상세보기
  10. Valcore, Jr., John C.; Lyndaker, Bradford J., Determining a value of a variable on an RF transmission model.
    상세보기
  11. Huang, Chung-Ho; Jea, Hae-Pyng; Hsu, Tung; Seto, Jackie, Dynamic component-tracking system and methods therefor.
    상세보기
  12. Valcore, Jr., John C.; Singh, Harmeet; Povolny, Henry, Etch rate modeling and use thereof with multiple parameters for in-chamber and chamber-to-chamber matching.
    상세보기
  13. Valcore, Jr., John C.; Lyndaker, Bradford J., Impedance-based adjustment of power and frequency.
    상세보기
  14. Ni, Tuqiang; Ngo, Tuan; Huang, Chung-Ho; Lui, Andrew; Kaveh, Farro, Integrated full wavelength spectrometer for wafer processing.
    상세보기
  15. Wang, Shiang-Bau; Lu, Victor Y., Intelligent metrology based on module knowledge.
    상세보기
  16. Marakhtanov, Alexei; Chen, Zhigang; Holland, John Patrick, Ion energy control by RF pulse shape.
    상세보기
  17. Oluseyi, Hakeem; Sarfaty, Moshe, Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system.
    상세보기
  18. Kim, KeeChan; Kim, Yunsang; Bailey, III, Andrew D., Method and apparatus for detecting plasma unconfinement.
    상세보기
  19. Chen,Yi Ling, Method for in situ monitoring of chamber peeling.
    상세보기
  20. Valcore, Jr., John C.; Lyndaker, Bradford J., Methods and apparatus for controlling plasma in a plasma processing system.
    상세보기
  21. Valcore, Jr., John C.; Lyndaker, Bradford J.; Singh, Harmeet, Methods and apparatus for synchronizing RF pulses in a plasma processing system.
    상세보기
  22. Huang, Chung-Ho; Lui, Andrew, Methods for performing data management for a recipe-and-component control module.
    상세보기
  23. Kim,Yong Jin; Kang,Hyun Kyu; Son,Seung Young; Min,Gyung Jin, Methods of determining an etching end point based on compensation for etching disturbances.
    상세보기
  24. Lee, Sang Hun; Kim, Jay Joongsoo, Microwave plasma nozzle with enhanced plume stability and heating efficiency.
    상세보기
  25. Oluseyi, Hakeem; Sarfaty, Moshe, Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy.
    상세보기
  26. Matsuuchi, Hidetaka; Iwasaki, Ryuichi; Mankawa, Hirofumi; Masuda, Shigeru; Hayashi, Hirofumi; Mike, Masaaki, Plasma generation apparatus and work processing apparatus.
    상세보기
  27. Tanaka, Junichi; Kitsunai, Hiroyuki; Nishio, Ryoji; Kanno, Seiichiro; Yamamoto, Hideyuki, Plasma processing apparatus and method.
    상세보기
  28. Tanaka, Junichi; Kitsunai, Hiroyuki; Nishio, Ryoji; Kanno, Seiichiro; Yamamoto, Hideyuki, Plasma processing apparatus and method.
    상세보기
  29. Huang,Chung Ho; Lui,Andrew; Hemker,David J., Plug and play sensor integration for a process module.
    상세보기
  30. Valcore, Jr., John C.; Rogers, James Hugh; Webb, Nicholas Edward; Muraoka, Peter T., RF impedance model based fault detection.
    상세보기
  31. Huang, Chung-Ho; Lui, Andrew, Recipe-and-component control module and methods thereof.
    상세보기
  32. Valcore, Jr., John C.; Howald, Arthur M., Segmenting a model within a plasma system.
    상세보기
  33. Valcore, Jr., John C., Soft pulsing.
    상세보기
  34. Valcore, Jr., John C.; Lyndaker, Bradford J., State-based adjustment of power and frequency.
    상세보기
  35. Valcore, Jr., John C.; Singh, Harmeet; Lyndaker, Bradford J., Sub-pulsing during a state.
    상세보기
  36. Huang, Chung Ho; Fan, Shih Jeun, Targeted data collection architecture.
    상세보기
  37. Valcore, Jr., John C.; Lyndaker, Bradford J., Tuning a parameter associated with plasma impedance.
    상세보기
  38. Valcore, Jr., John C.; Lyndaker, Bradford J., Using modeling to determine ion energy associated with a plasma system.
    상세보기
  39. Valcore, Jr., John C.; Lyndaker, Bradford J., Using modeling to determine wafer bias associated with a plasma system.
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