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A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperat

A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperature correction value for one or more temperature sensors associated with the chamber. A Gaussian-like distribution for thermal contributions from multiple radiation sources in the chamber can be used to simulate the temperature profile. The simulated temperature profile and the actual temperature profile are combined to form an estimated temperature profile. A final value for each respective temperature correction value is determined using an optimization algorithm which results in the estimated temperature profile being substantially uniform across the surface of the substrate. Each final temperature correction value is used as an offset to temperature measurements obtained from the corresponding temperature sensors.

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[ What is claimed is:] [1.] A method of tuning temperature sensor readings in a thermal processing chamber, the method comprising:(a) determining an actual temperature profile for a substrate based on measurements of the substrate;(b) calculating a simulated temperature profile for the substrate bas

[ What is claimed is:] [1.] A method of tuning temperature sensor readings in a thermal processing chamber, the method comprising:(a) determining an actual temperature profile for a substrate based on measurements of the substrate;(b) calculating a simulated temperature profile for the substrate based on a respective interim temperature correction value for at least one of a plurality of temperature sensors associated with the chamber;(c) arithmetically combining the simulated temperature profile and the actual temperature profile to form an estimated temperature profile;(d) determining a final value for each respective temperature correction value by repeating (b) and (c) until the estimated temperature profile is substantially uniform across the surface of the substrate; and(e) using each final value as an offset to temperature measurements subsequently obtained from a corresponding at least one of the temperature sensors. [16.] A method of tuning temperature sensor readings in a thermal processing chamber, the method comprising:(a) determining an actual temperature profile for a substrate based on measurements of the substrate;(b) calculating a simulated temperature profile for the substrate based on respective interim temperature correction values for a plurality of temperature sensors associated with the chamber;(c) arithmetically combining the simulated temperature profile and the actual temperature profile to form an estimated temperature profile;(d) determining a final value for each respective temperature correction value by repeating (b) and (c) until the estimated temperature profile is substantially uniform across the surface of the substrate; and(e) using each final value as an offset to temperature measurements subsequently obtained from a corresponding one of the temperature sensors. A system for tuning a plurality of temperature sensors that measure temperatures of a substrate, the system comprising:a processor arranged to obtain an actual temperature profile for the substrate and configured to perform the following functions:(a) calculate a simulated temperature profile for the substrate based on respective interim temperature correction values for the plurality of temperature sensors;(b) arithmetically combine the simulated temperature profile and the actual temperature profile to form an estimated temperature profile;(c) determine a final value for each respective temperature correction value by repeating (a) and (b) until the estimated temperature profile is substantially uniform across the surface of the substrate; and(d) use each final value as an offset to temperature measurements subsequently obtained from a corresponding one of the temperature sensors. The system of claim 17 further including a plurality of radiation sources for heating the substrate, wherein the processor is further configured to calculate the simulated temperature profile using a bell-shaped distribution of thermal contributions from each of the plurality of radiation sources. The system of claim 18 wherein the processor is further configured to determine a summation of temperature profiles from each of the radiation sources.