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Chemical-mechanical-polishing system with continuous filtration 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-049/00
출원번호 US-0189701 (1998-11-10)
발명자 / 주소
  • Russ Richard D.
  • Thomas Daniel
출원인 / 주소
  • VLSI Technology, Inc.
대리인 / 주소
    Ishimaru
인용정보 피인용 횟수 : 22  인용 특허 : 13

초록

A chemical-mechanical-polishing system having a slurry distribution system, a polisher, a deionized water supply, and a drain, includes a slurry filtration system. The filtration system has two filters for alternately filtering particles in slurry and being backflushed with deionized water. Two inpu

대표청구항

[ The invention claimed is:] [1.] Apparatus comprising:a source of particulate containing fluid;a user of particulate containing fluid;a source of backflushing fluid;a drain for said fluids;a first filter;a second filter;valving means for respectively connecting in first and second modes:said source

이 특허에 인용된 특허 (13)

  1. Engstrm Folke (Kotka FIX) Isaksson Juhani (Karhula FIX), Eliminating ash bridging in ceramic filters.
  2. Drori Mordeki (89 Zahal Street Kiron ILX), Filter apparatus.
  3. Schulz Helmut (St. Florian ATX) Bacher Helmut (Puchenau ATX) Wendelin Georg (Linz ATX), Filter apparatus having filter elements shiftable between filtering and backwashing positions.
  4. Moorehead Jack (San Diego CA), Filter system for a liquid stream with automatic rapid back flush capability.
  5. Drori Mordeki (89 Zahal Street Kiron ILX), Filter system having multiple filter elements and back flushing assemblies.
  6. Drori Mordeki (89 Zahal Street Kiron ILX), Filter system having multiple filter elements and backflushing assemblies.
  7. Drori Mordeki (89 Zahal Street Kiron ILX), Filter system having multiple filter elements and backflushing assemblies.
  8. Drori Mordeki (89 Zahal Street Kiron ILX), Filter system having multiple filter elements and backflushing assemblies.
  9. Radmall Paul (Stonehouse GB2), Fluid filtering systems.
  10. McKinney Jerry L. (P.O. Box 546 Silsbee TX 77656), Liquid filter system.
  11. Hull, Harold L.; Santa Cruz, Cathy D., Self-cleaning filter system.
  12. Stuth William L. (P.O. Box 950 Maple Valley WA 98038), Septic system screened pump vault.
  13. Adams John A. (Escondido CA) Krulik Gerald A. (San Clemente CA) Harwood C. Randall (Tempe AZ), Slurry recycling in CMP apparatus.

이 특허를 인용한 특허 (22)

  1. Kim, Hongjin; Kim, Kyoungseob; Shin, Sungho; Lee, Kuntack; Cho, Kihong, Apparatus and a method for treating a substrate.
  2. Motoyuki Tsuihiji JP; Hirofumi Iinuma JP, Apparatus for filtering a fluid.
  3. Komatsu Mitsunori,JPX ; Kawashima Kiyotaka,JPX ; Tanikawa Mutsumi,JPX, Filter apparatus.
  4. Osuda,Hiroshi; Matoba,Toru; Fukuizumi,Masataka, Method and apparatus for reuse of abrasive fluid used in the manufacture of semiconductors.
  5. Katsuya Okumura JP; Yoshinori Yoshida JP, Method and system of manufacturing slurry for polishing, and method and system of manufacturing semiconductor devices.
  6. Motoyuki Tsuihiji JP; Hirofumi Iinuma JP, Method of filtering a fluid.
  7. Motoyuki Tsuihiji JP; Hirofumi Iinuma JP, Method of filtering a fluid.
  8. Hudson,Guy F., Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies.
  9. Groschopf, Johannes; Hueselitz, Rico; Kitsche, Marco; Steffen, Katja, Planarization of a material system in a semiconductor device by using a non-selective in situ prepared slurry.
  10. Robinson,Karl M.; Meikle,Scott G., Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies.
  11. Tanikawa, Mutsumi; Komatsu, Mitsunori; Kawashima, Kiyotaka; Shimomoto, Hiroshi; Okumura, Katsuya, Pure water reusing system.
  12. Maruyama,Hiroyuki, Refrigerant supply apparatus.
  13. Moore, Scott E.; Meikle, Scott G.; Crum, Magdel, Semiconductor processor systems, a system configured to provide a semiconductor workpiece process fluid.
  14. Moore Scott E. ; Meikle Scott G. ; Crum Magdel, Semiconductor processors, sensors, and semiconductor processing systems.
  15. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel, Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods.
  16. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel, Semiconductor workpiece processing methods.
  17. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel, Semiconductor workpiece processing methods.
  18. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel, Semiconductor workpiece processing methods, a method of preparing semiconductor workpiece process fluid, and a method of delivering semiconductor workpiece process fluid to a semiconductor processor.
  19. Byers, Gary Allen; Derecskei, Bela; Bayer, Benjamin Patrick, Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture.
  20. Moore, Scott E.; Meikle, Scott G.; Crum, Magdel, Turbidity monitoring methods, apparatuses, and sensors.
  21. Keller,James C., Waste water recovery system.
  22. Maury,Alvaro; Lim,Jovin; Layadi,Nace; Quek,Sebastian, Zone polishing using variable slurry solid content.
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