초록 ▼

There is provided a method for fabricating high density sputter targets by pre-packing a powder bed by hot pressing or vibration between metal plates, followed by hot isostatic pressing. This method is especially suitable for preparing sputter targets with a radius to thickness ratio of at least 3 a

There is provided a method for fabricating high density sputter targets by pre-packing a powder bed by hot pressing or vibration between metal plates, followed by hot isostatic pressing. This method is especially suitable for preparing sputter targets with a radius to thickness ratio of at least 3 and a density of at least 96% of theoretical.

대표청구항 ▼

[ What is claimed is:] [1.] A method of fabricating high density sputter targets, comprising the steps of:hot pressing a powder bed to achieve a pressed target blank having a packing density of greater than about 50% of theoretical and a ratio of radius to thickness of at least about 3; andhot isost

[ What is claimed is:] [1.] A method of fabricating high density sputter targets, comprising the steps of:hot pressing a powder bed to achieve a pressed target blank having a packing density of greater than about 50% of theoretical and a ratio of radius to thickness of at least about 3; andhot isostatic pressing the pressed target blank in a metal capsule to achieve a near net-shaped sputter target having a density of at least 96% of theoretical and a ratio of radius to thickness of at least about 3.