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Exposure method and exposure apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-009/00
출원번호 US-0184655 (1998-11-03)
우선권정보 JP0355336 (1997-12-24)
발명자 / 주소
  • Kuroda Ryo,JPX
  • Ikeda Tsutomu,JPX
  • Shimada Yasuhiro,JPX
출원인 / 주소
  • Canon Kabushiki Kaisha, JPX
대리인 / 주소
    Fitzpatrick, Cella, Harper & Scinto
인용정보 피인용 횟수 : 67  인용 특허 : 1

초록 ▼

An exposure apparatus and method for transferring a pattern to an object to be exposed by exposure to evanescent light using a mask having an aperture pattern having a width of 100 nm or less. The mask is arranged opposite to the object to be exposed, and pressure is applied to the mask arranged opp

대표청구항 ▼

[ What is claimed is:] [1.] An exposure apparatus for transferring a pattern to an object to be exposed by exposure using a mask having a width of 100 nm or less, said apparatus comprising:contact means for bringing a first surface of the mask into substantially uniform contact with the object to be

이 특허에 인용된 특허 (1)

  1. Inoue Takashi,JPX ; Nagano Hiroyuki,JPX ; Ishii Yoshimichi,JPX, Exposure apparatus for transferring a mask pattern onto a substrate.
    상세보기

이 특허를 인용한 특허 (67)

  1. Weber,Jonathan L., Active sensor receiver detector array for countermeasuring shoulder-fired missiles.
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  2. Rogers, John A.; Ying, Ming; Bonifas, Andrew; Lu, Nanshu, Appendage mountable electronic devices conformable to surfaces.
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  3. Rogers, John A; Ying, Ming; Bonifas, Andrew; Lu, Nanshu, Appendage mountable electronic devices conformable to surfaces.
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  4. Ghaffari, Roozbeh; Callsen, Gilman; Arora, William J.; Schlatka, Benjamin, Catheter balloon having stretchable integrated circuitry and sensor array.
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  5. Rogers, John; Kim, Dae-Hyeong; Litt, Brian; Viventi, Jonathan, Conformable actively multiplexed high-density surface electrode array for brain interfacing.
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  6. Nakasato, Shinji; Inao, Yasuhisa, Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same.
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  7. Rafferty, Conor; Dalal, Mitul, Embedding thin chips in polymer.
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  8. Kiriya,Shinobu, Exposure apparatus and exposing method for elastically deforming a contact mask with control data.
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  9. Yano,Koji; Kuroda,Ryo; Okamoto,Kohei, Exposure apparatus and method.
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  10. Inao, Yasuhisa; Kuroda, Ryo; Mizutani, Natsuhiko, Exposure apparatus, exposure method, and exposure mask.
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  11. Yamaguchi, Takako; Inao, Yasuhisa, Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method.
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  12. Saito, Kenji; Kuroda, Ryo; Inao, Yasuhisa, Exposure method and apparatus using near field light.
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  13. Inao, Yasuhisa; Kuroda, Ryo; Yamaguchi, Takako, Exposure method and exposure apparatus using near-field light and exposure mask.
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  14. Arora, William J.; Ghaffari, Roozbeh, Extremely stretchable electronics.
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  15. Arora, William J.; Ghaffari, Roozbeh, Extremely stretchable electronics.
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  16. Arora, William J.; Ghaffari, Roozbeh, Extremely stretchable electronics.
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  17. Elolampi, Brian; Ghaffari, Roozbeh; de Graff, Bassel; Arora, William; Hu, Xiaolong, Flexible electronic structure.
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  18. Landschoot,Georges; Vackier,Rik, Handling the rotor of a rotary machine.
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  19. Rogers, John A.; Kim, Dae-Hyeong; Omenetto, Fiorenzo; Kaplan, David L.; Litt, Brian; Viventi, Jonathan; Huang, Yonggang; Amsden, Jason, Implantable biomedical devices on bioresorbable substrates.
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  20. Rogers, John A.; Kim, Dae-Hyeong; Omenetto, Fiorenzo; Kaplan, David L.; Litt, Brian; Viventi, Jonathan; Huang, Yonggang; Amsden, Jason, Implantable biomedical devices on bioresorbable substrates.
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  21. Kobrin, Boris, Large area nanopatterning method and apparatus.
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  22. Kuroda, Ryo; Shimada, Yasuhiro; Seki, Junichi; Yamaguchi, Takako; Inao, Yasuhisa, Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof.
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  23. Kuroda,Ryo; Inao,Yasuhisa, Method and apparatus for detecting relative positional deviation between two objects.
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  24. N철lscher,Christoph, Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto.
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  25. Yamaguchi, Takako; Kuroda, Ryo, Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same.
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  26. Kuroda,Ryo; Mizutani,Natsuhiko, Method of manufacturing a device using a near-field photomask and near-field light.
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  27. Dubin,Valery M.; Moon,Peter K., Method of protecting a seed layer for electroplating.
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  28. de Graff, Bassel; Arora, William J.; Callsen, Gilman; Ghaffari, Roozbeh, Methods and applications of non-planar imaging arrays.
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  29. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
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  30. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
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  31. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
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  32. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
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  33. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
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  34. Hatakeyama, Masahiro; Ichiki, Katsunori; Satake, Tohru; Hatamura, Yotaro; Nakao, Masayuki, Microfabrication of pattern imprinting.
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  35. Hatakeyama,Masahiro; Ichiki,Katsunori; Satake,Tohru; Hatamura,Yotaro; Nakao,Masayuki, Microfabrication of pattern imprinting.
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  36. Ito, Toshiki; Mizutani, Natsuhiko; Terao, Akira, Near field exposure mask, method of forming resist pattern using the mask, and method of producing device.
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  37. Inao, Yasuhisa; Ito, Toshiki; Mizutani, Natsuhiko, Near-field exposure apparatus and near-field exposure method.
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  38. Yamaguchi,Takako; Kuroda,Ryo, Near-field exposure apparatus and near-field exposure photomask.
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  39. Ito, Toshiki; Mizutani, Natsuhiko; Yamaguchi, Takako, Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method.
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  40. Ito, Toshiki; Mizutani, Natsuhiko, Near-field exposure mask, near-field exposure apparatus, and near-field exposure method.
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  41. Inao,Yasuhisa; Kuroda,Ryo; Mizutani,Natsuhiko, Near-field exposure method.
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  42. Mizutani, Natsuhiko; Inao, Yasuhisa, Near-field exposure method.
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  43. Mizutani,Natsuhiko, Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method.
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  44. Yamaguchi,Takako; Kuroda,Ryo, Near-field exposure photoresist and fine pattern forming method using the same.
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  45. Yamaguchi,Takako; Kuroda,Ryo, Near-field exposure photoresist and fine pattern forming method using the same.
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  46. Inao,Yasuhisa; Kuroda,Ryo, Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for man.
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  47. Mizutani, Natsuhiko; Yamada, Tomohiro, Near-field light generating method and near-field optical head using a light blocking metal film having a fine opening whose size is not more than a wavelength of irradiated light, and near-field optical microscope having the optical head.
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  48. Yamada,Tomohiro; Kuroda,Ryo; Mizutani,Natsuhiko, Near-field light generating structure, near-field exposure mask, and near-field generating method.
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  49. Kuroda,Ryo; Mizutani,Natsuhiko, Near-field photomask and near-field exposure apparatus including the photomask.
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  50. Osamu Watanabe JP; Masaaki Tsuchimori JP; Yoshimasa Kawata JP; Chikara Egami JP; Okihiro Sugihara JP; Naomichi Okamoto JP; Osamu Nakamura JP, Optical recording method, optical recording medium, and optical recording system.
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  51. Yamaguchi,Takako; Kuroda,Ryo, Pattern-forming apparatus using a photomask.
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  52. Yamaguchi, Takako; Kuroda, Ryo, Pattern-forming method using photomask, and pattern-forming apparatus.
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  53. Mizutani,Natsuhiko; Inao,Yasuhisa, Photomask for uniform intensity exposure to an optical near-field.
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  54. Yamaguchi, Takako; Inao, Yasuhisa, Photoresist, photolithography method using the same, and method for producing photoresist.
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  55. Yamaguchi,Takako; Inao,Yasuhisa, Photoresist, photolithography method using the same, and method for producing photoresist.
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  56. Yamada, Tomohiro; Mizutani, Natsuhiko, Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment.
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  57. Yamada,Tomohiro; Mizutani,Natsuhiko, Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment.
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  58. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao; Ko, Heung Cho; Mack, Shawn, Printable semiconductor structures and related methods of making and assembling.
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  59. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao; Ko, Heung Cho; Mack, Shawn, Printable semiconductor structures and related methods of making and assembling.
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  60. Dubin, Valery M.; Moon, Peter K., Protection of seedlayer for electroplating.
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  61. Ghaffari, Roozbeh; Schlatka, Benjamin; Callsen, Gilman; de Graff, Bassel, Protective cases with integrated electronics.
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  62. Mizutani, Natsuhiko; Inao, Yasuhisa, Resist pattern forming method including uniform intensity near field exposure.
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  63. de Graff, Bassel; Ghaffari, Roozbeh; Arora, William J., Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy.
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  64. Ghaffari, Roozbeh; de Graff, Bassel; Callsen, Gilman; Arora, William J.; Schlatka, Benjamin; Kuznetsov, Eugene, Systems, methods, and devices using stretchable or flexible electronics for medical applications.
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  65. Rogers, John A.; Kim, Hoon-Sik; Huang, Yonggang, Thermally managed LED arrays assembled by printing.
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  66. Rogers, John A.; Omenetto, Fiorenzo G.; Hwang, Suk-Won; Tao, Hu; Kim, Dae-Hyeong; Kaplan, David, Transient devices designed to undergo programmable transformations.
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  67. Rogers, John A.; Kim, Rak-Hwan; Kim, Dae-Hyeong; Kaplan, David L.; Omenetto, Fiorenzo G., Waterproof stretchable optoelectronics.
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