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특허 상세정보

Exposure method and exposure apparatus

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) G03F-009/00   
미국특허분류(USC) 430/005
출원번호 US-0184655 (1998-11-03)
우선권정보 JP0355336 (1997-12-24)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Fitzpatrick, Cella, Harper & Scinto
인용정보 피인용 횟수 : 67  인용 특허 : 1
초록

An exposure apparatus and method for transferring a pattern to an object to be exposed by exposure to evanescent light using a mask having an aperture pattern having a width of 100 nm or less. The mask is arranged opposite to the object to be exposed, and pressure is applied to the mask arranged opposite to the object from the side of the mask opposite to the surface facing the object to generate evanescent light under the pressure applied, to transfer the pattern of the mask to the object to be exposed by exposure to the evanescent light.

대표
청구항

[ What is claimed is:] [1.] An exposure apparatus for transferring a pattern to an object to be exposed by exposure using a mask having a width of 100 nm or less, said apparatus comprising:contact means for bringing a first surface of the mask into substantially uniform contact with the object to be exposed by elastically deforming the mask; andirradiation means for irradiating a second surface of the mask, which is brought into substantially uniform contact with the object to be exposed, the second surface being opposite to the first surface.

이 특허를 인용한 특허 피인용횟수: 67

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