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Apparatus and methods for measuring substrate temperature

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-005/58
  • G01J-005/00
  • A21B-001/00
출원번호 US-0130304 (1998-08-06)
발명자 / 주소
  • Jennings Dean
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Fish & Richardson
인용정보 피인용 횟수 : 12  인용 특허 : 18

초록

An apparatus for measuring the temperature of a substrate in a thermal processing chamber is disclosed. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The apparatus includes a first polarizer positioned to polarize radia

대표청구항

[ What is claimed is:] [24.] An apparatus for measuring the temperature of a substrate in a thermal processing chamber, the chamber including a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber, the apparatus comprising:a probe having an input end

이 특허에 인용된 특허 (18)

  1. Nulman Jaim (Palo Alto CA) Bacile Nick J. (San Jose CA) Blonigan Wendell T. (Sunnyvale CA), Emissivity correction apparatus and method.
  2. Brouwer Nicholaas L. (Allegheny Township ; Allegheny County PA) Urbanic John M. (Churchill Borough PA) Anderson Albert R. (White Valley PA), Emissivity error correcting method for radiation thermometer.
  3. Nakos James S. (Essex VT) Bakeman ; Jr. Paul E. (South Burlington VT) Hallock Dale P. (Bristol VT) Lasky Jerome B. (Essex Junction VT) Pennington Scott L. (South Burlington VT), Emissivity independent temperature measurement systems.
  4. Patton Evan E. (Portland OR), Method and apparatus for active pyrometry.
  5. Fischbach Jean-Paul F. (Neupre BEX), Method and apparatus for measuring emissivity.
  6. Peuse Bruce W. (San Carlos CA) Miner Gary E. (Newark CA) Yam Mark (San Jose CA), Method and apparatus for measuring substrate temperatures.
  7. Peuse Bruce W. ; Miner Gary E. ; Yam Mark, Method and apparatus for measuring substrate temperatures.
  8. Moslehi Mehrdad M. (Dallas TX), Method and apparatus for real-time wafer temperature measurement using infrared pyrometry in advanced lamp-heated rapid.
  9. Krishnan Shankar (Arlington Heights IL) Hansen George P. (Austin TX) Hauge Robert H. (Houston TX) Margrave John L. (Houston TX) Rey Charles A. (Riverwoods IL), Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects.
  10. Arima Jiro (Osaka JPX) Tsujimura Hiroji (Osaka JPX) Narita Tomonori (Tokyo JPX) Takebuchi Hiroki (Kawasaki JPX), Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus.
  11. Moslehi Mehrdad M. (Dallas TX) Najm Habib N. (Dallas TX), Multi-point pyrometry with real-time surface emissivity compensation.
  12. Cabib Dario,ILX ; Buckwald Robert A.,ILX ; Adel Michael E.,ILX, Multipoint temperature monitoring apparatus for semiconductor wafers during processing.
  13. Abtahi Ali A. (Canyon Country CA), Polaradiometric pyrometer in which the parallel and perpendicular components of radiation reflected from an unpolarized.
  14. Thompson Thomas E. (Los Altos CA) Westerberg Eugene R. (Palo Alto CA), Pyrometer apparatus and method.
  15. Stein Alexander (Secaucus NJ), Pyrometer measurements in the presence of intense ambient radiation.
  16. Tanaka Fumio (Fukuoka IN JPX) DeWitt David P. (West Lafayette IN), Radiation thermometry.
  17. Suarez-Gonzalez Ernesto (Tequesta FL), Reflection corrected radiosity optical pyrometer.
  18. Johnsgard Kristian E. ; McDiarmid James, Thermal processing system with supplemental resistive heater and shielded optical pyrometry.

이 특허를 인용한 특허 (12)

  1. Ramachandran, Balasubramanian; Jallepally, Ravi; Boas, Ryan C.; Ramamurthy, Sundar; Al-Bayati, Amir; Graoui, Houda; Spear, Joseph M., Advances in spike anneal processes for ultra shallow junctions.
  2. Timans, Paul Janis, Apparatus and method for reducing stray light in substrate processing chambers.
  3. Timans,Paul Janis, Apparatus and method for reducing stray light in substrate processing chambers.
  4. Timans,Paul Janis, Apparatus and method for reducing stray light in substrate processing chambers.
  5. Adams, Bruce; Hunter, Aaron, Black reflector plate.
  6. Norrbakhsh, Hamid; Welch, Mike; Luscher, Paul; Salimian, Siamak; Mays, Brad, Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe.
  7. Ramamurthy,Sundar; Achutharaman,Vedapuram; Fang,Ho T., Cylinder for thermal processing chamber.
  8. Hill, Wieland, Device for spatially resolved temperature measurement.
  9. Steger, Robert J., Methods and apparatus for in situ substrate temperature monitoring.
  10. Masayuki Kitamura JP; Eisuke Morisaki JP; Nobuaki Takahashi JP; Takashi Shigeoka JP, Radiation temperature measuring method and radiation temperature measuring system.
  11. Kubo, Tomohiro, Rapid thermal processing apparatus and method of manufacture of semiconductor device.
  12. Jennings,Dean; Ranish,Joseph M.; Haas,Brian; Balakrishna,Ajit; Ramamurthy,Sundar; Hunter,Aaron; Yam,Mark, Stepped reflector plate.
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