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Processing chamber for atomic layer deposition processes

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • H05B-003/06
출원번호 US-0225081 (1999-01-04)
발명자 / 주소
  • Doering Kenneth
  • Galewski Carl J.
  • Gadgil Prasad N.
  • Seidel Thomas E.
출원인 / 주소
  • Genus, Inc.
대리인 / 주소
    Boys
인용정보 피인용 횟수 : 329  인용 특허 : 6

초록

A processing station adaptable to standard cluster tools has a vertically-translatable pedestal having an upper wafer-support surface including a heater plate adapted to be plugged into a unique feedthrough in the pedestal. At a lower position for the pedestal wafers may be transferred to and from t

대표청구항

[ What is claimed is:] [1.] An ALD processing station for a cluster tool system, comprising:a processing chamber portion having a lower extremity with a first cross-sectional area;a substantially circular base chamber portion below the processing chamber portion, the base chamber portion having a fi

이 특허에 인용된 특허 (6)

  1. Carman Justice (Valley Center CA) Logan Mark A. (Pleasanton CA) Monkowski Joseph (Danville CA), CVD platen heater system utilizing concentric electric heating elements.
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  5. Wong Fred (Fremont CA) Ku Yen-Hui (Sunnyvale CA), Reaction chamber with controlled radiant energy heating and distributed reactant flow.
  6. White John M. (Hayward CA), Single substrate vacuum processing apparatus having improved exhaust system.

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  323. Natanzon, Assaf; Ayzenberg, Lev; Sharvit, Erez; Neymer, Slavik; Baruch, Leehod, Virtual machine joining or separating.
  324. Natanzon, Assaf; Aharoni, Yuval, Virtualized consistency group using an enhanced splitter.
  325. Natanzon, Assaf; Aharoni, Yuval, Virtualized consistency group using an enhanced splitter.
  326. Natanzon, Assaf; Aharoni, Yuval, Virtualized consistency group using more than one data protection appliance.
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