Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V., DEX
대리인 / 주소
Hormann
인용정보
피인용 횟수 :
28인용 특허 :
2
초록▼
A method of and a solution for making a highly porous optical antireflection coating of a selectively designed index of refraction, by applying a colloidal dispersion derived from hydrolytically condensing, in the presence of water and a catalyst, one or more silicon compounds of the general formula
A method of and a solution for making a highly porous optical antireflection coating of a selectively designed index of refraction, by applying a colloidal dispersion derived from hydrolytically condensing, in the presence of water and a catalyst, one or more silicon compounds of the general formula R.sub.a SiX.sub.4-a, or precondensates derived therefrom, to a substrate. In the formula, R is an organic group having from 1 to 10 carbon atoms which may be interrupted by oxygen atoms and/or sulfur atoms and/or amino groups, X is hydrogen, halogen, hydroxy, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or NR'.sub.2, R' being hydrogen, alkyl or aryl and a being 0, 1 or 2. The solution also contains colloidally dispersed organic polymers at a molar ratio, relative to the silane, between 0.1 mmol/mol silane and 100 mmol/mol silane, the median molecular mass of the polymer being between 200 and 500,000. Sol-vents, preferably alcohol, may also be present in the solution. After being applied to an optical substrate, the solution is dried and organic components are removed from it to leave a porous coating of predetermined index of refraction.
대표청구항▼
[ What is claimed is:] [1.] A method of making a porous antireflection coating, comprising the steps of:preparing a colloidal disperse solution of a pH value .gtoreq.7 and including organic components by hydrolytically condensing at least one of at least one of a silicon compound of general formula
[ What is claimed is:] [1.] A method of making a porous antireflection coating, comprising the steps of:preparing a colloidal disperse solution of a pH value .gtoreq.7 and including organic components by hydrolytically condensing at least one of at least one of a silicon compound of general formula I: EQU R.sub.a SiX.sub.4-a (1)wherein the groups are alike or different and wherein R is an organic group having 1 to 10 carbon atoms and X is hydrogen, halogen, hydroxy, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or NR'.sub.2, R' being hydrogen, alkyl or aryl and a being 0, 1 or 2, a precondensate derived therefrom, containing at least one colloidally dispersed organic polymer of a median molecular mass between 200 and 500,000, said polymer having at least one of OH and NH groups,the molar ratio between polymer and silicon compound being between 0.1 mmol/mol silane and 100 mmol/mol silane;applying said solution to a substrate;drying said solution; andremoving said organic components by heating.
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이 특허에 인용된 특허 (2)
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Glaubitt, Walther; Kursawe, Monika; Gombert, Andreas; Hofmann, Thomas, Glass having a porous anti-reflection surface coating and method for producing such glass.
Mills, David R.; Schramek, Philipp; Degraaff, David B.; Johnson, Peter L.; Hoermann, Alexander; Johnson, Lars R., Linear Fresnel solar arrays and drives therefor.
Fritsche, Klaus-Dieter; Tünker, Gerhard, Method for producing an aqueous composition comprising a condensate based on silicon compounds for producing antireflective coatings.
Yeh, Wendy H.; Ahn, Sang; Bencher, Christopher Dennis; M'Saad, Hichem; Rathi, Sudha, Nitrogen-free antireflective coating for use with photolithographic patterning.
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