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Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-046/24
  • C23C-016/44
출원번호 US-0741272 (1996-10-30)
발명자 / 주소
  • Cheung David
  • Raoux Sebastien
  • Huang Judy H.
  • Taylor
  • Jr. William N.
  • Fodor Mark
  • Fairbairn Kevin
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Townsend & Townsend & Crew
인용정보 피인용 횟수 : 54  인용 특허 : 13

초록

An apparatus for converting PFC gases exhausted from semiconductor processing equipment to less harmful, non-PFC gases. One embodiment of the apparatus includes a silicon filter and a plasma generation system. The plasma generation system forms a plasma from the effluent PFC gases. Constituents from

대표청구항

[ What is claimed is:] [1.] An apparatus for reducing perfluorocompound (PFC emissions from a processing chamber, said apparatus comprising:a vessel chamber, defining a fluid conduit having an inlet port and an outlet port;a PFC oxidizing agent in said fluid conduit; anda plasma generation system ca

이 특허에 인용된 특허 (13)

  1. Sherman Robert C. (Austin TX), Baffle/settling chamber for a chemical vapor deposition equipment.
  2. Krogh Ole D. (110 Point Lobos Ave. San Francisco CA 94121), ECR plasma source for gas abatement.
  3. Obuchi Akira (Tsukuba JPX) Yoshiyama Hidenori (Tsukuba JPX) Ohi Akihiko (Tsukuba JPX) Aoyama Hyogoro (Tsukuba JPX) Ohuchi Hideo (Tsukuba JPX) Ogata Atsushi (Tsukuba JPX) Mizuno Koichi (Ibaraki JPX) M, Exhaust gas cleaner.
  4. Kurokawa Takashi (Yokohama JPX), Exhaust system for chemical vapor deposition apparatus.
  5. Maeba Yoshiyasu (Samukawa JPX) Toyoda Satoru (Chigasaki JPX) Naruse Humio (Yokohama JPX), Fine particle collector trap for vacuum evacuating system.
  6. Gu Youfan, Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace.
  7. Chiu Kin-Chung R. (Scotts Valley CA), Method and system for vapor extraction from gases.
  8. Kelly Eugene P. (Spring Valley CA) Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Method of rapid sample handling for laser processing.
  9. Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Photon controlled decomposition of nonhydrolyzable ambients.
  10. Lee Young H. (Somers NY), Plasma reactor for processing substrates.
  11. Blalock Guy T. (Boise ID), Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors.
  12. Kanter Ira E. (Monroeville PA) Hundstad Richard L. (Forest Hills Boro PA), Stack gas emissions control system.
  13. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.

이 특허를 인용한 특허 (54)

  1. Shamouil Shamouilian ; Mehran Moalem ; Tony S. Kaushal, Abatement of fluorine gas from effluent.
  2. Shamouilian, Shamouil; Kaushal, Tony S., Abatement of hazardous gases in effluent.
  3. Ferron, Shawn; Kelly, John; Vermeulen, Robbert, Apparatus and method for controlled combustion of gaseous pollutants.
  4. Thomas L. Ritzdorf ; Steve L. Eudy ; Gregory J. Wilson ; Paul R. McHugh, Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrology.
  5. Ritzdorf, Thomas L.; Eudy, Steve L.; Wilson, Gregory J.; McHugh, Paul R., Apparatus and method for processing a microelectronic workpiece using metrology.
  6. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and method for processing a microelectronic workpiece using metrology.
  7. Park, Jun-Sig, Apparatus and method for producing a semiconductor device including a byproduct control system.
  8. Hanson,Kyle M., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  9. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  10. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  11. Pokharna,Himanshu; Le,Phong; Nemani,Srinivas D., Apparatus for abatement of by-products generated from deposition processes and cleaning of deposition chambers.
  12. Chen, Lee; Funk, Merritt, DC and RF hybrid processing system.
  13. Steinhardt, Heinz; Gschwandtner, Alexander; Mathuni, Josef, Device to generate excited/ionized particles in a plasma.
  14. Hosch, Jimmy W.; Goeckner, Matthew J.; Whelan, Mike; Kueny, Andrew Weeks; Harvey, Kenneth C.; Thamban, P.L. Stephan, Electron beam exciter for use in chemical analysis in processing systems.
  15. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Ted; Yao, Andrew, Enhanced passivation process to protect silicon prior to high dose implant strip.
  16. Ashish Bhatnagar ; Kartik Ramaswamy ; Tony S. Kaushal ; Kwok Manus Wong ; Shamouil Shamouilian, Erosion resistant gas energizer.
  17. Gilbert, Stephen R.; Singh, Kaushal; Aggarwal, Sanjeev; Hunter, Stevan, Forming ferroelectric Pb(Zr,Ti)O3 films.
  18. Kaushal, Tony S.; Shamouilian, Shamouil; Borgaonkar, Harshad; Wong, Kwok Manus; Chafin, Michael G.; Bhatnagar, Ashish, Heated catalytic treatment of an effluent gas from a substrate fabrication process.
  19. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  20. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  21. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  22. Cheung, David; Li, Ted; Guha, Anirban; Ostrowski, Kirk, Low damage photoresist strip method for low-K dielectrics.
  23. Shufflebotham, Paul Kevin; Barnes, Michael, Method and apparatus for abatement of reaction products from a vacuum processing chamber.
  24. Shufflebotham, Paul Kevin; Barnes, Michael, Method and apparatus for abatement of reaction products from a vacuum processing chamber.
  25. Wang, Rongping; Zeng, Jibing; Hou, David Muquing; Cox, Michael S.; Yuan, Zheng; L'Heureux, James, Method and apparatus for gas abatement.
  26. Chae, Seung-Ki; Lee, Sang-Gon; Chung, Sang-Hyuk; Heo, Seong-Jin, Method and apparatus for reducing PFC emission during semiconductor manufacture.
  27. Cheung, David; Raoux, Sebastien; Huang, Judy H.; Taylor, Jr., William N.; Fodor, Mark; Fairbairn, Kevin, Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions.
  28. Chen, David L.; Su, Yuh-Jia; Chiu, Eddie Ka Ho; Pozzoli, Maria Paola; Li, Senzi; Colangelo, Giuseppe; Alba, Simone; Petroni, Simona, Method for post-etch cleans.
  29. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Aegerter,Brian; Dundas,Curt; Peace,Steven L., Methods and apparatus for processing microelectronic workpieces using metrology.
  30. Clark, Daniel O.; Raoux, Sebastien; Vermeulen, Robert M.; Crawford, Shaun W., Methods and apparatus for sensing characteristics of the contents of a process abatement reactor.
  31. Chen, David; Goto, Haruhiro Harry; Martina, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  32. Chen, David; Goto, Haruhiro Harry; Su, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  33. Slingerland, Hendrik Nicolaas; Knowles, William Ralph, Particle optical apparatus with a predetermined final vacuum pressure.
  34. Thedjoisworo, Bayu Atmaja; Jacobs, Bradley Jon; Berry, Ivan; Cheung, David, Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films.
  35. Goto, Haruhiro Harry; Kalinovski, Ilia; Mohamed, Khalid, Photoresist strip method for low-k dielectrics.
  36. Shaviv, Roey; Ostrowski, Kirk; Cheung, David; Park, Joon; Thedjoisworo, Bayu; Lord, Patrick J., Photoresist strip processes for improved device integrity.
  37. Cheung, David; Ostrowski, Kirk J, Plasma based photoresist removal system for cleaning post ash residue.
  38. Cheung, David; Ostrowski, Kirk J., Plasma based photoresist removal system for cleaning post ash residue.
  39. Kitani, Ryouta; Nunomura, Nobuhide; Morioka, Yasukiyo; Yoshigai, Motohiko, Plasma processing apparatus.
  40. Radoiu, Marilena, Plasma treatment device.
  41. Kartik Ramaswamy ; Kwok Manus Wong ; Ashish Bhatnagar ; Mehran Moalem ; Tony S. Kaushal ; Shamouil Shamouilian, Porous ceramic liner for a plasma source.
  42. Pokharna,Himanshu; Le,Phong; Nemani,Srinivas D., Process and apparatus for abatement of by products generated from deposition processes and cleaning of deposition chambers.
  43. Josephson, Gary B.; Lessor, Delbert L.; Sharma, Amit K.; Aardahl, Christopher Lyle; Rappe, Kenneth G., Processes and apparatuses for treating halogen-containing gases.
  44. Josephson,Gary B.; Lessor,Delbert L.; Sharma,Amit K.; Aardahl,Christopher Lyle; Rappe,Kenneth G., Processes and apparatuses for treating halogen-containing gases.
  45. Aardahl,Christopher L.; Orth,Rick J.; Rapp?,Kenneth G.; Lessor,Delbert L.; Josephson,Gary B., Processes for treating halogen-containing gases.
  46. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Todd, Leonard B.; Vermeulen, Robbert, Reactor design to reduce particle deposition during process abatement.
  47. Shamouilian, Shamouil; Lai, Canfeng; Cox, Michael Santiago; Krishnaraj, Padmanabhan; Tanaka, Tsutomu; Raoux, Sebastien; Porshnev, Peter I.; Nowak, Thomas, Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas.
  48. Goto, Haruhiro Harry; Cheung, David, Simultaneous front side ash and backside clean.
  49. Koshi, Yasunobu; Suzaki, Kenichi; Yoshino, Akihito, Substrate processing apparatus and method of manufacturing semiconductor device.
  50. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.
  51. Norihiko Nomura JP; Nobuharu Noji JP, Trap apparatus.
  52. Bhatnagar, Ashish; Kaushal, Tony S.; Wong, Kwok Manus; Shamouilian, Shamouil, Treatment of hazardous gases in effluent.
  53. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Zhao; Yao, Guhua; Guha, Anirban; Ostrowski, Kirk J., Ultra low silicon loss high dose implant strip.
  54. Wilson,Gregory J.; McHugh,Paul R.; Hanson,Kyle M., Workpiece processor having processing chamber with improved processing fluid flow.
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