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Method and apparatus for controlling polymerized teos build-up in vacuum pump lines 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • H01L-021/00
  • B01D-024/00
출원번호 US-0250928 (1999-02-18)
발명자 / 주소
  • Dozoretz Paul
  • Gu Youfan
출원인 / 주소
  • MKS Instruments, Inc.
대리인 / 주소
    Young
인용정보 피인용 횟수 : 47  인용 특허 : 21

초록

A TEOS trap for controlling TEOS polymerization from reaction furnace effluent in a vacuum pump line a SiO.sub.2 CVD process includes a molecular species-selective flow impeding medium that adsorbs and retains TEOS and water molecules from the effluent long enough to consume substantially all the wa

대표청구항

[The embodiments of the invention in which an exclusive property or privilege is claimed which follow:] [1.]adsorbing and retaining TEOS and water molecules from the effluent on adsorption surfaces in a trap for long enough dwell time to consume substantially all of the water molecules in TEOS hydro

이 특허에 인용된 특허 (21)

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  4. Bar Gadda,Ronny, Apparatus and method using a remote RF energized plasma for processing semiconductor wafers.
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  8. Derderian, Garo J.; Sandhu, Gurtej S., Apparatus for improved delivery of metastable species.
  9. White, George W.; Vijay, Francis, Bone anchor suture-loading system, method and apparatus.
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  21. Saito, Masayuki, Low-pressure CVD apparatus and method of manufacturing a thin film.
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  24. Lindfors,Sven, Method and apparatus of growing a thin film onto a substrate.
  25. Fuodoor Gologhlan ; David Chi ; Kent Kuohua Chang ; Hector Serrato, Method of in-situ cleaning for LPCVD TEOS pump.
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