$\require{mediawiki-texvc}$
  • 검색어에 아래의 연산자를 사용하시면 더 정확한 검색결과를 얻을 수 있습니다.
  • 검색연산자
검색도움말
검색연산자 기능 검색시 예
() 우선순위가 가장 높은 연산자 예1) (나노 (기계 | machine))
공백 두 개의 검색어(식)을 모두 포함하고 있는 문서 검색 예1) (나노 기계)
예2) 나노 장영실
| 두 개의 검색어(식) 중 하나 이상 포함하고 있는 문서 검색 예1) (줄기세포 | 면역)
예2) 줄기세포 | 장영실
! NOT 이후에 있는 검색어가 포함된 문서는 제외 예1) (황금 !백금)
예2) !image
* 검색어의 *란에 0개 이상의 임의의 문자가 포함된 문서 검색 예) semi*
"" 따옴표 내의 구문과 완전히 일치하는 문서만 검색 예) "Transform and Quantization"

통합검색

도움말도움말
상세검색 다국어 입력

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Aerosol surface processing

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B24B-001/00   
미국특허분류(USC) 451/039 ; 451/038 ; 451/040 ; 451/053 ; 451/099 ; 451/102
출원번호 US-0309931 (1999-05-11)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 71  인용 특허 : 67
초록
▼

A scheme for removing foreign material from the surface of a substrate by directing a high velocity aerosol of at least partially frozen particles against the foreign material to be removed. Different schemes are described for accelerating the frozen particles to very high velocities sufficient for particle removal, removal of organic layers (e.g., hard baked photoresist or ion implanted photoresist) and removal of metallic layers. In one embodiment, liquid droplets are entrained in a high velocity gas flow and the resulting gas/liquid mixture is passed ...

대표
청구항

[What is claimed is:] [1.]generating an aerosol of at least partially frozen particles;providing a flow of a gas having a temperature above the freezing point of the aerosol particles for entraining said aerosol of at least partially frozen particles;entraining said aerosol particles in said gas;accelerating said gas to at least sonic velocity; anddelivering said entrained aerosol particles to foreign material to be removed from the surface of said substrate.

이 특허에 인용된 특허 (67)

  1. Srikrishnan Kris V. (Wappingers Falls NY) Wu Jin J. (Ossining NY). Aerosol cleaning method. USP1994125372652.
  2. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G.. Aerosol surface processing. USP1999085931721.
  3. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ). Apparatus and method for removing minute particles from a substrate. USP1989024806171.
  4. Titus Stephen D. (Houston TX). Apparatus and method of material removal with fluid flow within a slot. USP1984034439243.
  5. Lawson Robert M. (San Jose CA). Apparatus for cleaning semiconductor wafers. USP1983084401131.
  6. Kiyokawa Shinji (Kyoto JPX) Orgami Nobutoshi (Kyoto JPX) Takada Takeshi (Kyoto JPX) Kamei Kenji (Kyoto JPX). Apparatus for exposing periphery of an object. USP1994025289263.
  7. Tano Teruo (Ohta JPX) Hamada Shuji (Yokohama JPX). Apparatus for processing workpiece with sandblasting. USP1988064753051.
  8. Hayashi Chikara (Chigasaki JPX). Apparatus for removing covering film. USP1988054747421.
  9. Hayashi Noriyuki (Shiga JPX) Murayama Hiromi (Kyoto JPX) Ishino Yukihiko (Kyoto JPX). Apparatus for removing organic substance from substrate. USP1988074756047.
  10. Layden Lawrence M. (Stanton NJ). Apparatus for removing small particles from a substrate. USP1990104962891.
  11. Kono Yasumasa (Fujisawa JA) Miyahara Shuji (Yokohama JA) Nomura Susumu (Yokohama JA) Ohkubo Hiroyuki (Yokohama JA) Fujimori Yoshio (Tokyo JA) Iwawaki Akira (Yokohama JA) Hirata Hiromasa (Yokohama JA). Apparatus for treating surfaces of sheet steel or the like. USP1976103984943.
  12. Sugimoto Kenji (Kyoto JPX). Apparatus for treating the surfaces of wafers. USP1989104870923.
  13. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA). Apparatus to clean solid surfaces using a cryogenic aerosol. USP1993055209028.
  14. Fong Calvin C. (Beverly Hills CA) Altizer John W. (Simi Valley CA) Arnold Vernon E. (Fillmore CA) Lawson John K. (Granada Hills CA). Blasting machine utilizing sublimable particles. USP1983064389820.
  15. Swain Eugene A. (Webster NY) Carter Stephen R. (Tucson AZ) Hoenig Stuart A. (Tucson AZ). Carbon dioxide snow agglomeration and acceleration. USP1992065125979.
  16. Aigo Seiichiro (3-15-13 Negishi ; Daito-ku ; Tokyo JPX). Carrier for cleaning and etching wafers. USP1985024500080.
  17. Thompson Raymon F. (137 Sherry La. Kalispell MT 59901). Centrifugal wafer processor. USP1981114300581.
  18. Bartlett John M. (Woodcote near Reading GB2). Cleaning apparatus for components. USP1982124365383.
  19. Kanno Itaru (Itami City JPX) Fukumoto Takaaki (Itami City JPX) Ohmori Toshiaki (Itami City JPX). Cleaning device using fine frozen particles. USP1991125074083.
  20. Ichinoseki Tsuyoshi ((Yoshizawa Jutaku E-206) No. 844-2 ; Yoshizawa-cho Mito-shi ; Ibaragi-ken JPX) Kato Hirobumi ((Hyakujuen Jutaku D-302) No. 2617-2 ; Motoyoshida-cho Mito-shi ; Ibaragi-ken JPX) Mi. Cleaning method. USP1987044655847.
  21. Goffnett David M. (Alma MI) Richardson Mark D. (Hemlock MI) Bielby Eugene F. (Saginaw MI). Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets. USP1992045108512.
  22. Grant Robert W. (Excelsior MN) Novak Richard E. (Plymouth MN). Cluster tool dry cleaning system. USP1993075228206.
  23. Baumgart Jurgen (Huntingdon Beach CA). Continuous deflashing apparatus for molded articles. USP1988124793103.
  24. Olevitch Albert (Englewood OH). Cryogenic mechanical means of paint removal. USP1991095044129.
  25. McCune ; Jr. Robert C. (Birmingham MI) Toth Louis (Garden City MI) Bailey Robert S. (Newport News VA). Cryogenic process for metal lift-off. USP1989104871651.
  26. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA). Diffusion gas diluter. USP1993085231865.
  27. Moore David E. (Cincinnati OH). Extrusion arrangement for a cryogenic cleaning apparatus. USP1988034727687.
  28. Blackwood Robert S. (Lubbock TX) Biggerstaff Rex L. (Lubbock TX) Clements L. Davis (Lincoln NE) Cleavelin C. Rinn (Lubbock TX). Gaseous process and apparatus for removing films from substrates. USP1988064749440.
  29. Tanaka Masato (Shiga JPX). Gaseous process for selectively removing silicon nitride film. USP1994015279705.
  30. Syverson Daniel J. (Robbinsdale MN) Novak Richard E. (Plymouth MN). HF gas etching of wafers in an acid processor. USP1990024900395.
  31. Cherry Roger L. (2636 Maria Ct. West Linn OR 97068). High-purity cleaning system, method, and apparatus. USP1990064936922.
  32. Cherry Roger L. (West Linn OR) Burke Joseph J. (Portland OR) Platt Christopher W. (Portland OR) Cowles Craig H. (Tigard OR). High-purity cleaning system, method, and apparatus. USP1989054832753.
  33. Tada Masuo (Yao JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX). Ice particle forming and blasting device. USP1990124974375.
  34. Gibot Claude (Malakoff FRX) Charles Jean-Michel (Marolles-en-Hurepoix FRX). Installation for the projection of particles of dry ice. USP1987114707951.
  35. Freeouf John L. (Peekskill NY) Jackson Thomas N. (Ossining NY) Oelhafen Peter (Basel NY CHX) Pettit George D. (Mahopac NY) Woodall Jerry M. (Bedford Hills NY). Intermediate passivation and cleaning of compound semiconductor surfaces. USP1986074597825.
  36. Zimmerman Sanford S. (Westport CT) Syarto Louis W. (Fairfield CT). Machining center having an inclinable vacuum-holding worktable. USP1987114705438.
  37. Hall William B. (Dallas PA). Megasonic jet cleaner apparatus. USP1982044326553.
  38. Syverson Daniel J. (Robbinsdale MN). Method and apparatus for controlling simultaneous etching of front and back sides of wafers. USP1989084857142.
  39. Rufin Denis A. (Hinsdale IL). Method and apparatus for in situ cleaning of excimer laser optics. USP1991035001873.
  40. Westergaard Knud E. (Rolighedsvej 16 9560 Hadsund DKX). Method and apparatus for particle blasting using particles of a material that changes its state. USP1987114703590.
  41. Imaike Sekiji (Osaka JPX) Hata Takeki (Kobe JPX) Yamazaki Norio (Itami JPX). Method and apparatus for producing microfine frozen particles. USP1987114704873.
  42. Brandt Georg (Erlangen DEX). Method for machining workpieces of brittle hard material into wafers. USP1987054663890.
  43. Izumi Akira (Kyoto JPX) Toei Keiji (Kyoto JPX) Watanabe Nobuatsu (Kyoto JPX) Chong Yong-Bo (Kyoto JPX). Method for removing a film on a silicon layer surface. USP1991065022961.
  44. Williford ; Jr. John F. (7155 NE. 126th St. Kirkland WA 98034). Method for removing particulate matter. USP1994115364474.
  45. Ohmori Toshiaki (Itami JPX) Kanno Itaru (Itami JPX) Fukumoto Takaaki (Itami JPX). Method of cleaning a surface by blasting the fine frozen particles against the surface. USP1992095147466.
  46. Endo Shinji (Hyogo JPX) Ohmori Toshiaki (Hyogo JPX) Fukumoto Takaaki (Hyogo JPX) Namba Keisuke (Hyogo JPX). Method of treating surface of substrate with ice particles and hydrogen peroxide. USP1992015081068.
  47. Moore David E. (212 Southampton Rd. Louisville KY 40223) Crane Newell D. (5988 Woodridge Dr. Milford OH 45150). Particle-blast cleaning apparatus and method. USP1988054744181.
  48. Lloyd Daniel L. (Mason OH). Phase change injection nozzle. USP1991055018667.
  49. Grant Robert W. (Excelsior MN) Torek Kevin (State College PA) Novak Richard E. (Plymouth MN) Ruzyllo Jerzy (State College PA). Process for etching oxide films in a sealed photochemical reactor. USP1993085234540.
  50. Hayashi Chikara (Chigasaki JPX). Process for removing covering film and apparatus therefor. USP1986124631250.
  51. Ockovic Richard C. (Allentown PA) McDermott Wayne T. (Allentown PA) Schwarz Alexander (Allentown PA). Process for sizing particles using condensation nucleus counting. USP1991065026155.
  52. Rose Peter H. ; Sferlazzo Piero. Processing a surface. USP1999105967156.
  53. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX). Processing apparatus for semiconductor wafers. USP1991065025597.
  54. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX). Processing apparatus for semiconductor wafers. USP1990064932168.
  55. Tada, Masuo; Hata, Takeki; Fukumoto, Takaaki; Ohmori, Toshiaki. Processing method for semiconductor wafers. USP1991075035750.
  56. Stemple Donald K. (Tempe AZ). Reactive sputter cleaning of semiconductor wafer. USP1986044585517.
  57. Leliaert Raymond M. (South Bend IN). Sand reclamation system. USP1976013934374.
  58. Fong Calvin C. (Beverly Hills CA). Sandblasting with pellets of material capable of sublimation. USP1977084038786.
  59. McNeilly Michael A. (Palo Alto CA). Semiconductor substrate heater and reactor process and apparatus. USP1988104778559.
  60. McNeilly Michael M. (Palo Alto CA). Semiconductor substrate heater and reactor process and apparatus. USP1990074938815.
  61. McNeilly Michael A. (Palo Alto CA). Semiconductor wafer processing apparatus. USP1991095044314.
  62. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY). Surface cleaning using a cryogenic aerosol. USP1991115062898.
  63. Inoue Yosuke (Ibaraki JPX) Maki Michiyoshi (Hachioji JPX) Wanami Masahiro (Hadano JPX) Kabashima Akira (Ome JPX). System for cleaning articles. USP1984074458703.
  64. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN). System for surface and fluid cleaning. USP1989044817652.
  65. Bard Steven (Northridge CA) Wu Jiunn-Jeng (Sierra Madre CA) Trimble Curtis A. (Sierra Madre CA). Ultra-high temperature stability Joule-Thomson cooler with capability to accommodate pressure variations. USP1992065119637.
  66. Moses ; Robert W.. Valve cleaning machine. USP1978044084357.
  67. Levi Mark W. (Utica NY). Wafer cleaning method. USP1991045009240.

이 특허를 인용한 특허 피인용횟수: 71

  1. Castrucci, Paul P.. Apparatus and method for semiconductor wafer cleaning. USP2005026858089.
  2. Castrucci, Paul. Apparatus and method for semiconductor wafer test yield enhancement. USP2003026521466.
  3. Ko,Se Jong; Kim,Jung Gwan; Yoon,Cheol Nam; Lee,Jeong Ho. Apparatus for cleaning the edges of wafers. USP2007097270136.
  4. Jackson,David P.. Apparatus to treat and inspect a substrate. USP2006117134946.
  5. Jackson,David P.. Carbon dioxide snow apparatus. USP2007117293570.
  6. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for administering compartmentalized frozen particles. USP2013108545857.
  7. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for administering compartmentalized frozen particles. USP2013108563012.
  8. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for administering compartmentalized frozen particles. USP2013108551506.
  9. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for administering compartmentalized frozen particles. USP2013128603494.
  10. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for biological remodeling with frozen particle compositions. USP2013128603495.
  11. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for biological remodeling with frozen particle compositions. USP2013128603496.
  12. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for biological remodeling with frozen particle compositions. USP2013108545806.
  13. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for biological remodeling with frozen particle compositions. USP2014058731842.
  14. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for biological remodeling with frozen particle compositions. USP2013128613937.
  15. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for biological remodeling with frozen particle compositions. USP2014078788212.
  16. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for delivery of frozen particle adhesives. USP2015069056047.
  17. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for delivery of frozen particle adhesives. USP2015069050251.
  18. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for delivery of frozen particle adhesives. USP2013108545856.
  19. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for delivery of frozen particle adhesives. USP2015069060931.
  20. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2013048409376.
  21. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2015079072799.
  22. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2014058721583.
  23. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2014058725420.
  24. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2013108545855.
  25. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2015069050070.
  26. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2015069060934.
  27. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for surface abrasion with frozen particles. USP2014058722068.
  28. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2015079072688.
  29. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2015069050317.
  30. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2014058731840.
  31. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2015069060926.
  32. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2014078793075.
  33. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2014058731841.
  34. Boyden, Edward S.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Compositions and methods for therapeutic delivery with frozen particles. USP2013108551505.
  35. Endisch, Denis H.. Edge bead removal for spin-on materials containing low volatility solvents fusing carbon dioxide cleaning. USP2003056565920.
  36. Herbst, Tim W.; Maciej, Todd K.; Gast, Tracy A.; Wagener, Thomas J.; Siefering, Kevin L.. Edge gripping device for handling a set of semiconductor wafers in an immersion processing system. USP2005016845779.
  37. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen compositions and array devices thereof. USP2014078784384.
  38. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen compositions and methods for piercing a substrate. USP2014088798932.
  39. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen compositions and methods for piercing a substrate. USP2013108568363.
  40. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen compositions and methods for piercing a substrate. USP2015059040087.
  41. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen compositions and methods for piercing a substrate. USP2014088798933.
  42. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen compositions and methods for piercing a substrate. USP2014108858912.
  43. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Frozen piercing implements and methods for piercing a substrate. USP2014078784385.
  44. Banerjee, Souvik; Chung, Harlan Forrest. Liquid-assisted cryogenic cleaning. USP2005026852173.
  45. Banerjee,Souvik; Chung,Harlan Forrest. Liquid-assisted cryogenic cleaning. USP2006067056391.
  46. Taylor, Andrew M.. Method and apparatus for high pressure article cleaner. USP2005066910957.
  47. Summers, David Archibold; Woelk, Klaus Hubert; Oglesby, Kenneth Doyle; Galecki, Grzegorz. Method and apparatus for jet-assisted drilling or cutting. USP2013078475230.
  48. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Method and system for comparing tissue ablation or abrasion data to data related to administration of a frozen particle composition. USP2014078788211.
  49. Jackson, David P.. Method of forming cryogenic fluid composition. USP2015018926858.
  50. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Methods and systems for ablation or abrasion with frozen particles and comparing tissue surface ablation or abrasion data to clinical outcome data. USP2014068762067.
  51. Boumerzoug,Mohamed; Tannous,Adel George. Methods for residue removal and corrosion prevention in a post-metal etch process. USP2006117134941.
  52. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid. Methods for resist stripping and cleaning surfaces substantially free of contaminants. USP2006057040961.
  53. Tannous,Adel George; Makhamreh,Khalid. Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants. USP2006067066789.
  54. Tannous,Adel George; Makhamreh,Khalid. Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants. USP2007117297286.
  55. Tannous,Adel George; Makhamreh,Khalid. Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants. USP2006097101260.
  56. Sandhu, Gurtej S.; Sinha, Nishant. Methods for treating surfaces. USP2010117837805.
  57. Lucey, Jr., George K.; Gher, Thomas; Cooper, Guy; Richter, Robert J.. Methods for using a ring-vortex. USP2003046544347.
  58. Hiraga, Mikitoshi; Tsunoda, Ryoichi; Inagaki, Kenichiro; Maeda, Kazuyoshi; Suzuki, Yukinori; Shibuya, Norihito. Nozzle, a nozzle unit, and a blasting machine. USP2015089114503.
  59. Yim, Dong-Kil; White, John M.; Choi, Soo Young; Kim, Han Byoul; Ha, Jin Man; Park, Beom Soo. Power loading substrates to reduce particle contamination. USP2013018361549.
  60. Yim, Dong-Kil; White, John M.; Choi, Soo Young; Kim, Han Byoul; Ha, Jin Man; Park, Beom Soo. Power loading substrates to reduce particle contamination. USP2011128075952.
  61. Cotte, John Michael; McCullough, Kenneth John; Moreau, Wayne Martin; Pope, Keith R.; Simons, John P.; Taft, Charles J.. Process of removing ion-implanted photoresist from a workpiece. USP2004016683008.
  62. Christenson, Kurt K.; Rathman, Christina A.. Semiconductor wafer cleaning systems and methods. USP2005046875289.
  63. Vaupel, Mathias; Bernrieder, Sebastian; Koller, Adolf; Martens, Stefan. Separation of semiconductor devices from a wafer carrier. USP2014118883565.
  64. Dobashi, Kazuya; Inai, Kensuke; Shimizu, Akitaka; Yasuda, Kenta; Yoshino, Yu; Aida, Toshihiro; Senoo, Takehiko. Substrate cleaning apparatus and vacuum processing system. USP2015129214364.
  65. Andersson, Göran. Surface treatment nozzle. USP2004116824453.
  66. Buccos, Paul S.. System and method for cleaning an ion implanter. USP2009067544254.
  67. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Systems, devices and methods for making or administering frozen particles. USP2013088518031.
  68. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Systems, devices, and methods for making or administering frozen particles. USP2013048414356.
  69. Boyden, Edward S.; Cook, Daniel B.; Hyde, Roderick A.; Leuthardt, Eric C.; Myhrvold, Nathan P.; Sweeney, Elizabeth A.; Wood, Jr., Lowell L.. Systems, devices, and methods for making or administering frozen particles. USP2013078485861.
  70. Martens, Stefan; Vaupel, Mathias. Testing process for semiconductor devices. USP2015089099547.
  71. Banerjee, Souvik; Chung, Harlan Forrest. Vapor-assisted cryogenic cleaning. USP2005096949145.

IPC 상위 출원인