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Substrate transfer shuttle having a magnetic drive 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-035/00
출원번호 US-0082605 (1998-05-20)
발명자 / 주소
  • Blonigan Wendell T.
  • White John M.
출원인 / 주소
  • Applied Komatsu Technology, Inc., JPX
대리인 / 주소
    Thomason, Moser & Patterson
인용정보 피인용 횟수 : 76  인용 특허 : 48

초록

A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can

대표청구항

[What is claimed is:] [1.]a first chamber;a second chamber in communication with the first chamber;a substrate support movable along a generally linear path between the first chamber and the second chamber, the substrate support including a plurality of linearly-spaced magnets;a first plurality of g

이 특허에 인용된 특허 (48)

  1. White John M. (Hayward CA) Berkstresser David E. (Los Gatos CA) Petersen Carl T. (Fremont CA), Alignment of a shadow frame and large flat substrates on a heated support.
  2. White John M. (2811 Colony View Pl. Hayward CA 94541) Berkstresser David E. (19311 Bear Creek Rd. Los Gatos CA 95030) Petersen Carl T. (1185 Gilbert Ct. Fremont CA 94536), Alignment of a shadow frame and large flat substrates on a support.
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  5. Stevens Craig L. (Felton CA), Apparatus for aligning substrates for loading and unloading using a robot mechanism.
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  10. Tanaka Hirokuni (Ooiso JPX), Clean tunnel conveying structure.
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  12. Southworth Peter R. (Mission Viejo CA) Baxter Gregory R. (Orange CA), Conveyor system.
  13. Burney Roger D. (Sunnyvale CA), Distributed routing unit for fully-automated flexible manufacturing system.
  14. Chizinsky George (143 West St. Beverly Farms MA 01915), Heated plate rapid thermal processor.
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  17. Aruga Yoshiki,JPX ; Kamikura Yo,JPX, In-line film deposition system.
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  20. Coleman John H. (Locust Valley NY), Method of forming semiconducting materials and barriers using a dual enclosure apparatus.
  21. Coleman John H. (Locust Valley NY), Method of forming semiconducting materials and barriers using a multiple chamber arrangement.
  22. Turner Norman L. (Mountain View CA) White John MacNeill (Los Gatos CA) Berkstresser David (Los Gatos CA), Method of heating and cooling large area glass substrates.
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  24. Yamabe Kikuo (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Method of thermally processing semiconductor wafers and an apparatus therefor.
  25. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
  26. Namiki Minoru (Fuchu JPX) Takahashi Nobuyuki (Fuchu JPX), Multi-chamber integrated process system.
  27. Hartig Klaus (Brighton MI) Szczyrbowski Joachim (Goldbach DEX), Multichamber coating apparatus.
  28. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multichamber integrated process system.
  29. Kaneko Satoshi (Yokohama JPX) Fugita Taichi (Yamato JPX) Yoshida Yukimasa (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Pressure-reduced chamber system having a filter means.
  30. Schmitt Jacques (La Ville Du Bois FRX), Process and means for producing films for use in electronics and/or optoelectronics using plasma.
  31. Lee Chunghsin (Lynnfield MA), Rapid thermal furnace for semiconductor processing.
  32. Ozias Albert E. (Aumsville OR), Reaction chambers for CVD systems.
  33. Grunes Howard (Santa Cruz CA) Tepman Avi (Cupertino CA) Lowrance Robert (Los Gatos CA), Robot assembly.
  34. Stevens Craig L. (Felton CA), Self-calibration system for robot mechanisms.
  35. Wu Hong-Jen,TWX ; Chen Taylor,TWX ; Lai Jack,TWX ; Chen I. I.,TWX, Single semiconductor wafer transfer method and manufacturing system.
  36. Deligi Mario (Newton NJ) Derbinsky Senia (River Edge NY), Spiral magnetic linear translating mechanism.
  37. Hughes John L. (Rodeo CA) Lawson Eric C. (Sunnyvale CA), Substrate handling and processing system.
  38. Matsumura Yoshio (Hikone JPX) Shimaji Katsumi (Hikone JPX), Substrate processing apparatus.
  39. Moslehi Mehrdad M. (Palo Alto CA) Saraswat Krishna C. (Santa Clara County CA), Thermal/microwave remote plasma multiprocessing reactor and method of use.
  40. Peyraud Dominique (Bienne CHX) Voumard Martial (Bienne CHX), Transfer machine for sealing electronic or like components under vacuum.
  41. Norman Arthur E. (Northridge CA), Transport system for inline vacuum processing.
  42. Babinski John Paul (Essex Junction VT) Bertelsen Bruce Irving (Essex Junction VT) Raacke Karl Heinz (Essex Junction VT) Sirgo Valdeko Harry (Colchester VT) Townsend Clarence Jay (Essex Junction VT), Transport system for semiconductor wafer multiprocessing station system.
  43. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
  44. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
  45. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
  46. Katagiri Yoshitaka (Yokohama JPX), Vacuum processing apparatus and transportation system thereof.
  47. Turner Norman L. (Mountain View CA) White John M. (Hayward CA), Vacuum processing apparatus having improved throughput.
  48. Dorenbos Frederick William (El Cerrito CA), Workpiece handling system for vacuum processing.

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  1. Maynard, Michael D.; Young, Richard C.; Ward, Ronald E., Article retrieving and positioning system and apparatus for articles, layers, cases, and pallets.
  2. Thompson, David R.; Vijay, Tumkur R.; Dunfee, William D.; Gillund, Daniel E., Bi-directional magnetic sample rack conveying system.
  3. Thompson, David R.; Vijay, Tumkur R.; Dunfee, William D.; Gillund, Daniel E., Bi-directional magnetic sample rack conveying system.
  4. Hosek, Martin; Moura, Jairo Terra; Hofmeister, Christopher, Commutation of an electromagnetic propulsion and guidance system.
  5. Bausenwein, Alfred; Schmitt, Peter, Conveyor system.
  6. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  7. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  8. Riether, Christian, Dispatching device, sample distribution system and laboratory automation system.
  9. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  10. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  11. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  12. Yudovsky, Joseph, Gas distribution system for cyclical layer deposition.
  13. Ettinger, Gary C.; White, John M., Isolation valves.
  14. Riether, Christian, Laboratory cargo distribution system, laboratory automation system and method of operating a laboratory cargo distribution system.
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  24. Hofmeister, Christopher; Caveney, Robert T., Linear substrate transport apparatus.
  25. White,John M.; Blonigan,Wendell T., Linear vacuum deposition system.
  26. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  27. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
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  29. Miyauchi, Nobuhito; Takeyama, Terushige; Shiba, Takashi, Magnetic carrying device.
  30. Veiner,Craig R., Magnetic specimen-transport system for automated clinical instrument.
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  32. Kurita,Shinichi; Blonigan,Wendell T., Method for transferring substrates in a load lock chamber.
  33. Bachrach, Robert Z., Method of achieving high productivity fault tolerant photovoltaic factory with batch array transfer robots.
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  73. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
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