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Method and apparatus for substrate transfer and processing 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/07
출원번호 US-0082428 (1998-05-20)
발명자 / 주소
  • White John M.
  • Blonigan Wendell T.
  • Tiner Robin L.
  • Kurita Shinichi
출원인 / 주소
  • Applied Komatsu Technology, Inc., JPX
대리인 / 주소
    Fish & Richardson PC
인용정보 피인용 횟수 : 64  인용 특허 : 50

초록

The present invention allows large glass substrates to be rapidly moved from one processing station to another. Such movement occurs such that drives in different chambers are synchronized to move the glass substrates on shuttles at appropriate times. In systems according to the invention, at least

대표청구항

[ What is claimed is:] [1.]1. An apparatus for processing a substrate, comprising:a first processing chamber;a second processing chamber in communication with the first processing chamber;a substrate transfer shuttle moveable along a shuttle path between a first position in the first chamber and a s

이 특허에 인용된 특허 (50)

  1. White John M. (Hayward CA) Berkstresser David E. (Los Gatos CA) Petersen Carl T. (Fremont CA), Alignment of a shadow frame and large flat substrates on a heated support.
  2. White John M. (2811 Colony View Pl. Hayward CA 94541) Berkstresser David E. (19311 Bear Creek Rd. Los Gatos CA 95030) Petersen Carl T. (1185 Gilbert Ct. Fremont CA 94536), Alignment of a shadow frame and large flat substrates on a support.
  3. Prentakis Antonios E. (Cambridge MA), Apparatus and method for loading and unloading wafers.
  4. Hirasawa Shigeki (Ibaraki) Torii Takuji (Ushiku) Watanabe Tomoji (Ibaraki) Komatsu Toshihiro (Ibaraki) Honma Kazuo (Ibaraki) Sakai Akihiko (Ibaraki) Takagaki Tetsuya (Tokorozawa) Uchino Toshiyuki (To, Apparatus and method for performing heat treatment on semiconductor wafers.
  5. Stevens Craig L. (Felton CA), Apparatus for aligning substrates for loading and unloading using a robot mechanism.
  6. Ushijima Mitsuru (Tokyo JPX) Akimoto Masami (Kikuchi JPX), Apparatus for coating a photo-resist film and/or developing it after being exposed.
  7. Anderle Friedrich (Hanau DEX) Patz Ulrich (Linsengericht DEX), Apparatus for coating substrates, preferably flat, more or less plate-like substrates.
  8. Sugimoto Kenji (Kyoto JPX), Apparatus for treating the surfaces of wafers.
  9. Giammanco Rosario P. (Gloucester MA), Article delivery and transport apparatus for evacuated processing equipment.
  10. Tanaka Hirokuni (Ooiso JPX), Clean tunnel conveying structure.
  11. Toriumi Kiyoshi (Tokyo) Kimura Kazumasa (Tokyo JPX), Conveying apparatus used in assembling semicondutors.
  12. Southworth Peter R. (Mission Viejo CA) Baxter Gregory R. (Orange CA), Conveyor system.
  13. Burney Roger D. (Sunnyvale CA), Distributed routing unit for fully-automated flexible manufacturing system.
  14. Chizinsky George (143 West St. Beverly Farms MA 01915), Heated plate rapid thermal processor.
  15. Chizinsky George (143 West St. Beverly Farms MA 01915), Heated plate rapid thermal processor.
  16. Flint Alan (Los Gatos CA) Miller Ken (Mt. View CA) Shah Sushil (Sunnyvale CA), In-line disk sputtering system.
  17. Aruga Yoshiki,JPX ; Kamikura Yo,JPX, In-line film deposition system.
  18. Hasegawa Yoshiro,JPX ; Suzuki Naoyuki,JPX ; Abe Tomoaki,JPX, Magnetic transfer system, power transmission mechanism of the magnetic transfer system, and rotational driving member u.
  19. Shimoyashiro Sadao (Fujisawa JPX) Iwasaki Takemasa (Yokohama JPX) Kawaji Hiroyuki (Yokohama JPX) Hamada Toyohide (Yokohama JPX) Ikeda Minoru (Yokohama JPX) Kikuchi Hiroshi (Hiratsuka JPX) Nagatomo Hi, Method and apparatus for carrying a variety of products.
  20. Coleman John H. (Locust Valley NY), Method of forming semiconducting materials and barriers using a dual enclosure apparatus.
  21. Coleman John H. (Locust Valley NY), Method of forming semiconducting materials and barriers using a multiple chamber arrangement.
  22. Turner Norman L. (Mountain View CA) White John MacNeill (Los Gatos CA) Berkstresser David (Los Gatos CA), Method of heating and cooling large area glass substrates.
  23. Turner Norman L. (Mountain View CA) White John M. (Los Gatos CA) Berkstresser David (Los Gatos CA), Method of heating and cooling large area substrates and apparatus therefor.
  24. Yamabe Kikuo (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Method of thermally processing semiconductor wafers and an apparatus therefor.
  25. Mahler Peter (Hainburg DEX), Modular vacuum system for the treatment of disk-shaped workpieces.
  26. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
  27. Namiki Minoru (Fuchu JPX) Takahashi Nobuyuki (Fuchu JPX), Multi-chamber integrated process system.
  28. Hartig Klaus (Brighton MI) Szczyrbowski Joachim (Goldbach DEX), Multichamber coating apparatus.
  29. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multichamber integrated process system.
  30. Kaneko Satoshi (Yokohama JPX) Fugita Taichi (Yamato JPX) Yoshida Yukimasa (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Pressure-reduced chamber system having a filter means.
  31. Schmitt Jacques (La Ville Du Bois FRX), Process and means for producing films for use in electronics and/or optoelectronics using plasma.
  32. Lee Chunghsin (Lynnfield MA), Rapid thermal furnace for semiconductor processing.
  33. Ozias Albert E. (Aumsville OR), Reaction chambers for CVD systems.
  34. Grunes Howard (Santa Cruz CA) Tepman Avi (Cupertino CA) Lowrance Robert (Los Gatos CA), Robot assembly.
  35. Stevens Craig L. (Felton CA), Self-calibration system for robot mechanisms.
  36. Wu Hong-Jen,TWX ; Chen Taylor,TWX ; Lai Jack,TWX ; Chen I. I.,TWX, Single semiconductor wafer transfer method and manufacturing system.
  37. Deligi Mario (Newton NJ) Derbinsky Senia (River Edge NY), Spiral magnetic linear translating mechanism.
  38. Hughes John L. (Rodeo CA) Lawson Eric C. (Sunnyvale CA), Substrate handling and processing system.
  39. Matsumura Yoshio (Hikone JPX) Shimaji Katsumi (Hikone JPX), Substrate processing apparatus.
  40. Moslehi Mehrdad M. (Palo Alto CA) Saraswat Krishna C. (Santa Clara County CA), Thermal/microwave remote plasma multiprocessing reactor and method of use.
  41. Peyraud Dominique (Bienne CHX) Voumard Martial (Bienne CHX), Transfer machine for sealing electronic or like components under vacuum.
  42. Norman Arthur E. (Northridge CA), Transport system for inline vacuum processing.
  43. Babinski John Paul (Essex Junction VT) Bertelsen Bruce Irving (Essex Junction VT) Raacke Karl Heinz (Essex Junction VT) Sirgo Valdeko Harry (Colchester VT) Townsend Clarence Jay (Essex Junction VT), Transport system for semiconductor wafer multiprocessing station system.
  44. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
  45. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
  46. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
  47. Katagiri Yoshitaka (Yokohama JPX), Vacuum processing apparatus and transportation system thereof.
  48. Turner Norman L. (Mountain View CA) White John M. (Hayward CA), Vacuum processing apparatus having improved throughput.
  49. Miller Kenneth C. (280 Easy St. ; #117 Mountain View CA 94043), Wafer transport device.
  50. Dorenbos Frederick William (El Cerrito CA), Workpiece handling system for vacuum processing.

이 특허를 인용한 특허 (64)

  1. Liu, Yong, Apparatus and method for assembling backlight module.
  2. White, John M.; Kurita, Shinichi, Apparatus and method for robotic alignment of substrates.
  3. Cleary, Thomas M.; Smith, Larry G.; Thomas, John C., Apparatus for shaping glass and methods.
  4. Buzan, Forrest; Cyrulik, Michael; Reynolds, Aria; Sirois, Jason S.; Sweet, Larry; MacDonald, Edward A.; Apgar, Taylor A.; Perrault, Timothy; Toebes, Stephen C., Automated storage and retrieval system.
  5. Buzan, Forrest; Cyrulik, Michael; Reynolds, Aria; Sirois, Jason S.; Sweet, Larry; MacDonald, Edward A.; Apgar, Taylor A.; Perrault, Timothy; Toebes, Stephen C., Automated storage and retrieval system.
  6. Dorval, Rick K.; Comins, Todd, Automated storage and retrieval system with integral secured personnel access zones and remote rover shutdown.
  7. Sullivan, Robert; Cyrulik, Michael; Toebes, Stephen C., Bot position sensing.
  8. Sullivan, Robert; Cyrulik, Michael; Toebes, Stephen C., Bot position sensing.
  9. Toebes, Stephen C.; Sullivan, Robert; Cyrulik, Michael, Bot position sensing.
  10. Toebes, Stephen C.; Sullivan, Robert; Cyrulik, Michael, Bot position sensing.
  11. Inagawa,Makoto; Hosokawa,Akihiro, Chamber for uniform heating of large area substrates.
  12. Butterfield,Paul D.; Chen,Liang Yuh; Hu,Yongqi; Manens,Antoine P.; Mavliev,Rashid; Tsai,Stan D.; Liu,Feng Q.; Wadensweiler,Ralph, Conductive polishing article for electrochemical mechanical polishing.
  13. Lert, John; Toebes, Stephen; Sullivan, Robert; Hinshaw, Foster D.; Ulrich, Nathan; Peters, Eric, Control system for storage and retrieval systems.
  14. Lert, John; Toebes, Stephen; Sullivan, Robert; Hinshaw, Foster D.; Ulrich, Nathan; Peters, Eric, Control system for storage and retrieval systems.
  15. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  16. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  17. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  18. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  19. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  20. Hosokawa, Akihiro, End effector assembly.
  21. Blonigan, Wendell T.; Matsumoto, Takayuki; Sterling, William N.; Leung, Billy C., End effector assembly for supporting a substrate.
  22. Irie, Nobuyuki; Ishimaru, Katsuaki, Exposure apparatus, microdevice, photomask, and exposure method.
  23. Yudovsky, Joseph, Gas distribution system for cyclical layer deposition.
  24. Inagawa, Makoto; Kurita, Shinichi, Heater plate and heater element assembly.
  25. Inagawa, Makoto; Kurita, Shinichi, Heater plate and heater element assembly.
  26. Fukuoka, Tetsuo; Akimoto, Masami; Kitano, Takahiro; Kimura, Yoshio; Hayashi, Shinichi; Ito, Hikaru, Heating apparatus, and coating and developing apparatus.
  27. Ettinger, Gary C.; White, John M., Isolation valves.
  28. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
  29. Zeygerman,Leonid, Laser cutting installation with parts unloading unit.
  30. Leibinger,Peter; Zeygerman,Leonid, Laser processing installation with integrated loading/unloading of workpieces.
  31. Zeygerman,Leonid; Kampitsch,Walter; Medeiros,Jorge, Laser processing installation with readily accessible cutting unit.
  32. White,John M.; Blonigan,Wendell T., Linear vacuum deposition system.
  33. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  34. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
  35. Lee, Jae-Chull; Anwar, Suhail; Kurita, Shinichi, Load lock chamber with decoupled slit valve door seal compartment.
  36. Cyrulik, Michael; Sullivan, Robert, Maintenance access zones for storage and retrieval systems.
  37. Cyrulik, Michael; Sullivan, Robert, Maintenance access zones for storage and retrieval systems.
  38. Cyrulik, Michael; Sullivan, Robert, Maintenance access zones for storage and retrieval systems.
  39. Cyrulik, Michael; Sullivan, Robert, Maintenance access zones for storage and retrieval systems.
  40. Kurita,Shinichi; Blonigan,Wendell T., Method for transferring substrates in a load lock chamber.
  41. Bachrach, Robert Z., Method of achieving high productivity fault tolerant photovoltaic factory with batch array transfer robots.
  42. Bachrach,Robert Z., Method of achieving high productivity fault tolerant photovoltaic factory with batch array transfer robots.
  43. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  44. Bagley, William A.; Ramirez, Ericka M.; Wolgast, Stephen C., Pedestal for flat panel display applications.
  45. Sullivan, Robert; Toebes, Stephen C., Pickface builder for storage and retrieval systems.
  46. Toebes, Stephen C.; Sullivan, Robert, Pickface builder for storage and retrieval systems.
  47. Bagley, William A.; Ramirez, Ericka M.; Wolgast, Stephen C., Pre-heating and load lock pedestal material for high temperature CVD liquid crystal and flat panel display applications.
  48. Thomas Lauinger DE; Armin Aberle AU; Richard Auer DE; Guido Halbach DE; Manuel Kanne DE; Hanno Paschke DE; Jens Moschner DE, Process and arrangement for continuous treatment of objects.
  49. Ozawa, Jun; Takahashi, Gaku, Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus.
  50. Galburt, Vladimir; Lerner, Alexander; Brown, Brian, Processing system architecture with single load lock chamber.
  51. Lert, John; Toebes, Stephen C.; Sullivan, Robert; Hinshaw, Foster; Ulrich, Nathan, Storage and retrieval system.
  52. Sullivan, Robert; Toebes, Stephen C., Storage and retrieval system case unit detection.
  53. Sullivan, Robert; Toebes, Stephen C., Storage and retrieval system case unit detection.
  54. Sullivan, Robert; Toebes, Stephen C., Storage and retrieval system case unit detection.
  55. Sullivan, Robert; Toebes, Stephen C., Storage and retrieval system case unit detection.
  56. Sullivan, Robert; Toebes, Stephen C., Storage and retrieval system case unit detection.
  57. Blonigan,Wendell T.; White,John M., Substrate conveyor system.
  58. Nguyen, Andrew; Schneider, Gerhard; Hosokawa, Akihiro; Matsumoto, Takayuki, Substrate support.
  59. Kurita, Shinichi; Anwar, Suhail; Kiyotake, Toshio, Substrate support bushing.
  60. Kurita, Shinichi; Anwar, Suhail; Kiyotake, Toshio, Substrate support bushing.
  61. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.
  62. Hagiwara, Itaru; Nozawa, Naoyuki, Substrate transport apparatus and method for manufacturing magnetic recording medium.
  63. Chinbe, Hiroshi; Endo, Yoshiya; Shimakawa, Naoki; Fukuwatari, Ichiro; Hayashida, Yoshiaki; Takakura, Yoshio; Matsuyama, Akio; Kohketsu, Hideto, Transfer device for substrate and storing device and hand therein, and substrate handled by the device.
  64. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
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