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Method and apparatus for recovering rare gas 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
출원번호 US-0355556 (1999-07-30)
우선권정보 JP0330228 (1997-12-01)
국제출원번호 PCT/JP98/05335 (1998-11-27)
§371/§102 date 19990730 (19990730)
국제공개번호 WO-9928023 (1999-06-10)
발명자 / 주소
  • Ohmi Tadahiro,JPX
  • Ishihara Yoshio,JPX
출원인 / 주소
  • Ohmi
  • Tadahiro, JPX
대리인 / 주소
    Armstrong, Westerman, Hattori, McLeland & Naughton LLP
인용정보 피인용 횟수 : 15  인용 특허 : 11

초록

A process and an apparatus for recovering a noble gas, which can recover a noble gas exhausted from a noble gas employing system efficiently and also can supply the noble gas of a predetermined purity to the noble gas employing system and which can reduce consumption of the noble gas. In the process

대표청구항

[ What is claimed is:] [1.]1. A process for recovering a noble gas, which comprises, in recovering a noble gas contained in an exhaust gas exhausted from a noble gas employing system operated under reduced pressure, carrying out an operation of switching between introduction of the exhaust gas to a

이 특허에 인용된 특허 (11)

  1. Cardullo John J. (707 Alter St. Philadelphia PA 19147), Air pollution control device and method.
  2. Ohmi Tadahiyo (1-17-301 Komegabukuro 2-chome Sendai-shi ; Miyagi-ken 980 JPX), Apparatus for supplying ultrahigh purity gas.
  3. Tom Glenn M. ; McManus James V., Gas source and dispensing system.
  4. Briesacher Jeffrey L. ; Applegarth Charles H. ; Lorimer D'Arcy H., Method and apparatus for removing residual hydrogen from a purified gas.
  5. Furukawa Heizaburo (Hiroshima JPX) Wake Kanji (Hiroshima JPX) Shimozato Yoshio (Hiroshima JPX) Yanagi Kenichi (Hiroshima JPX) Katoh Mitsuo (Hiroshima JPX) Wada Tetsuyoshi (Hiroshima JPX) Tsukiji Nori, Method and apparatus for vacuum deposition plating.
  6. Furukawa Heizaburo (Hiroshima JPX) Wake Kanji (Hiroshima JPX) Shimozato Yoshio (Hiroshima JPX) Yanagi Kenichi (Hiroshima JPX) Katoh Mitsuo (Hiroshima JPX) Wada Tetsuyoshi (Hiroshima JPX) Tsukiji Nori, Method for vacuum deposition plating steel strip.
  7. Doubrawa Franz (Tribuswinkel DEX) Joksch Martin (Baden DEX), Process for purifying exhaust air from plant parts of oil mills.
  8. Tom Glenn M. ; McManus James V., Process system with integrated gas storage and delivery unit.
  9. Smith James Robert,GBX, Processes for the scrubbing of noxious substances.
  10. Girard Jean-Marc,FRX ; Mail Alain,FRX ; Marot Yves,FRX, Selection device for providing one or the other of two gases to an apparatus.
  11. Bourne Gary L. (Idaho Falls ID) Meikrantz David H. (Idaho Falls ID) Ely Walter E. (Los Alamos NM) Tuggle Dale G. (Los Alamos NM) Grafwallner Ervin G. (Arco ID) Wickham Keith L. (Idaho Falls ID) Maltr, Tritium monitor and collection system.

이 특허를 인용한 특허 (15)

  1. Wenchang Ji ; Arthur I. Shirley ; Michael Joseph McGowan ; Daniel Arthur Morgan, Cold gas-dynamic spraying process.
  2. Kawasaki, Hiroyuki; Ohiwa, Tokuhisa; Sakai, Itsuko, Gas recirculation flow control method and apparatus for use in vacuum system.
  3. Song, Lingyan; Brown, Lloyd Anthony, Inert gas recovery and recycle for silicon crystal growth pulling process.
  4. Ishihara, Yoshio; Hayashida, Shigeru; Nagasaka, Toru; Kimijima, Tetsuya; Ohmi, Tadahiro, Method and apparatus for collecting rare gas.
  5. Winchester, David Charles; Bosco, Matthew John; Klein, Gerald W.; West, Isaac Patrick; Samsal, Richard Linton; Dee, Douglas Paul; Johnson, Andrew David; Karwacki, Jr., Eugene Joseph, Method and equipment for selectively collecting process effluent.
  6. Hufton, Jeffrey Raymond; Farris, Thomas Stephen; Golden, Timothy Christopher; Karwacki, Jr., Eugene Joseph, Method for recovering high-value components from waste gas streams.
  7. Alcantara,Miguel Angel, Method for recovery of by product gas in vacuum heat treatment.
  8. Ueda, Takehiro; Koizumi, Katsuyuki; Suzuki, Kouki, Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system.
  9. Johnson, Andrew David; Pearce, Richard Vincent; Farris, Thomas Stephen; Golden, Timothy Christopher; Bosco, Matthew John; Karwacki, Jr., Eugene Joseph; Winchester, David Charles; Hufton, Jeffrey Raymond, Recovering of xenon by adsorption process.
  10. Koshi, Yasunobu; Suzaki, Kenichi; Yoshino, Akihito, Substrate processing apparatus and method of manufacturing semiconductor device.
  11. Schulte, Thomas Robert; Hawke, Michael Henry; Pace, Keith Randall; Bergman, Jr., Thomas John; Warrick, Brian Donald; Di Santo, Sandro; Boyer, Rick, System for preventing contaminants from reaching a gas purifier.
  12. Schulte, Thomas Robert; Hawke, Michael Henry; Pace, Keith Randall; Bergman, Jr., Thomas John; Warrick, Brian Donald; Di Santo, Sandro; Boyer, Rick, System for preventing contaminants from reaching a gas purifier.
  13. Schulte, Thomas Robert; Hawke, Michael Henry; Pace, Keith Randall; Bergman, Jr., Thomas John; Warrick, Brian Donald; DiSanto, Sandro; Boyer, Rick, System for preventing contaminants from reaching a gas purifier.
  14. Kim, Hong-Seub; Park, Hyun-Soo; Jung, Soon-Bin; Cha, Sung-Ho; Kim, Dong-Jin; Hwang, Wook-Jung; Yoo, Jin-Hyuk, Vacuum pumping system, driving method thereof, apparatus having the same, and method of transferring substrate using the same.
  15. Kim, Hong-Seub; Park, Hyun-Soo; Jung, Soon-Bin; Cha, Sung-Ho; Kim, Dong-Jin; Hwang, Wook-Jung; Yoo, Jin-Hyuk, Vacuum pumping system, driving method thereof, apparatus having the same, and method of transferring substrate using the same.
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