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Dynamic blending gas delivery system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • H05H-001/00
출원번호 US-0174196 (1998-10-16)
발명자 / 주소
  • Botelho Alexandre de Almeida
  • Del Prato Thomas Anthony
  • Ford Robert William
출원인 / 주소
  • Air Products and Chemical, Inc.
대리인 / 주소
    Chase
인용정보 피인용 횟수 : 25  인용 특허 : 9

초록

A dynamic blending gas delivery system and method are disclosed. A blended gaseous mixture produced in accordance with the method is used in chemical vapor deposition tools or similar process tools. One embodiment is a multi-step method for processing a plurality of fluids to form a blended gaseous

대표청구항

[ What is claimed is:] [1.]1. A dynamic blending gas delivery system for supplying a blended gaseous mixture to a distribution header from which the blended gaseous mixture is delivered to at least one process tool, comprising:means for supplying a first fluid;means for heating the first fluid to a

이 특허에 인용된 특허 (9)

  1. Koni Tuyoshi (Tokorozawa JPX) Urushida Yoshihisa (Tokorozawa JPX) Tsuzuki Akira (Tokorozawa JPX), Anesthetic gas control apparatus.
  2. Lalumandier Steven R. (League City TX) Geary Cathy J. (Seabrook TX) Knight Larry F. (Seabrook TX), Automatic gas blending system.
  3. Nagashima Makoto (Tokyo JPX) Nishizato Hiroshi (Chiba JPX) Ono Hirofumi (Shiga JPX), Chemical vapor deposition method and apparatus therefore.
  4. Hanson Robert C. (Excelsior MN), Control system and apparatus for producing compatible mixtures of fuel gases.
  5. Strain Donny R. (Waterford MI) Martin Daniel B. (Troy MI), Gas blending using null balance analyzer.
  6. Murakami Seishi (Kofu JPX) Hatano Tatsuo (Nirasaki JPX), Liquid material supply apparatus and method.
  7. Hatano Tatsuo,JPX, Process-gas supply apparatus.
  8. Jinnouchi Shimpei (Nirasaki JPX) Kuno Hiroshi (Komae JPX) Otsuki Hiroshi (Tokyo JPX), Semiconductor treatment apparatus.
  9. Benning Michael A. (Allentown PA) Miller Stephen B. (Doylestown PA), System for continuous blending of a liquid into a gas.

이 특허를 인용한 특허 (25)

  1. Campbell, Philip H.; Kubista, David J., Apparatus and process of improving atomic layer deposition chamber performance.
  2. Bang,Won; Wang,Yen Kun; Ghanayem,Steve, Clog-resistant gas delivery system.
  3. Wang,Luping; Baum,Thomas H.; Xu,Chongying, Delivery systems for efficient vaporization of precursor source material.
  4. Jacobson, James D.; Bui, Tuan; Garchow, Stephen R.; Yardimci, Atif; Slepicka, James S., Fluid delivery system and flow control therefor.
  5. Jacobson, James D.; Bui, Tuan; Garchow, Stephen R.; Yardimci, Atif; Slepicka, James S., Fluid delivery system and flow control therefor.
  6. Jacobson, James D.; Bui, Tuan; Garchow, Stephen R.; Yardimci, Atif; Slepicka, James S., Fluid delivery system and flow control therefor.
  7. Graves,Todd; Vondran,Martin; Benzinger,Martin, Installation for making available highly pure fine chemicals.
  8. Xu,Mindi; Sayasane,Tay; Paganessi,Joseph E.; Jursich,Gregory M.; Nakamoto,Naoyuki; Nishikawa,Yukinobu; Dulphy,Herve E.; Rameau,Guillaume; Honda,Lorrin, Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical.
  9. Irino,Kiyoshi; Hikazutani,Ken ichi; Kawamura,Tatsuya; Sugizaki,Taro; Ohkubo,Satoshi; Nakanishi,Toshiro; Takasaki,Kanetake, Manufacture system for semiconductor device with thin gate insulating film.
  10. Wilmer, Jeffrey Alexander; Mackenzie, Daniel Kase; Lull, John Michael; Zadai, Eric A.; Walker, Michael Loren, Method and apparatus for blending process materials.
  11. Wilmer,Jeffrey A.; McAllister,Brian Alan; Swan,Daniel A.; Sitterud,David E., Method and apparatus for blending process materials.
  12. Lull, John M.; Valentine, William S., Method and apparatus for providing a determined ratio of process fluids.
  13. Lull, John M.; Valentine, William S., Method and apparatus for providing a determined ratio of process fluids.
  14. Lull,John M.; Valentine,William S., Method and apparatus for providing a determined ratio of process fluids.
  15. Lull,John M.; Valentine,William S., Method and apparatus for providing a determined ratio of process fluids.
  16. Lull,John M; Valentine,William S, Method and apparatus for providing a determined ratio of process fluids.
  17. Koike, Kunihiko; Yoshino, Yu; Makihira, Naohisa; Senoo, Takehiko; Aida, Toshihiro; Biro, Tomoya; Ichimaru, Hiroshi; Tainaka, Masahiro, Method and apparatus for supplying mixed gas.
  18. Aggarwal, Ravinder; Stoutjesdijk, Jeroen, Reaction apparatus having multiple adjustable exhaust ports.
  19. Aggarwal, Ravinder; Stoutjesdijk, Jeroen, Reaction apparatus having multiple adjustable exhaust ports.
  20. Olander, W. Karl, Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases.
  21. Aggarwal, Ravinder; Conner, Rand; Disanto, John; Alexander, James A., Substrate reactor with adjustable injectors for mixing gases within reaction chamber.
  22. Todd, Michael A.; Weeks, Keith D.; Jacobson, Paul T., System for control of gas injectors.
  23. Satake,Tsukasa; Tominaga,Koji; Funakubo,Hiroshi, Thin film deposition device using an FTIR gas analyzer for mixed gas supply.
  24. Alexandre De Almeida Botelho ; Ali Fouad El-Agha, Vapor delivery from a low vapor pressure liquefied compressed gas.
  25. Kozawa, Takahiro; Nakashima, Kenji; Jun, Keeyoung; Ito, Takahiro, Vapor deposition device and vapor deposition method.
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