초록 ▼

A process is provided for forming a thin film having refractive index thereof varying continuously or stepwise in a thickness direction. The process comprises sputtering in a vacuum chamber by introducing, during film formation, at least two kinds of gases selected from a nitrogen-containing gas, an

A process is provided for forming a thin film having refractive index thereof varying continuously or stepwise in a thickness direction. The process comprises sputtering in a vacuum chamber by introducing, during film formation, at least two kinds of gases selected from a nitrogen-containing gas, an oxygen-containing gas, and a fluorine-containing gas with the flow rate ratio of the gases varied continuously or stepwise. This process enables variation of the refractive index in the thickness direction, simply without difficulty.

대표청구항 ▼

[ What is claimed is:] [1.]1. A process for forming a thin film having refractive index thereof varying continuously or stepwise in a thickness direction, comprising sputtering by introducing, during film formation, a nitrogen-containing gas, an oxygen-containing gas, and a fluorine-containing gas w

[ What is claimed is:] [1.]1. A process for forming a thin film having refractive index thereof varying continuously or stepwise in a thickness direction, comprising sputtering by introducing, during film formation, a nitrogen-containing gas, an oxygen-containing gas, and a fluorine-containing gas with a flow rate ratio of the fluorine-containing gas to the nitrogen-containing gas and/or the oxygen-containing gas varied continuously or stepwise.