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Low voltage CMOS process and device with individually adjustable LDD spacers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/76
출원번호 US-0887459 (1997-07-02)
발명자 / 주소
  • Chang Kuang-Yeh
  • Rao Ramachandr A.
출원인 / 주소
  • VLSI Technology, Inc.
대리인 / 주소
    Burns, Doane, Swecker & Mathis LLP
인용정보 피인용 횟수 : 48  인용 특허 : 14

초록

The present invention relates to a method and device for providing CMOS logic which can be operated at various operating voltages, without resulting in unbalanced operation of n-channel and p-channel CMOS transistors. In accordance with the present invention, CMOS circuitry can be provided that is o

대표청구항

[ What is claimed is:] [1.]1. An integrated circuit comprising:at least one n-channel transistor having a gate, a source and a drain;at least one p-channel transistor having a gate, a source and a drain;at least one spacer located adjacent the gate of said n-channel transistor; andat least one addit

이 특허에 인용된 특허 (14)

  1. Lee Ruojia (Boise ID) Gonzalez Fernando (Boise ID), CMOS processes.
  2. Kim Kyeong-tae (Seoul KRX) Choi Do-chan (Seoul KRX), CMOS semiconductor device with (LDD) NMOS and single drain PMOS.
  3. Haken Roger A. (Richardson TX), CMOS sidewall oxide-lightly doped drain process.
  4. Ogoh Ikuo (Hyogo JPX), LDD CMOS with wider oxide sidewall on PMOS than NMOS.
  5. Campbell Richard N. (Cwmbran GBX) Thompson Michael K. (Newport GBX) Haase Robert P. (Cwmbran GBX), MOSFET and fabrication method.
  6. Ogura Mitsugi (Yokohama JPX) Ariizumi Shioji (Tokyo JPX) Horiguchi Fumio (Tokyo JPX) Masuoka Fujio (Yokohama JPX), Making a self aligned semiconductor device.
  7. Kuo Kuo-Yun (Hsin-Chu TWX), Method for the manufacture of CMOS FET by P+maskless technique.
  8. Hsue Chen-Chiu (Hsin-Chu TWX), Method of improvement ESD for LDD process.
  9. Hsia Steve (Cupertino CA) Chang Paul (Los Altos CA), Method of manufacturing CMOS devices.
  10. Ito Shinichi (Kanagawa JPX) Noshi Naoya (Kanagawa JPX) Okamoto Yutaka (Tokyo JPX), Method of manufacturing MIS semiconductor device.
  11. Matthews James A. (Santa Clara CA), Process for forming self-aligned complementary source/drain regions for MOS transistors.
  12. Pfiester James R. (Austin TX), Process for manufacturing a semiconductor device.
  13. Sanchez Julian J. B. (Mesa AZ), Self-aligned overlap MOSFET and method of fabrication.
  14. Koshimaru Shigeru (Tokyo JPX), Semiconductor integrated circuit device employing MOSFETS.

이 특허를 인용한 특허 (48)

  1. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Display device.
  2. Hamada, Takashi; Arai, Yasuyuki, Display device having driver TFTs and pixel TFTs formed on the same substrate.
  3. Yamazaki,Shunpei; Murakami,Satoshi; Koyama,Jun; Tanaka,Yukio; Kitakado,Hidehito; Ohnumo,Hideto, Display including casing and display unit.
  4. Yamazaki,Shunpei; Adachi,Hiroki, Ferroelectric liquid crystal and goggle type display devices.
  5. Yamazaki, Shunpei; Adachi, Hiroki, Ferroelectric liquid crystal display device comprising gate-overlapped lightly doped drain structure.
  6. Doris,Bruce B.; Chidambarrao,Dureseti; Ku,Suk Hoon, High performance CMOS device structures and method of manufacture.
  7. Doris,Bruce B.; Chidambarrao,Dureseti; Ku,Suk Hoon, High performance CMOS device structures and method of manufacture.
  8. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  9. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  10. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  11. Yamazaki,Shunpei, Method of fabricating a semiconductor device by doping impurity element into a semiconductor layer through a gate electrode.
  12. Hamada, Takashi; Arai, Yasuyuki, Method of manufacturing a semiconductor device.
  13. Hamada, Takashi; Arai, Yasuyuki, Method of manufacturing a semiconductor device.
  14. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Method of manufacturing a semiconductor device having lightly-doped drain (LDD) regions.
  15. Noda, Takeshi; Kitakado, Hidehito; Matsuo, Takuya, Semiconductor device.
  16. Noda,Takeshi; Kitakado,Hidehito; Matsuo,Takuya, Semiconductor device.
  17. Yamazaki, Shunpei, Semiconductor device.
  18. Yamazaki, Shunpei, Semiconductor device.
  19. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  20. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  21. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  22. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  23. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  24. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  25. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  26. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  27. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  28. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  29. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  30. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  31. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  32. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  33. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  34. Yamazaki,Shunpei; Murakami,Satoshi; Koyama,Jun; Tanaka,Yukio; Kitakado,Hidehito; Ohnumo,Hideto, Semiconductor device and fabrication method thereof.
  35. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Arai,Yasuyuki, Semiconductor device and manufacturing method thereof.
  36. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Semiconductor device and method of manufacture thereof.
  37. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Semiconductor device and method of manufacture thereof.
  38. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Semiconductor device and method of manufacture thereof.
  39. Zhang,Hongyong; Takemura,Yasuhiko; Konuma,Toshimitsu; Ohnuma,Hideto; Yamaguchi,Naoaki; Suzawa,Hideomi; Uochi,Hideki, Semiconductor device and method of manufacture thereof.
  40. Yamazaki, Shunpei; Adachi, Hiroki, Semiconductor device and method of manufacturing the same.
  41. Yamazaki,Shunpei; Adachi,Hiroki, Semiconductor device and method of manufacturing the same.
  42. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device comprising a pixel unit including an auxiliary capacitor.
  43. Yamazaki,Shunpei, Semiconductor device comprising thin film transistor comprising conductive film having tapered edge.
  44. Yamazaki, Shunpei, Semiconductor device having LDD regions.
  45. Hamada, Takashi; Arai, Yasuyuki, Semiconductor device including a conductive film having a tapered shape.
  46. Fung, Ka Hing; Gilbert, Percy V., Semiconductor device structure including multiple fets having different spacer widths.
  47. Yamazaki, Shunpei, Semiconductor device with tapered gates.
  48. Noda, Takeshi; Kitakado, Hidehito; Matsuo, Takuya, Semiconductor device, method of manufacturing the same, and electronic device having the same.
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