초록 ▼

A CVD device A is provided which is equipped with a gas introduction part A3 having an inert gas supply part G1 for supplying a diluting inert gas and a cleaning gas supply path G2 for supplying a cleaning gas, each connected therewith, and equipped with an exhaust gas discharge part A4 for releasin

A CVD device A is provided which is equipped with a gas introduction part A3 having an inert gas supply part G1 for supplying a diluting inert gas and a cleaning gas supply path G2 for supplying a cleaning gas, each connected therewith, and equipped with an exhaust gas discharge part A4 for releasing an exhaust gas; an exhaust gas circulation part D1 for circulating an exhaust gas from the CVD device, a cooling part D4 for cooling down and liquefying the cleaning gas in the exhaust gas, and a recovery part 4 for recovering the cleaning gas liquefied in said cooling part D4; the diluting inert gas is composed of a gas having a boiling point lower than that of the cleaning gas; a supply part 6 for supplying a cooling inert gas having the same composition as the diluting inert gas in a liquid state, an inert gas circulation part D3 which is cooled down by heat of evaporation of the cooling inert gas, and an inert gas discharge part 7 for discharging the cooling inert gas evaporated in the inert gas circulation part D3 are provided, constituting the cooling part D4; and the inert gas discharge part 7 is connected to the inert gas supply path G1.

대표청구항 ▼

[ We claim:] [1.]1. A gas recovery unit, comprising:a CVD device including a gas introduction portion, an inert gas supply path in fluid communication with and for supplying a diluting inert gas into said gas introduction portion, a cleaning gas supply path in fluid communication with and for supply

[ We claim:] [1.]1. A gas recovery unit, comprising:a CVD device including a gas introduction portion, an inert gas supply path in fluid communication with and for supplying a diluting inert gas into said gas introduction portion, a cleaning gas supply path in fluid communication with and for supplying a cleaning gas into said gas introduction portion, and an exhaust gas discharge path in fluid communication with and for discharging an exhaust gas from said CVD device;a recycling device body in fluid communication with said CVD device, said recycling device body including an exhaust gas circulation portion in fluid communication with said CVD device exhaust gas discharge path for circulating an exhaust gas from said CVD device, a cooling portion for cooling and liquefying any cleaning gas remaining in said exhaust gas in fluid communication with said CVD device inert gas supply path, and a recovery portion for recovering the cleaning gas liquefied in said cooling portion; anda gas recycle path in fluid communication between said recycling device body recovery portion and said CVD device cleaning gas supply path for supplying said cleaning gas recovered in said recovery portion to said gas introduction portion.