초록 ▼

A coil for exciting an r.f. plasma in a vacuum plasma processing chamber includes plural radially and circumferentially extending turns connected between a pair of r.f. excitation terminals. In one embodiment, a drive mechanism varies r.f. field coupling coefficients between different radial and cir

A coil for exciting an r.f. plasma in a vacuum plasma processing chamber includes plural radially and circumferentially extending turns connected between a pair of r.f. excitation terminals. In one embodiment, a drive mechanism varies r.f. field coupling coefficients between different radial and circumferential portions of the coil and the plasma. The drive mechanism includes plural drive shafts which drive different portions of the coil toward and away from the plasma. In a second embodiment, the drive mechanism drives an r.f. shield having at least one moving part for intercepting a portion of an r.f. plasma excitation field derived by the coil.

대표청구항 ▼

[ We claim:] [1.]1. A method of controlling an r.f. plasma treating one or more workpieces in a vacuum plasma processing chamber, the workpiece being on a workpiece holder, the method being performed in accordance with one of plural recipes each including a set of parameters, the parameters associat

[ We claim:] [1.]1. A method of controlling an r.f. plasma treating one or more workpieces in a vacuum plasma processing chamber, the workpiece being on a workpiece holder, the method being performed in accordance with one of plural recipes each including a set of parameters, the parameters associated with each recipe including (a) flow rate of gas supplied to the chamber, (b) pressure in the chamber, (c) power supplied to a multi-turn excitation coil for the plasma, and (d) a function determined by a desired coupling coefficient of an r.f. field component the coil is to apply to the plasma, the method comprising processing a workpiece in accordance with a first of the recipes with the coupling coefficient adjusted so there is a first relation between r.f. field components coupled from different portions of the coil to the plasma, and thereafter processing a workpiece in accordance with a second of the recipes with the coupling coefficient adjusted so there is a second relation between r.f. field components coupled between different portions of the coil and the plasma, the coupling coefficient being adjusted by varying the spacing between different radial portions of the coil and the plasma in a direction substantially at right angles to a plane including radii of the coil.