초록 ▼

The invention provides an apparatus and method for performing a process on a substrate. At least two types of structures may be used to provide a flow path for a substrate so that the substrate may be moved from one processing or loading position to another. The first is a conveyor. The second is a

The invention provides an apparatus and method for performing a process on a substrate. At least two types of structures may be used to provide a flow path for a substrate so that the substrate may be moved from one processing or loading position to another. The first is a conveyor. The second is a track. The flow path may be a closed continuous loop. Each processing island has a valve for introduction and extraction of the substrate into and out of an interior of the island. The processing island may include load locks, and may include in conjunction therewith an inspection station, a CVD chamber, a PECVD chamber, a PVD chamber, a post-anneal chamber, a cleaning chamber, a descumming chamber, an etch chamber, or a combination of such chambers.

대표청구항 ▼

[ What is claimed is:] [15.]15. An apparatus for performing a thin film process on a substrate, comprising:a conveyor to support one or more substrates;a plurality of processing islands located adjacent the conveyor, each processing island comprising:a first load lock chamber having a first valve fo

[ What is claimed is:] [15.]15. An apparatus for performing a thin film process on a substrate, comprising:a conveyor to support one or more substrates;a plurality of processing islands located adjacent the conveyor, each processing island comprising:a first load lock chamber having a first valve for introduction of a substrate therein;a processing chamber in communication with said first load lock chamber; anda second load lock chamber in communication with said processing chamber and having a second valve for extraction of a substrate therefrom; anda substrate exchange apparatus configured and arranged to retrieve a substrate from the conveyor, introduce the substrate into an interior of a selected processing island, extract the substrate from the interior of the selected processing island, and replace the substrate on the conveyor.