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Method and system to control the concentration of dissolved gas in a liquid 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
출원번호 US-0183718 (1998-10-30)
발명자 / 주소
  • Christenson Kurt K.
출원인 / 주소
  • FSI International Inc.
대리인 / 주소
    Faegre & Benson LLP
인용정보 피인용 횟수 : 26  인용 특허 : 56

초록 ▼

This invention relates to a method and system for establishing and maintaining a precise concentration of dissolved gas in a liquid. More particularly, the invention relates to a method and system of establishing and maintaining a precise concentration of dissolved gas in a liquid by utilizing a gas

대표청구항 ▼

[ What is claimed is:] [1.]1. A method of treating a substrate with a liquid admixture comprising a liquid and a desired concentration of a dissolved select gas, comprising the steps of:(a) providing a matched gas blend that comprises a concentration of the select gas that is to be dissolved in the

이 특허에 인용된 특허 (56)

  1. Ury Michael G. (Bethesda MD) Matthews John C. (Gaithersburg MD) Rounds Stuart N. (Germantown MD), Apparatus for photoresist stripping.
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  19. Murphy Oliver J. (Bryan TX) Hitchens G. Duncan (Bryan TX), Method and apparatus for electrochemical production of ozone.
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  21. Johnson Dennis E. J. (1025 Garfield Ave. Aurora IL 60506), Method and device for in-line mass dispersion transfer of a gas flow into a liquid flow.
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  23. Kitahata Hideki,JPX, Method for manufacturing self-alignment type bipolar transistor having epitaxial base layer.
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  24. Matthews John C. (Gaithersburg MD) Wooten Robert D. (Rockville MD) Ferris David S. (Washington DC) Rounds Stuart N. (Germantown MD), Method for photoresist stripping using reverse flow.
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  25. Kashiwase Masaharu (Okayama JPX) Matsuoka Terumi (Okayama JPX), Method for removing organic film.
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  27. Aoki Hidemitsu (Tokyo JPX) Morita Makoto (Tokyo JPX) Tsuji Mikio (Tokyo JPX), Method for wet processing of a semiconductor substrate.
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  28. Brock James R. (Austin TX) Trachtenberg Isaac (Austin TX), Method of aerosol jet etching.
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  29. Nagahiro Jinzo (54-24 ; Wakamiya 2-chome Nakano-ku ; Tokyo JPX) Higuchi Ken (Saitama JPX) Ohama Yasunori (Saitama JPX), Method of and apparatus for producing a high concentration ozone water solution.
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  30. Koizumi Kootaroo (Kodaira JPX) Tsunekawa Sukeyoshi (Tokorozawa JPX) Kawasumi Kenichi (Oume JPX) Kimura Takeshi (Higashimurayama JPX) Funatsu Keisuke (Hamura JPX), Method of and apparatus for removing an organic film.
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  31. Pittner Gregory A. (Yorba Linda CA) Crabtree Larry L. (Lincolnshire IL), Method of preferentially removing oxygen from ozonated water.
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  32. Ikeda Akira (Hyogo JPX) Nakatsugawa Naoki (Hyogo JPX) Yoshimura Yumiko (Hyogo JPX) Tanimura Yasuhiro (Hyogo JPX) Ezaki Kenji (Hyogo JPX), Microorganism removing method.
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  35. Wasinger Eric (551 Boyd St. Wichita KS 67212) Hall David (Auburn AL 36830), Ozone decolorization of garments.
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  36. Wong Sik-Lam ; Shea James Howard, Ozone generator with enhanced output.
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  42. Damann Franz-Josef (21 ; Dammstrasse D-4791 Lichtenau-Henglarn DEX), Process and device for the dissolution of gas in liquid.
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  43. Sugino Rinshi (Atsugi JPX) Ito Takashi (Kawasaki JPX), Process for cleaning surface of semiconductor substrate.
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  45. Ross ; Edward A., Saturated liquid/vapor generating and dispensing.
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  46. Ross Edward Alan (Willowdale CA), Saturated liquid/vapor generating and dispensing.
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  50. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.
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  51. Nelson Steven L. ; Christenson Kurt K., System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in.
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  52. Faivre Michel,FRX ; Martin Nathalie,FRX ; Boisdon Vincent,FRX, Unit for the treatment of water by ozonization, and a corresponding installation for the production of ozonized water.
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  54. Partus Fred P. (Atlanta GA), Vapor delivery system and method.
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  55. Moy, Timothy Y., Vapor generator and its use in generating vapors in a pressurized gas.
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  2. Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R., Cartesian cluster tool configuration for lithography type processes.
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  3. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Cartesian robot cluster tool architecture.
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  4. Henke,Trevor; Meuchel,Craig; Bernt,Marvin, Centrifugal spray processor and retrofit kit.
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  5. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
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  6. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
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  7. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
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  8. Ishikawa,Tetsuya; Roberts,Rick J.; Armer,Helen R.; Volfovski,Leon; Pinson,Jay D.; Rice,Michael; Quach,David H.; Salek,Mohsen S.; Lowrance,Robert; Backer,John A.; Weaver,William Tyler; Carlson,Charles; Wang,Chongyang; Hudgens,Jeffrey; Herchen,Harald; Lue,Brian, Cluster tool architecture for processing a substrate.
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  9. Volfovski, Leon; Ishikawa, Tetsuya, Cluster tool substrate throughput optimization.
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  10. Araki,Yasushi, Functional device and method for producing the same, and image pickup device and method for producing the same.
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  11. Gogg, Georg; Knotter, Dirk Maarten; Reaux, Charlene; Nelson, Steve, Method of manufacturing a semiconductor device and apparatus to be used therefore.
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  12. Kamijima, Akifumi, Method of manufacturing thin film and pretreating method thereof.
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  13. Lauerhaas, Jeffrey M., Process for removing carbon material from substrates.
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  14. Christenson, Kurt Karl; Hanestad, Ronald J.; Ruether, Patricia Ann; Wagener, Thomas J., Process for removing material from substrates.
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  15. Christenson, Kurt Karl; Hanestad, Ronald J.; Ruether, Patricia Ann; Wagener, Thomas J., Process for removing material from substrates.
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  16. DeKraker, David; Butterbaugh, Jeffery W.; Williamson, Richard E., Process for treatment of substrates with water vapor or steam.
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  18. Christenson, Kurt Karl, Reagent activator for electroless plating.
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  23. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a Cartesian robot cluster tool.
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  25. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.
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  26. Nakagawa,Toshimoto; Katagiri,Yuko; Ogawa,Shu; Morita,Satoru; Kikukawa,Makoto, Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method.
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