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Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-003/14
출원번호 US-0208116 (1998-12-09)
발명자 / 주소
  • Ebbesen Thomas W.
  • Grupp Daniel E.
  • Thio Tineke
  • Lezec Henri J.,FRX
출원인 / 주소
  • NEC Research Institute, Inc.
대리인 / 주소
    Isztwan
인용정보 피인용 횟수 : 89  인용 특허 : 21

초록 ▼

An apparatus for enhanced light transmission is provided. The apparatus comprises a metal film having a first surface and a second surface, at least one aperture provided in the metal film and extending from the first surface to the second surface, and a periodic surface topography provided on at le

대표청구항 ▼

[ What is claimed is:] [1.]1. An apparatus for enhanced light transmission comprising:a metal film having a first surface and a second surface;at least one aperture provided in the metal film and extending from the first surface to the second surface; anda periodic surface topography provided on at

이 특허에 인용된 특허 (21)

  1. Grobman Warren D. (Yorktown Heights NY) Nelson ; Jr. David A. (Carmel NY) Warlaumont John M. (Croton-on-Hudson NY), Alignment method and apparatus for x-ray or optical lithography.
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  2. Goodman Douglas S. (Yorktown Heights NY), Confocal method and apparatus for focusing in projection lithography.
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  4. Karrai Khaled (Munich DEX), Far-field characterization of sub-wavelength sized apertures.
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  5. Simon H. J. (Toledo OH) Wang Yu (Toledo OH), Liquid crystal flat panel color display with surface plasmon scattering.
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  6. Isaacson Michael (Ithaca NY) Lewis Aaron (Ithaca NY), Method and apparatus for production and use of nanometer scale light beams.
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  7. Isaacson Michael (Ithaca NY) Lewis Aaron (Ithaca NY), Method and apparatus for production and use of nanometer scale light beams.
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  8. Gunther Rolf,DEX, Method and device for the determination of material-specific parameters of one or a few molecules by means of correlatio.
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  9. Tanaka Yoshiharu (Tokyo JPX) Kouno Eiichi (Tokyo JPX) Iwata Joji (Tokyo JPX), Method of alignment between mask and semiconductor wafer.
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  10. Quate Calvin F. (Stanford CA), Near field scanning optical and force microscope including cantilever and optical waveguide.
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  11. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Near-field scanning optical microscope having a sub-wavelength aperture array for enhanced light transmission.
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  12. Wolff Peter A., Near-field scanning optical microscope probe exhibiting resonant plasmon excitation.
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  13. Thaxter James B. (Townsend MA), Optical alignment of masks for X-ray lithography.
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  14. Kim Tae Jin ; Thio Tineke ; Ebbesen Thomas Wren, Optical transmission control apparatus utilizing metal films perforated with subwavelength-diameter holes.
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  15. Glass, Alastair M.; Liao, Paul F., Photodetector having a contoured, substantially periodic surface.
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  16. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Sub-wavelength aperture arrays with enhanced light transmission.
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  17. Walt David R. (Lexington MA) Pantano Paul (Everett MA), Superresolution imaging fiber for subwavelength light energy generation and near-field optical microscopy.
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  18. Wang Yu (40-57 Junction Blvd. Corona NY 11368), Surface plasmon high efficiency HDTV projector.
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  19. King David A. (Palo Alto CA) Seher Jens-Peter (Stuttgart DEX), Surface plasmon resonance measuring instruments.
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  20. Takasu Shinichiro (Tokyo JPX) Shinozaki Toshiaki (Yokohama JPX), System for transferring a fine pattern onto a target.
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  21. Iwahashi Kenji (Kyoto JPX), X-ray reflective mask and system for image formation with use of the same.
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