초록 ▼

A projection exposure system for printing the pattern formed on a reticle onto a wafer includes a reticle stage (5) and a wafer stage. A first reference plate (9) having a first reference pattern (MM1) formed thereon is mounted on the reticle stage (5), and a second reference plate (25) having a sec

A projection exposure system for printing the pattern formed on a reticle onto a wafer includes a reticle stage (5) and a wafer stage. A first reference plate (9) having a first reference pattern (MM1) formed thereon is mounted on the reticle stage (5), and a second reference plate (25) having a second reference pattern (WM1) formed thereon is mounted on the wafer stage. The first reference pattern (MM1) comprises two cross-marks (60a, 60b) spaced apart from each other in X-direction, and the second reference pattern (WM1) comprises two cross-marks (61a, 61b) spaced apart from each other in X-direction. Images of the cross-marks (61a, 61b) of the second reference pattern (WM1) are formed through a projection optical system (2) on the reticle stage (5) and superimposed with the cross-marks (60a, 60b) of the first reference pattern (MM1). A pair of observation optical systems (10, 11) spaced apart from each other in X-direction are used to observe the superimposed images of the corresponding cross-marks (60a and 61a, 60b and 61b), so as to determine the position shifts in X-direction between the corresponding superimposed images at two positions spaced from each other in X-direction. The determined position shifts are used to calculate the variation in projection magnification. The projection exposure system is capable of quick and high precision detection of the magnification of the projection optical system (2).

대표청구항 ▼

[ What is claimed is:] [1.]1. A scanning exposure apparatus in which a first object and a second object are moved synchronously for scanning exposure, the apparatus comprising:a projection system to be disposed between the first object and the second object, which projects an image of a pattern form

[ What is claimed is:] [1.]1. A scanning exposure apparatus in which a first object and a second object are moved synchronously for scanning exposure, the apparatus comprising:a projection system to be disposed between the first object and the second object, which projects an image of a pattern formed on the first object onto the second object to be provided on one side thereof;a first movable member, at least part of the first movable member being disposed on the other side of the projection system, which holds the first object;a second movable member, at least part of the second movable member being disposed on the one side of the projection system, which holds the second object, wherein the first movable member and the second movable member move at different velocities during the scanning exposure;a first reference member which is arranged on the first movable member which is different from the first object; anda detecting system, functionally associated with the first movable member, which detects a reference mark of the first reference member, wherein the first movable member is positioned at a position which is different from a scanning start position so that the reference mark is detected by the detecting system.