초록 ▼

A method is provided for producing, with high reproducibility, an SOI substrate which is flat and high in quality, and simultaneously for achieving resources saving and reduction in cost through recycling of a substrate member. For accomplishing this, a porous-forming step is performed forming a por

A method is provided for producing, with high reproducibility, an SOI substrate which is flat and high in quality, and simultaneously for achieving resources saving and reduction in cost through recycling of a substrate member. For accomplishing this, a porous-forming step is performed forming a porous Si layer on at least a surface of an Si substrate and a large porosity layer forming step is performed for forming alarge porosity layer in the porous Si layer. This large porosity layer forming step is performed by implanting ions into the porous Si layer with a given projection range or by changing current density of anodization in said porous-forming step. At this time, a non-porous single-crystal Si layer is epitaxial-grown on the porous Si layer. Thereafter, the surface of the porous Si layer and a support substrate are bonded together, and then separation is performed at the porous Si layer with the large porosity. Subsequently, selective etching is performed to remove the porous Si layer.

대표청구항 ▼

[ What is claimed is:] [1.]1. A semiconductor article havinga nonporous semiconductor substrate, first, second and third porous semiconductor layers formed on the nonporous semiconductor substrate, and a nonporous semiconductor layer formed on the first porous semiconductor layer, wherein the second

[ What is claimed is:] [1.]1. A semiconductor article havinga nonporous semiconductor substrate, first, second and third porous semiconductor layers formed on the nonporous semiconductor substrate, and a nonporous semiconductor layer formed on the first porous semiconductor layer, wherein the second porous semiconductor layer has a density lower than those of the first and third semiconductor layers, the first, second and third porous layers all have a density lower than the semiconductor substrate and the semiconductor layer, and the nonporous semiconductor layer is capable of being separated from the nonporous semiconductor substrate.