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Multi-level substrate processing apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-001/04
출원번호 US-0435702 (1999-11-08)
발명자 / 주소
  • Muka Richard S.
출원인 / 주소
  • Brooks Automation, Inc.
대리인 / 주소
    Perman & Green, LLP
인용정보 피인용 횟수 : 19  인용 특허 : 27

초록

A substrate processing apparatus having a substrate transport and substrate processing chambers. The substrate transport has a transport chamber and a transport mechanism. The transport mechanism has a rotatable drive, an arm pivotably connected to the drive to pivot in vertical directions, and a su

대표청구항

[ What is claimed is:] [1.]1. A substrate processing apparatus comprising:a substrate transport having a transport chamber and a transport mechanism for transporting substrates into and out of the transport chamber; andsubstrate processing chambers connected to the transport chamber, a first one of

이 특허에 인용된 특허 (27)

  1. Uehara Akira (Yokohama JPX) Nakane Hisashi (Kawasaki JPX), Apparatus for the treatment of a wafer by plasma reaction.
  2. Davis James C. (Carlisle MA), Articulated arm transfer device.
  3. Hardegen E. Brian (Westford MA) Bottomley Todd E. (Swamzey NH) Davis ; Jr. James C. (Carlisle MA), Articulated arm transfer device.
  4. Hendrickson Ruth A. (Lincoln MA), Articulated arm transfer device.
  5. Hillman Gary (Livingston NJ) Devico Michael J. (Chatham NJ), Automated single cassette load mechanism for scrubber.
  6. Tateishi Hideki (Yokohama JPX) Shimizu Tamotsu (Yokohama JPX) Aiuchi Susumu (Yokohama JPX) Iwashita Katsuhiro (Yokohama JPX) Nakamura Hiroshi (Fuchu JPX), Continuous sputtering apparatus.
  7. Fujita ; Masahiko ; Gotoh ; Toshihiko ; Hagino ; Hiroshi, Electric motor having frequency generator.
  8. Yamamoto ; Shinichi ; Sumitomo ; Yasusuke ; Horiike ; Yasuhiro ; Shibag aki ; Masahiro, Etching apparatus using a plasma.
  9. Sieradzki Manny (Gloucester MA), High speed movement of workpieces in vacuum processing.
  10. Munakata Tadashi (Tokyo JPX), Industrial robot.
  11. Hashimoto Taisaku (Kashiwara JPX), Magnetic drive device.
  12. Fisher William D. (East Palo Alto CA) Mujtaba M. Shahid (Milpitas CA), Method for coordinated control of motion devices.
  13. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
  14. Muka Richard S., Multi-level substrate processing apparatus.
  15. Maher, Jr., Joseph A.; Zafiropoulo, Arthur W., Multi-planar electrode plasma etching.
  16. Scott Joel E. (445 S. Palm Ave. ; Apt. 1 Sarasota FL 33577), Photograph logging apparatus and method.
  17. Turlot Emmanuel (Verrires le Buisson FRX) Emeraud Thierry (Bures sur Yvettes FRX) Schmitt Jacques (La Ville du Bois FRX), Plasma treatment apparatus and method for operating same.
  18. Grunes Howard (Santa Cruz CA) Tepman Avi (Cupertino CA) Lowrance Robert (Los Gatos CA), Robot assembly.
  19. Taylor Russell H. (Ossining NY) Kim Yong-yil (Seoul KRX), Signaling device and method for monitoring positions in a surgical operation.
  20. Toyoda Kenichi (Hino JPX) Toril Nobutoshi (Hachioji JPX) Nihei Ryo (Musashino JPX) Terada Akihiro (Hino JPX), Structure of first arm of industrial robot having articulated horizontal arms.
  21. Ishida Toshimichi (Hirakata JPX) Suzuki Masaki (Hirakata JPX), Substrate transfer apparatus.
  22. Walker Delroy (Springdale MD) Zihmer Joseph (Frederick MD) Furches Danny (Columbia MD) Garmer Christopher J. (Rockville MD), System for transferring articles between controlled environments.
  23. Mizukami Masami (Yamanashi JPX) Osada Hatsuo (Yamanashi JPX), Transfer apparatus.
  24. Nakagawa Kiyoshi (Kanagawa JPX), Transporting system for an article.
  25. Iwai Hiroyuki (Sagamihara JPX) Tanifuji Tamotsu (Yamato JPX) Asano Takanobu (Yokohama JPX) Okura Ryoichi (Kanagawa-ken JPX), Treatment apparatus.
  26. Kato Shigekazu (Kudamatsu JPX) Tamura Naoyuki (Kudamatsu JPX) Nishihata Kouji (Tokuyama JPX) Tsubone Tsunehiko (Hikari JPX) Itou Atsushi (Kudamatsu JPX) Nakata Kenji (Hikari JPX) Ogawa Yoshifumi (Hik, Vacuum processing system.
  27. Hertel Richard J. (Bradford MA) Delforge Adrian C. (Rockport MA) Mears Eric L. (Rockport MA) MacIntosh Edward D. (Gloucester MA) Jennings Robert E. (Nethuen MA) Bhargava Akhil (Reading MA), Wafer transfer system.

이 특허를 인용한 특허 (19)

  1. Soucy, Alan J.; Castantini, James S., Apparatus and methods for handling semiconductor wafers.
  2. Holtkamp, William; Kremerman, Izya; Hofmeister, Christopher; Pickreign, Richard, Linearly distributed semiconductor workpiece processing tool.
  3. Mages, Andreas; Scheler, Werner; Blaschitz, Herbert; Schulz, Alfred; Schneider, Heinz, Loading and unloading station for semiconductor processing installations.
  4. Mages, Andreas; Scheler, Werner; Blaschitz, Herbert; Schulz, Alfred; Schneider, Heinz, Loading and unloading station for semiconductor processing installations.
  5. Ettinger, Gary C.; Khau, Michael E.; Shin, Ho Seon, Methods and apparatus for drying a substrate.
  6. Yamagishi, Takayuki; Suwada, Masaei; Watanabe, Takeshi, Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections.
  7. Yamagishi,Takayuki; Suwada,Masaei; Watanabe,Takeshi, Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections.
  8. van der Meulen, Peter, Stacked process modules for a semiconductor handling system.
  9. van der Meulen, Peter, Stacked process modules for a semiconductor handling system.
  10. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  11. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  12. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  13. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  14. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  15. Hosek, Martin; Hofmeister, Christopher; Krupyshev, Alexander, Substrate processing apparatus.
  16. Kobayashi, Kenji, Transferring device and transferring method.
  17. Shindo, Takehiro, Vacuum processing apparatus.
  18. Shindo, Takehiro, Vacuum processing apparatus.
  19. Shindo, Takehiro, Vacuum processing apparatus.
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