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Micro-machined thin film hydrogen gas sensor, and method of making and using the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-007/00
출원번호 US-0231277 (1999-01-15)
발명자 / 주소
  • DiMeo
  • Jr. Frank
  • Bhandari Gautam
대리인 / 주소
    Zitzmann
인용정보 피인용 횟수 : 49  인용 특허 : 1

초록

A hydrogen sensor including a thin film sensor element formed, e.g., by metalorganic chemical vapor deposition (MOCVD) or physical vapor deposition (PVD), on a microhotplate structure. The thin film sensor element includes a film of a hydrogen-interactive metal film that reversibly interacts with hy

대표청구항

[ What is claimed is:] [1.]1. A hydrogen sensor, comprising:at least one hydrogen-interactive thin film sensor element comprising a rare earth metal or a rare earth metal dihydride;at least one micro-hotplate structure coupled to said hydrogen-interactive sensor element for selective heating of the

이 특허에 인용된 특허 (1)

  1. Bhandari Gautam ; Baum Thomas H., Hydrogen sensor utilizing rare earth metal thin film detection element.

이 특허를 인용한 특허 (49)

  1. Dimeo, Jr., Frank; Chen, Philip S. H.; Neuner, Jeffrey W.; Welch, James; Stawasz, Michele; Baum, Thomas H.; King, Mackenzie E.; Chen, Ing-Shin; Roeder, Jeffrey F., Apparatus and process for sensing fluoro species in semiconductor processing systems.
  2. Dimeo, Jr.,Frank; Chen,Philip S. H.; Neuner,Jeffrey W.; Welch,James; Stawacz,Michele; Baum,Thomas H.; King,Mackenzie E.; Chen,Ing Shin; Roeder,Jeffrey F., Apparatus and process for sensing fluoro species in semiconductor processing systems.
  3. Dimeo, Jr.,Frank; Chen,Philip S. H.; Neuner,Jeffrey W.; Welch,James; Stawasz,Michele; Baum,Thomas H.; King,Mackenzie E.; Chen,Ing Shin; Roeder,Jeffrey F., Apparatus and process for sensing fluoro species in semiconductor processing systems.
  4. Dimeo, Jr.,Frank; Chen,Philip S. H.; Neuner,Jeffrey W.; Welch,James; Stawasz,Michele; Baum,Thomas H.; King,Mackenzie E.; Chen,Ing Shin; Roeder,Jeffrey F., Apparatus and process for sensing fluoro species in semiconductor processing systems.
  5. Chen,Philip S. H.; Chen,Ing Shin; Dimeo, Jr.,Frank; Neuner,Jeffrey W.; Welch,James; Roeder,Jeffrey F., Apparatus and process for sensing target gas species in semiconductor processing systems.
  6. Mayer, Felix; Lechner, Moritz, Capacitive sensor.
  7. Wang, Zhongchun; Kurman, Eric; Kozlowski, Mark; Scobey, Mike; Dixon, Jeremy; Pradhan, Anshu, Electrochromic devices.
  8. Richardson,Thomas J., Electrochromic devices based on lithium insertion.
  9. Wang, Zhongchun; Nguyen, Paul P., Electrochromic devices based on lithium insertion.
  10. Richardson, Thomas J., Electrochromic materials, devices and process of making.
  11. Seal, Sudipta; Shukla, Satyajit V.; Ludwig, Lawrence; Cho, Hyoung, Fabrication method for a room temperature hydrogen sensor.
  12. Kailasam, Sridhar Karthik; Friedman, Robin; Pradhan, Anshu A.; Rozbicki, Robert T., Fabrication of low defectivity electrochromic devices.
  13. Kailasam, Sridhar; Friedman, Robin; Pradhan, Anshu; Rozbicki, Robert T., Fabrication of low defectivity electrochromic devices.
  14. Kozlowski, Mark; Kurman, Eric; Wang, Zhongchun; Scobey, Mike; Dixon, Jeremy; Pradhan, Anshu; Rozbicki, Robert, Fabrication of low defectivity electrochromic devices.
  15. Kozlowski, Mark; Kurman, Eric; Wang, Zhongchun; Scobey, Mike; Dixon, Jeremy; Pradhan, Anshu; Rozbicki, Robert, Fabrication of low defectivity electrochromic devices.
  16. Kozlowski, Mark; Kurman, Eric; Wang, Zhongchun; Scobey, Mike; Dixon, Jeremy; Pradhan, Anshu; Rozbicki, Robert, Fabrication of low defectivity electrochromic devices.
  17. Gu, Yuandong; Cole, Barrett E.; Higashi, Robert E., Gas sensor.
  18. Ralf Moos DE; Thomas Birkhofer DE; Aleksandar Knezevic DE; Ralf Mueller DE; Carsten Plog DE, Gas sensor.
  19. Chen,Ing Shin; Dimeo, Jr.,Frank; Chen,Philip S. H.; Neuner,Jeffrey W.; Welch,James; Hendrix,Bryan, Gas sensor with attenuated drift characteristic.
  20. Dawson-Elli, David Francis; DeMartino, Steven Edward; Hluck, Laura L, Glass laminated articles and layered articles.
  21. Dean, Frank William Houlton; Ling, Alan Edward, Hydrogen collection and detection.
  22. Liu,Ping; Tracy,C. Edwin; Pitts,J. Roland; Lee,Se Hee, Hydrogen permeable protective coating for a catalytic surface.
  23. Fukui, Katsuhiko, Hydrogen sensor with detection film comprised of rare earth metal particles dispersed in a ceramic.
  24. Ito,Takuo; Ono,Yasuichi; Konno,Toshiaki; Nuiya,Yoshio, Hydrogen sensor, apparatus for measuring hydrogen concentration, and method for measuring hydrogen concentration.
  25. Hu,Cheng; Qu,Xidong; Wu,Jonathan Q. M.; Stanley,Kevin G., Method and apparatus for detecting and locating gas leaks.
  26. Hummel, Réne; Steiner-Vanha, Ralph; Bartsch, Ulrich, Method for manufacturing a sensor chip.
  27. Tian, Wei-Cheng; Pang, Stella W.; Zellers, Edward T., Microelectromechanical heating apparatus and fluid preconcentrator device utilizing same.
  28. Benzel, Hubert; Weber, Heribert; Bauer, Michael; Artmann, Hans; Pannek, Thorsten; Schaefer, Frank; Krummel, Christian, Micromechanical component.
  29. Arndt,Michael; Lorenz,Gerd, Micromechanical thermal-conductivity sensor having a porous cover.
  30. Hunter, Gary W.; Xu, Jennifer C.; Lukco, Dorothy, Miniaturized metal (metal alloy)/ PdO.
  31. Hunter,Gary W.; Xu,Jennifer C.; Lukco,Dorothy, Miniaturized metal (metal alloy)/ PdO/SiC hydrogen and hydrocarbon gas sensors.
  32. Liu,James Z., Nano-crystalline and/or metastable metal hydrides as hydrogen source for sensor calibration and self-testing.
  33. Eastman, Jeffrey A.; Thompson, Loren J., Nanocrystalline films for gas-reactive applications.
  34. Dimeo, Jr.,Frank; Chen,Philip S. H.; Chen,Ing Shin; Neuner,Jeffrey W.; Welch,James, Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using same.
  35. DiMeo, Jr., Frank; King, Mackenzie E., Optical hydrogen detector.
  36. Raisanen, Petri; Marcus, Steven, Plasma-enhanced deposition process for forming a metal oxide thin film and related structures.
  37. McNeish,Allister; Popp,Edmund; Brown,Mark; Leiby,Mark W.; Cerul,James J.; Berger,Harvey L., Process for coating three-dimensional substrates with thin organic films and products.
  38. Putkonen,Matti, Process for producing yttrium oxide thin films.
  39. Putkonen, Matti, Process for producing zirconium oxide thin films.
  40. Putkonen, Matti, Process for producing zirconium oxide thin films.
  41. Liu, Liang; Ge, Shuai-Ping; Hu, Zhao-Fu; Du, Bing-Chu; Guo, Cai-Lin; Chen, Pi-Jin; Fan, Shou-Shan, Reference leak.
  42. Seal, Sudipta; Shukla, Satyajit V.; Ludwig, Lawrence; Cho, Hyoung, Room temperature hydrogen sensor.
  43. Hummel, Rene; Steiner-Vanha, Ralph; Bartsch, Ulrich, Sensor chip and method for manufacturing a sensor chip.
  44. Kunkel, Gary Joseph; Ramakrishnan, Narayanan, Slider trailing edge contamination sensor.
  45. Gardiner, Robin A.; Baum, Thomas H.; Gordon, Douglas Cameron; Gordon, legal representative, Connie L.; Glassman, Timothy E.; Pombrik, Sofia; Vaartstra, Brian A.; Kirlin, Peter S., Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition.
  46. Gardiner,Robin A.; Baum,Thomas H.; Gordon, legal representative,Connie L.; Glassman,Timothy E.; Pombrik,Sophia; Vaastra,Brian A.; Kirlin,Peter S.; Gordon, deceased,Douglas Cameron, Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition.
  47. Chen, Tianniu; Xu, Chongying; Baum, Thomas H., Tantalum amide complexes for depositing tantalum-containing films, and method of making same.
  48. Zinck, Jennifer J.; Kirby, Deborah J., Thin film metal hydride hydrogen sensor.
  49. Strong, Fabian; Bhatnagar, Yashraj; Dixit, Abhishek Anant; Martin, Todd; Rozbicki, Robert T., Thin-film devices and fabrication.
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