초록 ▼

The present invention is directed to a novel apparatus for exposing a pattern onto a photoresist-coated substrate cylinder and the process of using the apparatus. The cylindrical photolithography apparatus of the present invention comprises two adjacent cylindrical support rollers between which a po

The present invention is directed to a novel apparatus for exposing a pattern onto a photoresist-coated substrate cylinder and the process of using the apparatus. The cylindrical photolithography apparatus of the present invention comprises two adjacent cylindrical support rollers between which a portion of a flexible photomask extends in the form of a loop. The photoresist-coated substrate cylinder is received in the loop and a tension device, such as a weight, is engaged with the photomask to pull the photomask into contact with the photoresist-coated substrate cylinder over a substantial portion of the circumference of the substrate cylinder. A drive mechanism pulls the photomask over the surface of the photoresist-coated substrate cylinder thereby causing the substrate cylinder to rotate. Exposure light is provided during movement of the photomask to expose a pattern contained on the photomask onto the photoresist. In an alternative embodiment of the present invention, designed for small substrate cylinders and/or substrate cylinders coated with a thick resist, a cylindrical lens is supported above the support cylinders and the photoresist-coated substrate cylinder to focus the light from the light device in a radial direction to increase resolution of the pattern. In applications requiring even higher resolution, a panel defining an aperture slit is placed between the light device and cylindrical lens to further focus the light rays.

대표청구항 ▼

[ I claim:] [1.]1. A cylindrical photolithography apparatus for exposing a pattern contained on a flexible photomask onto a photoresist-coated cylinder, comprising:at least two adjacent, cylindrical, parallel, rotary support members positioned to receive a portion of the flexible photomask therebetw

[ I claim:] [1.]1. A cylindrical photolithography apparatus for exposing a pattern contained on a flexible photomask onto a photoresist-coated cylinder, comprising:at least two adjacent, cylindrical, parallel, rotary support members positioned to receive a portion of the flexible photomask therebetween presenting a loop in the photomask which receives and contacts the photoresist-coated surface of the cylinder,said rotary members rotatably supporting the cylinder with the loop portion of the photomask looped over and engaging the cylinder, said cylinder and the rotary members being simultaneously rotated in response to movement of the photomask;a drive mechanism operable to move the photomask and provide rotation to the cylinder while the latter is supported by the rotary members;at least one underpinning on which said support members and drive mechanism are mounted; andat least one light source positioned to direct light of an appropriate wave length and intensity against the photomask looped around the cylinder to expose a portion of the photoresist on the cylinder.