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System and method for discharging gas 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
  • B01D-053/22
출원번호 US-0192603 (1998-11-17)
우선권정보 JP0171766 (1998-06-18)
발명자 / 주소
  • Sadakata Takayuki,JPX
  • Yoshinaga Hiroshi,JPX
  • Ozaki Katsuhiro,JPX
출원인 / 주소
  • Fujitsu Limited, JPX
대리인 / 주소
    Armstrong, Westerman, Hattori, McLeland & Naughton, LLP
인용정보 피인용 횟수 : 32  인용 특허 : 7

초록

A system for discharging gas emitted from an apparatus or facility having a vacuum pump which sucks the gas emitted from the apparatus or facility while being supplied with a gas other than the sucked gas, the system comprising a unit for recovering at least part of the gas discharged from the vacuu

대표청구항

[ What is claimed is:] [1.]1. A method for evacuating gas from an apparatus using a vacuum pump which sucks the gas discharged from the apparatus while being supplied with a gas other than the sucked gas, the method comprising recovering at least part of the gas discharged from the vacuum pump, and

이 특허에 인용된 특허 (7)

  1. Krishnamurthy Ramachandran (Piscataway NJ) MacLean Donald L. (Annandale NJ), Argon recovery from argon-oxygen-decarburization process waste gases.
  2. Grant Robert W. (Excelsior MN) Novak Richard E. (Plymouth MN), Chemical processing system for maintaining concentration of semiconductor processing solution.
  3. Ji Wenchang ; Shen Dongmin ; Jain Ravi ; Shirley Arthur I. ; Athalye Atul M. ; Sadkowski Piotr J., Method of processing semiconductor manufacturing exhaust gases.
  4. Doubrawa Franz (Tribuswinkel DEX) Joksch Martin (Baden DEX), Process for purifying exhaust air from plant parts of oil mills.
  5. Zarchy Andrew S. (Amawalk NY) Maurer Richard T. (Nanuet NY) Chao Chen C. (Millwood NY), Process for separation and recovery of methyl chloride from vent streams containing isobutane.
  6. Kirsch, Warren B.; Laurent, Sebastian M., Purification of halide.
  7. Yang James Hsu-Kuang ; Chernyakov Iosif ; Hsiung Thomas Hsiao-Ling ; Schwarz Alexander, Recovery of perfluorinated compounds from the exhaust of semiconductor fabs using membrane and adsorption in series.

이 특허를 인용한 특허 (32)

  1. Sherer, John Michael, Abatement system targeting a by-pass effluent stream of a semiconductor process tool.
  2. Sherer,John Michael, Abatement system targeting a by-pass effluent stream of a semiconductor process tool.
  3. Patel,Satyadev R.; Schaadt,Gregory P.; MacDonald,Douglas B.; MacDonald,Niles K.; Shi,Hongqin, Apparatus and method for detecting an endpoint in a vapor phase etch.
  4. Patel, Satyadev R.; Schaadt, Gregory P.; MacDonald, Douglas B.; MacDonald, Niles K., Apparatus and method for flow of process gas in an ultra-clean environment.
  5. Brad Rake, Apparatus and method for lubricant condition control and monitoring.
  6. Wilson, Jay, Apparatus and methods for lubricant filtration and drum pump filtration system.
  7. Koehler, Don, Apparatus and methods for management of fluid condition.
  8. Sakai, Katsuo; Okura, Seiji; Sakamura, Masaji; Abe, Kaoru; Murata, Hitoshi; Wani, Etsuo; Kameda, Kenji; Mitsui, Yuki; Ohira, Yutaka; Yonemura, Taisuke; Sekiya, Akira, CVD apparatus and method of cleaning the CVD apparatus.
  9. Bloch, Heinz P.; Thomas, Rojean; Freeland, Daniel; Malinowski, Jeffrey T, Flinger disc.
  10. Abe, Tetsuya; Tanzawa, Sadamitsu; Hiroki, Seiji; Tajima, Yoshinori; Futatsuki, Takashi, Gas separation apparatus.
  11. Tajima, Yoshinori; Futatsuki, Takashi, Gas separation apparatus and gas separation method.
  12. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispenser.
  13. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispenser.
  14. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispenser.
  15. Gundrum, Daniel; Scherer, Nicholas, Lubricant dispenser with nozzle.
  16. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispensing nozzle.
  17. Ishihara, Yoshio; Hayashida, Shigeru; Nagasaka, Toru; Kimijima, Tetsuya; Ohmi, Tadahiro, Method and apparatus for collecting rare gas.
  18. Chae, Seung-Ki; Lee, Sang-Gon; Chung, Sang-Hyuk; Heo, Seong-Jin, Method and apparatus for reducing PFC emission during semiconductor manufacture.
  19. Winchester, David Charles; Bosco, Matthew John; Klein, Gerald W.; West, Isaac Patrick; Samsal, Richard Linton; Dee, Douglas Paul; Johnson, Andrew David; Karwacki, Jr., Eugene Joseph, Method and equipment for selectively collecting process effluent.
  20. McConnell, Rachel Dianne; Hurst, Ann Marie; Shi, Xiaobo, Method for chemical mechanical planarization of a tungsten-containing substrate.
  21. Hufton, Jeffrey Raymond; Farris, Thomas Stephen; Golden, Timothy Christopher; Karwacki, Jr., Eugene Joseph, Method for recovering high-value components from waste gas streams.
  22. Patel,Satyadev R.; Schaadt,Gregory P.; MacDonald,Douglas B.; Shi,Hongqin; Huibers,Andrew G.; Heureux,Peter, Method for vapor phase etching of silicon.
  23. Shi, Hongqin; Schaadt, Gregory P., Methods and apparatus of etch process control in fabrications of microstructures.
  24. Doan,Jonathan; Patel,Satyadev, Microelectromechanical structure and a method for making the same.
  25. Huibers, Andrew; Patel, Satyadev, Micromirror array having reduced gap between adjacent micromirrors of the micromirror array.
  26. Huibers, Andrew; Patel, Satyadev, Micromirror array having reduced gap between adjacent micromirrors of the micromirror array.
  27. Huibers,Andrew; Patel,Satyadev, Micromirror array having reduced gap between adjacent micromirrors of the micromirror array.
  28. Laermer, Franz; Urban, Andrea, Plasma system and method for anisotropically etching structures into a substrate.
  29. Kuboi, Nobuyuki; Fukusawa, Masanaga, Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method.
  30. Wilson, Jay, Portable lubricant filtration system and method.
  31. Saito, Masashi; Hirayama, Yusuke; Sakai, Itsuko; Ohiwa, Tokuhisa, Processing method for conservation of processing gases.
  32. Stephens, Jason Michael; Stimson, Bradley Owen; Hussen, Guleid Nur Abdi, System and method for recycling a gas used to deposit a semiconductor layer.
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