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Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-005/12
  • B44C-001/22
출원번호 US-0994184 (1997-12-19)
발명자 / 주소
  • Bishop Craig V.
  • Bokisa George S.
  • Durante Robert J.
  • Kochilla John R.
출원인 / 주소
  • Atotech Deutschland GmbH, DEX
대리인 / 주소
    Renner, Otto, Boisselle & Sklar, LLP
인용정보 피인용 횟수 : 22  인용 특허 : 23

초록

This invention relates to a method of forming a substrate with preparing a surface capable of making a cocontinuous bond comprising the steps of 1) obtaining a copper or copper alloy substrate and 2) applying an etching composition which comprises (a) an acid, (b) an oxidizing agent, (c) a copper co

대표청구항

[ What is claimed is:] [1.]1. A method of producing a substrate which includes preparing a surface capable of making a cocontinuous bond comprising the steps of 1) obtaining a copper or copper alloy substrate and 2) applying an etching composition which comprises (a) an acid, (b) an oxidizing agent,

이 특허에 인용된 특허 (23)

  1. Bokisa George S. (North Olmsted OH) Willis William J. (North Royalton OH), Aqueous electroless plating solutions.
  2. Bokisa George S. ; Willis William J., Aqueous immersion plating bath and method for plating.
  3. Dueber Thomas Eugene (Wilmington DE) Schadt ; III Frank Leonard (Wilmington DE), Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits.
  4. Nishimura Shigefumi (Yawata JPX) Fukuda Masao (Takatsuki JPX) Shimizu Yoshiji (Higashiosaka JPX), Bath for immersion plating tin-lead alloys.
  5. Dodd John R. (Wilmington) Arduengo ; III Anthony J. (Wilmington) King Randal D. (Wilmington DE) Vitale Americus C. (West Chester PA), Complexing agent for displacement tin plating.
  6. Yokono Hitoshi (Toride JPX) Yokono Haruki (Yono JPX) Mikamo Masahiro (Shimodate JPX) Narushima Ryouichi (Shimodate JPX) Iida Takuya (Yuuki JPX) Endo Yasuhiro (Shimodate JPX), Copper clad laminate, multilayer printed circuit board and their processing method.
  7. Plueddemann Edwin P. (Midland MI), Coupling agent compositions.
  8. Wilson Harold P. (Huron OH), Electrodeposited eutectic tin-bismuth alloy on a conductive substrate.
  9. Melton Cynthia M. (Bolingbrook IL) Growney Alicia (Barrington IL) Fuerhaupter Harry (Lombard IL), Immersion plating of tin-bismuth solder.
  10. Nobel Fred I. (Sands Point NY) Ostrow Barnet D. (Roslyn NY) Schram David N. (Freeport NY), Limiting tin sludge formation in tin or tin/lead electroplating solutions.
  11. Krulik Gerald A. (Hoffman Estates IL), Method for electroless plating on nonconductive substrates using palladium/tin catalyst in aqueous solution containing a.
  12. Davis Charles Robert (Wappingers Falls NY) Gall Thomas P. (Lancester NY), Method for producing multi-layer circuit board and resulting article of manufacture.
  13. Beach Sidney C. (Parma OH) Frisby C. Richard (Strongsville OH), Method of copper plating gravure cylinders.
  14. Engelhaupt Darell E. (St. Cloud FL), Method of forming electrodeposited anti-reflective surface coatings.
  15. Poutasse Charles A. (Beachwood OH) Luthy Richard L. (Beverly OH), Multi-layer structures containing a silane adhesion promoting layer.
  16. Palladino John V. (Paulsboro NJ), Multilayer printed circuit board formation.
  17. Opaskar Vince (Cleveland Hts. OH) Canaris Valerie (Parma OH) Willis William J. (North Royalton OH), Plating bath and method for electroplating tin and/or lead.
  18. Nakaso Akishi (Oyama JPX) Okamura Toshiro (Shimodate JPX) Ogino Haruo (Shimodate JPX) Watanabe Tomoko (Ibaraki JPX) Kimura Yuko (Shimodate JPX), Process for treating copper surface.
  19. King Randal D. (Wilmington DE) Vitale Americus C. (West Chester PA), Stabilized spray displacement plating process.
  20. Holtzman Abraham M. (Bat Yam ILX) Relis Joseph (Ramat Gan ILX), Use of immersion tin and tin alloys as a bonding medium for multilayer circuits.
  21. Holtzman Abraham M. (Bat Yam ILX) Relis Joseph (Ramat Gan ILX), Use of immersion tin and tin alloys as a bonding medium for multilayer circuits.
  22. Holtzman Abraham M. (Bat Yam ILX) Relis Joseph (Ramat Gan ILX), Use of immersion tin coating as etch resist.
  23. Abbott Charles N. (Dayton OH), Zinc-copper alloy electroplating baths.

이 특허를 인용한 특허 (22)

  1. Owei, Abayomi I.; Nguyen, Hiep X.; Yakobson, Eric, Adhesion promotion in printed circuit boards.
  2. Owei, Abayomi I.; Nguyen, Hiep X.; Yakobson, Eric, Adhesion promotion in printed circuit boards.
  3. Owei, Abayomi I.; Nguyen, Hiep X.; Yakobson, Eric, Adhesion promotion in printed circuit boards.
  4. Owei,Abayomi I.; Nguyen,Hiep X.; Yakobson,Eric, Adhesion promotion in printed circuit boards.
  5. Lützow, Norbert; Schmidt, Gabriela; Tews, Dirk, Aqueous composition for etching of copper and copper alloys.
  6. Klein, Klausjorg; Kohhirt, Walter, Cathodic electrodeposition coatings, their production and their use.
  7. Yap,Yoon Foong; Chee,Moses Moh Shu, Chemical leadframe roughening process and resulting leadframe and integrated circuit package.
  8. Yano, Ayako; Fukunaga, Atsushi; Kawakami, Atsushi; Ogawa, Akira, Curable composition and cured product thereof.
  9. Li, Felix C.; Lee, Yee Kim; Lim, Peng Soon; Yii, Terh Kuen; Lee, Lee Han Meng@Eugene, Delamination resistant device package having low moisture sensitivity.
  10. Li, Felix C.; Lee, Yee Kim; Lim, Peng Soon; Yii, Terh Kuen; Lee, Lee Han Meng@Eugene, Delamination resistant device package having raised bond surface and mold locking aperture.
  11. Imori,Toru; Sekiguchi,Junnosuke; Yabe,Atsushi, Electroless plating method and semiconductor wafer on which metal plating layer is formed.
  12. Wang,Xingwu; Greenwald,Howard J.; Miller,Ronald E.; Helfer,Jeffrey L.; Gray,Robert, Magnetically shielded assembly.
  13. Wang,Xingwu; Greenwald,Howard J.; Miller,Ronald E.; Helfer,Jeffrey L.; Gray,Robert, Magnetically shielded assembly.
  14. Riedl,Edmund; Schober,Wolfgang, Metal article intended for at least partially coating with a substance and a method for producing the same.
  15. Riedl, Edmund; Schober, Wolfgang, Method for producing a metal article intended for at least partially coating with a substance.
  16. Bernards,Roger; Gonzalez,Hector; Kucera,Al; Schanhaar,Mike, Method for roughening copper surfaces for bonding to substrates.
  17. Bernards,Roger; Gonzalez,Hector; Kucera,Al; Schanhaar,Mike, Method for roughening copper surfaces for bonding to substrates.
  18. Cole, Joseph; Sedlak, Rudolf P., Methods and compositions for oxide production on copper.
  19. Leung, Mei Kiu; Lai, Willetta; Cheng, Pit Kai Peter; Wong, Cecilia Po Sze, PWB manufacture.
  20. Zhang, Jun Qing, Primer composition.
  21. Francesco Tomaiuolo IT; Riccardo Ottria IT, Process for promoting adhesion between an inorganic substrate and an organic polymer.
  22. Lee, Yee Kim; Lim, Peng Soon; Yii, Terh Kuen; Lee, Lee Han Meng@Eugene, TO263 device package having low moisture sensitivity.
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