$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Substrate transfer system for semiconductor processing equipment 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/07
  • H01L-021/68
출원번호 US-0193991 (1998-11-17)
발명자 / 주소
  • Raaijmakers Ivo
  • Jacobs Loren R.
  • Halpin Michael W.
  • Alexander James A.
  • O'Neill Ken
  • Goodwin Dennis L.
출원인 / 주소
  • ASM America, Inc.
대리인 / 주소
    Knobbe, Martens, Olson & Bear, LLP.
인용정보 피인용 횟수 : 34  인용 특허 : 24

초록

A system for facilitating wafer transfer comprises a susceptor unit consisting of an inner susceptor section which rests within an outer susceptor section. A vertically movable and rotatable support spider located beneath the susceptor unit can rotate into positions to engage either the inner or the

대표청구항

[ What is claimed is:] [1.]1. An apparatus for supporting and handling a substrate in a substrate processing system, comprising:a forked end effector for transferring a thin, flat substrate to or from an inner section of a two-piece support unit, said end effector having a pair of spaced support arm

이 특허에 인용된 특허 (24)

  1. Prentakis Antonios E. (Cambridge MA), Apparatus and method for loading and unloading wafers.
  2. Weeks Anthony R. (Gilbert AZ) Beasley Todd R. (Tempe AZ) Gordy Craig D. (Scottsdale AZ), Apparatus for holding a piece of semiconductor.
  3. Lee Jong-Hyun,KRX ; Yoo Hyung-Joun,KRX ; Choi Boo-Yeon,KRX ; Jang Won-Ick,KRX ; Jang Ki-Ho,KRX, Apparatus for transferring a wafer.
  4. Matsukawa Hiroyuki (Kumamoto JPX) Yonemizu Akira (Kumamoto JPX) Matsushita Michiaki (Yatsushiro JPX) Fujimoto Akihiro (Kumamoto JPX) Takekuma Takashi (Yamaga JPX) Yaegashi Hidetami (Kokubunji JPX) Fu, Double-sided substrate cleaning apparatus.
  5. Marohl Dan A. ; Ngan Kenny King-Tai, End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector.
  6. Scott Daniel H. (Northridge CA), Inspection systems having rotating motion.
  7. Kakehi Yutaka (Hikari JPX) Nakazato Norio (Kudamatsu JPX) Fukushima Yoshimasa (Hikari JPX) Hiratsuka Kousai (Kudamatsu JPX) Shibata Fumio (Kudamatsu JPX) Yamamoto Noriaki (Kudamatsu JPX) Tsubone Tsun, Method and apparatus for controlling sample temperature.
  8. Murdoch Steven (Palo Alto CA), Method and apparatus for handling semiconductor wafers.
  9. White Carl (Gilbert AZ) MacErnie Jon R. (Chandler AZ) Hillman Joseph T. (Scottsdale AZ), Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment.
  10. Hillman Gary (Livingston NJ) Devico Michael J. (Madison NJ), Method and apparatus for processing workpieces.
  11. Nakagawa Yoshinori (Numazu JPX) Mitani Shinichi (Numazu JPX) Kobayashi Takehiko (Mishima JPX) Honda Takaaki (Yokohama JPX), Method for multichamber sheet-after-sheet type treatment.
  12. Koch George R. (Los Altos CA) Petersen ; III Carl T. (Fremont CA), Modular loadlock.
  13. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
  14. Akimoto Masami (Kikuyo JPX) Kimura Yoshio (Kumamoto JPX) Hirakawa Osamu (Kumamoto JPX) Anai Noriyuki (Kumamoto JPX) Tateyama Masanori (Kumamoto JPX) Sakamoto Yasuhiro (Kumamoto JPX), Resist process apparatus.
  15. deBoer Wiebe B. (Eersel OR NLX) Ozias Albert E. (Aumsville OR), Rotatable substrate supporting susceptor with temperature sensors.
  16. Saito Kunio (Kanagawa JPX) Arita Yoshinobu (Kanagawa JPX) Amazawa Takao (Kanagawa JPX), Selective chemical vapor deposition of a metallic film on the silicon surface.
  17. Ayers Joe W. (Sherman TX), Semiconductor slice holder.
  18. Ikeda Jiro (Shizuoka JPX), Sputtering apparatus.
  19. Raaijmakers Ivo ; Jacobs Loren ; Halpin Mike ; Alexander Jim ; O'Neill Ken ; Goodwin Dennis Lee, Substrate transfer system for semiconductor processing equipment.
  20. Perlov Ilya (Santa Clara CA), Susceptor drive and wafer displacement mechanism.
  21. Pickering Michael A. (Dracut MA) Burns Lee E. (Reading MA), Susceptor for semiconductor wafer processing.
  22. Van Doren Matthew J. (Pleasanton CA) Sauer Don (San Jose CA) Slocum Alexander H. (Concord NH) Rocki David Pap (Pleasanton CA) Tam Johann (Mountain View CA) Gerszewski Larry (Sunnyvale CA), Wafer gripper.
  23. Somekh Sasson R. (Los Altos Hills CA) Salzman Philip M. (San Jose CA) Vierny Oskar U. (Palo Alto CA), Wafer handling within a vacuum chamber using vacuum.
  24. Nam Sang-Ho,KRX ; Moon Hee-Jung,KRX, Wafer transport robot arm for transporting a semiconductor wafer.

이 특허를 인용한 특허 (34)

  1. Iida, Naruaki; Kajiwara, Hideki, Arm for wafer transportation for manufacturing semiconductor.
  2. Iida, Naruaki; Kajiwara, Hideki, Arm for wafer transportation for manufacturing semiconductor.
  3. Kajiwara, Hideki, Arm for wafer transportation for manufacturing semiconductor.
  4. Kajiwara, Hideki, Arm for wafer transportation for manufacturing semiconductor.
  5. Chang, Jun-Keun; Cho, Keun-Chang; Chung, Chan-Il; Shin, Young-Shik; Kim, Jeong-Ah; Jung, Neon-Cheol, Electroporation systems having a plurality of hollow members.
  6. Jennings, Dean C.; Foad, Majeed; Simmons, Jonathan, Electrostatic chuck cleaning during semiconductor substrate processing.
  7. Jennings, Dean C.; Foad, Majeed; Simmons, Jonathon, Electrostatic chuck cleaning during semiconductor substrate processing.
  8. Mantz, Paul, Endeffectors for handling semiconductor wafers.
  9. Mantz, Paul, Endeffectors for handling semiconductor wafers.
  10. Mantz, Paul, Endeffectors for handling semiconductor wafers.
  11. Irie, Nobuyuki; Ishimaru, Katsuaki, Exposure apparatus, microdevice, photomask, and exposure method.
  12. Sasajima, Ryota; Nakamura, Iwao, Heat treatment apparatus and method of manufacturing substrates.
  13. Meulen, Peter van der, Linear semiconductor processing facilities.
  14. van der Meulen, Peter, Linear semiconductor processing facilities.
  15. Herbert Mittermaier DE; Georg Brenninger DE; Alois Aigner DE, Method and device for loading a susceptor.
  16. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.
  17. Newman, Jacob; Kanawade, Dinesh; Merry, Nir, Multiple substrate transfer robot.
  18. Chang, Jun-Keun; Cho, Keun-Chang; Chung, Chan-Il; Jung, Neon-Cheol; Huh, Seung Gin, Pipette tip for electroporation device.
  19. Joe, Raymond; Dip, Anthony, Removable semiconductor wafer susceptor.
  20. van der Meulen, Peter, Semiconductor manufacturing systems.
  21. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  22. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  23. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
  24. Beginski, David A., Sensor signal transmission from processing system.
  25. Aoki, Yasuo, Substrate supporting apparatus, substrate transfer apparatus and the transfer method, method of holding the substrate, exposure apparatus and the method of manufacturing the apparatus.
  26. Kim, Woo Chan; Lee, Jeong Ho; Jang, Hyun Soo; Kim, Jong Su, Substrate supporting arm for semiconductor manufacturing apparatus.
  27. Lee, Jeong Ho; Jeong, Sang Jin; Choi, Young Seok, Substrate transfer device for semiconductor deposition apparatus.
  28. Hiroki, Tsutomu, Substrate transfer device, substrate processing apparatus and substrate transfer method.
  29. Gatchalian, Roy G.; Soriano, Joseph Gregorio; Heng, Hee Cher, Susceptor support system.
  30. Khosla, Mukul; Powell, Ronald; Keshavamurthy, Arun; Blank, Richard, Systems and methods for inhibiting oxide growth in substrate handler vacuum chambers.
  31. Kim, Se Yong; Kim, Woo Chan; Jung, Dong Rak, Thin film deposition apparatus and method of maintaining the same.
  32. Kim, Ki Jong; Kim, Dae Youn, Thin film deposition apparatus and method thereof.
  33. Ishibashi, Masayuki; Dohi, Takayuki, Vapor-phase epitaxial growth method.
  34. Beginski,David A.; Crabb,Richard; Donald,James, Wafer edge with light sensor.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로